Patents by Inventor Charlotte R. DeWan

Charlotte R. DeWan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Photo acid generator compounds, photo resists, and method for improving bias
    Patent number: 6074800
    Abstract: Several mid UV photo acid generators (PAGs), a chemically amplified photo resist (CAMP), and method for improving nested to isolated line bias are provided. Similarly, photo speed may also be improved. Unlike conventional mid UV PAGs, the present invention's PAG compounds, resist composition, and method do not require a mid UV sensitizer. Specifically, PAGs are provided that bear a chromophore capable of receiving mid UV radiation, particularly I-line, and that are suitable for use in a chemically amplified photo resist having a photo speed of 500 mJ/cm.sup.2 or less, but preferrably 200 mJ/cm.sup.2 or less. For example, the PAGs can be a sulfonium or iodonium salt, such as anthryl, butyl, methyl sulfonium triflate and bis(4-t-butylphenyl)iodonium 9,10-dimethoxyanthracene sulfonate.
    Type: Grant
    Filed: April 23, 1998
    Date of Patent: June 13, 2000
    Assignee: International Business Machines Corporation
    Inventors: Gregory Breyta, Phillip J. Brock, Daniel J. Dawson, Ronald A. DellaGuardia, Charlotte R. DeWan, Andrew R. Eckert, Hiroshi Ito, Premlatha Jagannathan, Leo L. Linehan, Kathleen H. Martinek, Wayne M. Moreau, Randolph J. Smith