Abstract: A plating rack is provided and is adapted, for example, for use in connection with a physical vapor deposition system for plating components such as plumbing fixtures. The plating rack is adapted to be contained within a plating chamber and includes an elongated main support member. Secured to the elongated support member is a series of axially spaced component support assemblies with each component support assembly adapted to receive and hold an array of components to be plated. Respective components support assemblies are configured such that they include an open side that permits the entire component support assembly to be laterally moved into engagement with the main support member where the component support assembly can be secured thereto. In addition, a support structure is provided for axially adjusting respective component support assemblies on the main support member.