Patents by Inventor Charles Warren Wright

Charles Warren Wright has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9122167
    Abstract: A photopolymer layer is formed on an organic device substrate and exposed to patterned radiation. The photopolymer layer includes a photopolymer comprising at least a first repeating unit having an acid-catalyzed, solubility-altering reactive group, wherein the total fluorine content of the photopolymer is less than 30% by weight. The pattern exposed photopolymer is contacted with a developing agent, such as a developing solution, to remove unexposed photopolymer, thereby forming a developed structure having a first pattern of exposed photopolymer covering the substrate and a complementary second pattern of uncovered substrate corresponding to the unexposed photopolymer. The developing agent comprises at least 50% by volume of a hydrofluoroether developing solvent.
    Type: Grant
    Filed: May 12, 2014
    Date of Patent: September 1, 2015
    Assignee: Orthogonal, Inc.
    Inventors: John Andrew Defranco, Francis Houlihan, Charles Warren Wright, Diane Carol Freeman, Frank Xavier Byrne, Douglas Robert Robello, Sandra Rubsam, Terrence Robert O'Toole
  • Patent number: 9104104
    Abstract: A fluorinated photopolymer is formed on a device substrate and exposed to patterned radiation. The photopolymer has a total fluorine content in a weight range of 15 to 60% and comprises at least three distinct repeating units, including a first repeating unit having a fluorine-containing group, a second repeating unit having an acid- or alcohol-forming precursor group, and a third repeating unit different from the first and second repeating units. The pattern-exposed photopolymer layer is contacted with a developing solution comprising at least a first fluorinated solvent that dissolves the unexposed photopolymer thereby forming a developed structure having a first pattern of photopolymer covering the substrate and a complementary second pattern of uncovered substrate. The developing solution is selected to provide a maximum photopolymer contrast in a range of 1.9 to 5.0.
    Type: Grant
    Filed: April 24, 2014
    Date of Patent: August 11, 2015
    Assignee: Orthogonal, Inc.
    Inventors: Charles Warren Wright, Diane Carol Freeman, Frank Xavier Byrne, John Andrew DeFranco, Sandra Rubsam, Terrence Robert O'Toole, Douglas Robert Robello
  • Publication number: 20150132699
    Abstract: A fluorinated photopolymer composition is disclosed having a branched copolymer provided in a fluorinated solvent. The copolymer includes a branching unit, a first repeating unit having a fluorine-containing group, and a second repeating unit having a solubility-altering reactive group. The branched fluorinated photopolymer composition is particularly suited for the fabrication of organic electronic and bioelectronic devices, or other devices having sensitive active organic materials.
    Type: Application
    Filed: November 12, 2014
    Publication date: May 14, 2015
    Inventors: Douglas Robert Robello, Charles Warren Wright, Diane Carol Freeman, Frank Xavier Byrne, John Andrew DeFranco, Sandra Rubsam, Terrence Robert O'Toole
  • Publication number: 20150030982
    Abstract: A photosensitive composition useful for fabricating organic electronic devices comprises a fluorinated solvent a fluorinated sensitizing dye and a copolymer. The copolymer comprises at least two distinct repeating units, including a first repeating unit having a fluorine-containing group and a second repeating unit having a solubility-altering reactive group. The presence of the fluorinated sensitizing dye improves photosensitivity.
    Type: Application
    Filed: July 18, 2014
    Publication date: January 29, 2015
    Inventors: Douglas Robert Robello, Charles Warren Wright
  • Publication number: 20150030981
    Abstract: A photosensitive composition comprises a fluorinated solvent, a photo-acid generator and a copolymer. The copolymer comprises at least three distinct repeating units, including a first repeating unit having a fluorine-containing group, a second repeating unit having an acid-catalyzed cross-linkable group, and a third repeating unit having a sensitizing dye. The composition is useful in the fabrication of electronic devices, especially organic electronic and bioelectronic devices.
    Type: Application
    Filed: July 18, 2014
    Publication date: January 29, 2015
    Inventors: Douglas Robert Robello, Charles Warren Wright
  • Publication number: 20140356789
    Abstract: A method of patterning a device comprises providing on a device substrate a layer of a fluorinated photopolymer comprising at least three distinct repeating units including a first repeating unit having a fluorine-containing group, a second repeating unit having an acid- or alcohol-forming precursor group, and a third repeating unit having an anthracene-based sensitizing dye. The photopolymer has a total fluorine content in a range of 15 to 60% by weight. The photopolymer layer is exposed to patterned light and contacted with a developing agent to remove a portion of exposed photopolymer layer in accordance with the patterned light, thereby forming a developed structure having a first pattern of photopolymer covering the substrate and a complementary second pattern of uncovered substrate corresponding to the removed portion of photopolymer. The developing agent comprises at least 50% by volume of a fluorinated solvent.
    Type: Application
    Filed: May 30, 2014
    Publication date: December 4, 2014
    Inventors: Charles Warren Wright, Ralph Rainer Dammel
  • Publication number: 20140356788
    Abstract: A method of patterning a device comprises providing on a device substrate a layer of a fluorinated photopolymer comprising at least three distinct repeating units including a first repeating unit having a fluorine-containing group, a second repeating unit having an acid- or alcohol-forming precursor group, and a third repeating unit having a sensitizing dye. The photopolymer has a total fluorine content in a range of 15 to 60% by weight. The photopolymer layer is exposed to patterned light and contacted with a developing agent to remove a portion of exposed photopolymer layer in accordance with the patterned light, thereby forming a developed structure having a first pattern of photopolymer covering the substrate and a complementary second pattern of uncovered substrate corresponding to the removed portion of photopolymer. The developing agent comprises at least 50% by volume of a fluorinated solvent.
    Type: Application
    Filed: May 30, 2014
    Publication date: December 4, 2014
    Inventors: Charles Warren Wright, Douglas Robert Robello
  • Publication number: 20140342287
    Abstract: A fluorinated photopolymer is formed on a device substrate and exposed to patterned radiation. The photopolymer has a total fluorine content in a weight range of 15 to 60% and comprises at least three distinct repeating units, including a first repeating unit having a fluorine-containing group, a second repeating unit having an acid- or alcohol-forming precursor group, and a third repeating unit different from the first and second repeating units. The pattern-exposed photopolymer layer is contacted with a developing solution comprising at least a first fluorinated solvent that dissolves the unexposed photopolymer thereby forming a developed structure having a first pattern of photopolymer covering the substrate and a complementary second pattern of uncovered substrate. The developing solution is selected to provide a maximum photopolymer contrast in a range of 1.9 to 5.0.
    Type: Application
    Filed: April 24, 2014
    Publication date: November 20, 2014
    Inventors: Charles Warren Wright, Diane Carol Freeman, Frank Xavier Byrne, John Andrew DeFranco, Sandra Rubsam, Terrrence Robert O'Toole, Douglas Robert Robello
  • Publication number: 20140322656
    Abstract: A photoresist layer comprising a fluorinated photoresist material is formed on a device substrate and exposed to patterned radiation. The exposed photoresist layer is contacted with a developing agent to remove a portion of the exposed photoresist layer in accordance with the patterned light, thereby forming a developed structure having a first pattern of photoresist covering the substrate and a complementary second pattern of uncovered substrate corresponding to the removed portion of photoresist, the developing agent comprising a mixture of first and second fluorinated solvents, wherein at least one of the first and second solvents is a hydrofluoroether. The developed structure is treated to form a treated structure. The treated structure is contacted with a stripping agent to remove the first pattern of photoresist, the stripping agent comprising at least the first or second solvent in a concentration different from the developing agent.
    Type: Application
    Filed: April 24, 2014
    Publication date: October 30, 2014
    Inventors: Charles Warren Wright, Diane Carol Freeman, Frank Xavier Byrne, John Andrew DeFranco
  • Publication number: 20140248565
    Abstract: A photopolymer layer is formed on an organic device substrate and exposed to patterned radiation. The photopolymer layer includes a photopolymer comprising at least a first repeating unit having an acid-catalyzed, solubility-altering reactive group, wherein the total fluorine content of the photopolymer is less than 30% by weight. The pattern exposed photopolymer is contacted with a developing agent, such as a developing solution, to remove unexposed photopolymer, thereby forming a developed structure having a first pattern of exposed photopolymer covering the substrate and a complementary second pattern of uncovered substrate corresponding to the unexposed photopolymer. The developing agent comprises at least 50% by volume of a hydrofluoroether developing solvent.
    Type: Application
    Filed: May 12, 2014
    Publication date: September 4, 2014
    Inventors: John Andrew DEFRANCO, Francis HOULIHAN, Charles Warren WRIGHT, Diane Carol FREEMAN, Frank Xavier BYRNE, Douglas Robert ROBELLO, Sandra RUBSAM, Terrence Robert O'TOOLE
  • Publication number: 20140127625
    Abstract: The present invention provides improved solvents and photoresists for the photolithographic patterning of organic electronic devices, systems comprising combinations of these solvents and photoresists, and methods for using these systems of solvents and photoresists to pattern various organic electronic materials.
    Type: Application
    Filed: April 24, 2012
    Publication date: May 8, 2014
    Applicant: ORTHOGONAL, INC.
    Inventors: John Defranco, Charles Warren Wright