Abstract: A microsphere includes a cross-linked hydrophilic substrate, a lipophilic substrate, and a surfactant. The cross-linked hydrophilic substrate includes cross-linked sodium alginate and gelatin. The lipophilic substrate includes iodized oil, C16-C18 alkyl alcohol, and polycaprolactone. The surfactant includes polyoxyethylene stearate. The microsphere is dry or substantially solid. Prior to being used for embolization, the microsphere can be immersed in a drug containing mixture to allow the microsphere to absorb the mixture and expand, thereby loaded with the drug. A method for preparing the microsphere and a method for embolizing tumor in a subject by using the microsphere are also provided.

Abstract: A manufacturing method of an anti-glare film is provided. The manufacturing method includes spraying a solution on a substrate to form a plurality of droplets on the substrate, wherein the solution includes a curable resin, a plurality of particles, and a solvent; and curing the plurality of droplets to form an anti-glare film.

Abstract: A manufacturing method of an anti-glare film is provided. The manufacturing method includes spraying a solution on a substrate to form a plurality of droplets on the substrate, wherein the solution includes a curable resin, a plurality of particles, and a solvent; and curing the plurality of droplets to form an anti-glare film.

Abstract: A method for manufacturing metal nano-wires is described, which is suitable for manufacturing silver nano-wires and copper nano-wires and includes the following steps. A metal nano-particle resulting solution is prepared to mix a first metal ionic compound, a first reductant and a first capping agent, so as to form various metal nano-particles. An illumination treatment is performed on the metal nano-particle resulting solution. A portion of the metal nano-particle resulting solution after the illumination treatment is mixed with a metal nano-wire resulting solution to form metal nano-wires by using the metal nano-particles of the portion of the metal nano-particle resulting solution as seeds. The metal nano-wire resulting solution includes a second metal ionic compound, a second reductant and a second capping agent.

Abstract: A wet coating method is described, which includes the following steps. A film coating is applied to at least one surface of a substrate using a wet process. A plasma-assisted filling treatment is performed on the film coating to crystallize the film coating into a film. The plasma-assisted filling treatment includes using a filling coating.

Abstract: An arc atmospheric pressure plasma device is described. The arc atmospheric pressure plasma device includes a first electrode, a second electrode and a nozzle. The first electrode is configured to connect to a power supply. The second electrode has a chamber and is grounded. The first electrode is located within the chamber. The nozzle is connected to a bottom of the second electrode, and has at least two nozzle channels. The nozzle channels communicate with the chamber.

Abstract: A wet coating method is described, which includes the following steps. A film coating is applied to at least one surface of a substrate using a wet process. A plasma-assisted filling treatment is performed on the film coating to crystallize the film coating into a film. The plasma-assisted filling treatment includes using a filling coating.

Abstract: A solar concentrator and photoelectric conversion structure is described. The solar concentrator and photoelectric conversion structure includes a glass concentrator and at least one photoelectric conversion layer. The glass concentrator forms a light incident surface and a plane. The plane includes a plurality of concentrating elements. Each concentrating element includes a hollow taper and a hollow pillar. The hollow taper includes a first opening. The hollow pillar includes a second opening and a third opening on opposite sides, in which the second opening is correspondingly connected to the first opening. The photoelectric conversion layer deposited onto inner side surfaces of the hollow tapers and the hollow pillars of the concentrating elements. The photoelectric conversion layer includes at least one p-type material and at least one n-type material.

Abstract: A solar concentrator and photoelectric conversion structure is described. The solar concentrator and photoelectric conversion structure includes a glass concentrator and at least one photoelectric conversion layer. The glass concentrator forms a light incident surface and a plane. The plane includes a plurality of concentrating elements. Each concentrating element includes a hollow taper and a hollow pillar. The hollow taper includes a first opening. The hollow pillar includes a second opening and a third opening on opposite sides, in which the second opening is correspondingly connected to the first opening. The photoelectric conversion layer deposited onto inner side surfaces of the hollow tapers and the hollow pillars of the concentrating elements. The photoelectric conversion layer includes at least one p-type material and at least one n-type material.

Abstract: A thermophotovoltaic system is described. The thermophotovoltaic system includes a chamber body, an emitter, a filter and a photovoltaic cell. The chamber body has an ellipsoid chamber including a first focus and a second focus. The emitter is disposed on the first focus, and the emitter is suitable for emitting a plurality of electromagnetic waves. The filter is surrounding the emitter to filter the electromagnetic waves and to pass the electromagnetic waves with a predetermined wavelength band. The photovoltaic cell is disposed on the second focus and is suitable for receiving the electromagnetic waves with the predetermined wavelength band.

Abstract: A solar concentrator is described. The solar concentrator includes a plane including a plurality of concentrating elements, wherein each concentrating element includes a hollow taper including a first opening; and at least one photoelectric conversion layer covering inner side surfaces of the concentrating elements.

Abstract: A cell has a substrate, a first microstructure and an active layer. The first microstructure is formed on the substrate and has therein a first material with a concentration gradient toward one side of the substrate to provide a first built-in electric field. The active layer is mounted on the first microstructure so as to reduce recombination of electrons and holes in the cell.

Abstract: A solar cell includes a substrate; multiple silicon rods formed on a surface of the substrate; an insulator layer formed on the surface of the substrate while the silicon rods are still exposed; a silicon shell layer formed on outside of each of the silicon rods; and a InxGa1?xAsyP1?y layer formed on the silicon shell layer to form a first cell, wherein 0?x?1 and 0?y?1.

Abstract: A thermophotovoltaic system is described. The thermophotovoltaic system includes a chamber body, an emitter, a filter and a photovoltaic cell. The chamber body has an ellipsoid chamber including a first focus and a second focus. The emitter is disposed on the first focus, and the emitter is suitable for emitting a plurality of electromagnetic waves. The filter is surrounding the emitter to filter the electromagnetic waves and to pass the electromagnetic waves with a predetermined wavelength band. The photovoltaic cell is disposed on the second focus and is suitable for receiving the electromagnetic waves with the predetermined wavelength band.

Abstract: A method for manufacturing a micro-nano imprint mould and an imprinting process are described. The method for manufacturing a micro-nano imprint mould includes: providing a mould body including a first surface and a second surface on opposite sides, wherein the mould body includes an imprinting pattern structure set in the first surface, and the imprinting pattern structure includes a plurality of concaves and a plurality of convexes between the concaves; and performing a surface treatment step on the first surface of the mould body to make a first contact angle form between an imprint fluid and the concaves and a second contact angle form between the imprint fluid and the convexes, wherein the first contact angle is different from the second contact angle.

Abstract: A micro-nano imprint mould and an imprinting process are described. The micro-nano imprint mould includes: a porous body including a first surface and a second surface on opposite sides, wherein the porous body includes a plurality of holes, and a fluid can flow between the first surface and the second surface through the holes; and an imprint pattern structure set in the first surface of the porous body, wherein the imprint pattern structure includes a plurality of convexes and a plurality of concaves between the convexes.

Abstract: A solar concentrator is described. The solar concentrator includes a plane including a plurality of concentrating elements, wherein each concentrating element includes a hollow taper including a first opening; and at least one photoelectric conversion layer covering inner side surfaces of the concentrating elements.

Abstract: A synthesis for a silated acidic polymer by a copolymerization of several monomers includes one acidic monomer and one silated monomer. The silated acidic polymer is used as a resist barrier in imprint lithography and is easily removed by an environmental basic aqua-solution during the stripping process without using RIE (reactive ion etching) process or organic solvent at the last step of resist stripping so that the throughput is enhanced and good etching resistibility together with cost-saving is obtained.

Abstract: A polymer resist having a good flow is used in a nanoimprint lithography. A residual layer remained is thus thinner. Hence, a time spent for etching the residual layer is reduced. And a pattern obtained after the nanoimprint lithography will not be ruined because of a long-time etching. Nevertheless, the present invention can be applied on a hard substrate, like a silicon chip, or a soft substrate, like PET.

Abstract: The present invention processes a synthesis for a silated acidic polymer by a copolymerization of several monomers including one acidic monomer and one silated monomer. The silated acidic polymer is used as a resist barrier in imprint lithography and is easily removed by an environmental basic aqua-solution during the stripping process without using RIE (reactive ion etching) process or organic solvent at the last step of resist stripping so that the throughput is enhanced and good etching resistibility together with cost-saving is obtained.