Abstract: A method for manufacturing a microscale optical structure from a wafer, including: preparing the wafer with coatings of desired optical properties by depositing the coatings on an optically finished surface of the wafer; mounting the wafer on a supporting base having a releasable medium, with the optically finished surface adjacent the supporting base to protect the optically finished surface; forming additional surfaces of the optical structure at a desired angle and depth using a grinding blade having a cutting face at the angle, the grinding blade being configured to rotate about an axis; and polishing the additional surfaces of the optical structure by introducing a polishing material onto the wafer and using a polishing means to smooth the additional surfaces.

Abstract: A multi-device lid for a micro device wafer has a plurality of micro devices. The multi-device lid includes a multi-lid substrate configured to cover the plurality of micro devices of the micro device wafer. The multi-lid substrate has a trench pattern with intersection portions and non-intersection portions on a first side of the multi-lid substrate. The trench pattern is configured such that the intersection portions of the trench pattern extend adjacent to at least two of the plurality of micro devices when the multi-lid substrate is coupled to the micro device wafer.

Abstract: A method for packaging and singulating a wafer having a plurality of micro devices includes providing a multi-lid substrate having a trench having intersection portions and non-intersection portions formed on a first side of the multi-lid substrate. The multi-lid substrate is coupled to the wafer such that the intersection portions of the trench pattern extend adjacent to at least three micro devices. Portions of the multi-lid substrate between a second side of the multi-lid substrate and the trench pattern are removed while the multi-lid substrate is coupled to the wafer.