Abstract: An amperometric sensor assembly includes an amperometric sensor and a bubble shedding clip. The amperometric sensor has a sensor membrane that is configured to be exposed to a process fluid. The amperometric sensor also has an electrical characteristic that changes based on exposure to an electroactive substance. The bubble shedding clip is coupled to the amperometric sensor and is configured to inhibit the presence of bubbles on the sensor membrane when the sensor membrane is exposed to the process fluid. A water panel including the amperometric sensor assembly is also provided along with a method of installing a bubble shedding clip on an amperometric sensor.

Abstract: A pH sensing that is configured to be exposed to a process fluid is provided. The pH sensing probe includes a sensor body and a pH glass electrode mounted to the sensor body. A reference electrode has a junction mounted to the sensor body that is configured to be exposed to the process fluid. A backup pH electrode is mounted to the sensor body and configured to be exposed to the process fluid. A pH sensing system and a method of operating a pH sensing system are also provided. In one example, the backup pH electrode is an ISFET electrode that can be automatically switched to when the pH glass electrode is compromised.

Abstract: A pH sensing probe configured to be exposed to a process fluid is provided. The pH sensing probe includes a sensor body and a pH electrode mounted to the sensor body. A primary reference electrode is mounted to the sensor body and has a primary reference junction that is configured to be exposed to the process fluid. A secondary reference electrode is mounted to the sensor body and has a secondary reference junction configured to be exposed to the process fluid. A seal isolates the secondary reference junction from the process fluid until deterioration of the primary reference junction. A pH sensing system and a method of operating a pH sensing system are also provided.