Patents by Inventor Chau-Nan Hong

Chau-Nan Hong has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190204481
    Abstract: A manufacturing method of an anti-glare film is provided. The manufacturing method includes spraying a solution on a substrate to form a plurality of droplets on the substrate, wherein the solution includes a curable resin, a plurality of particles, and a solvent; and curing the plurality of droplets to form an anti-glare film.
    Type: Application
    Filed: December 26, 2018
    Publication date: July 4, 2019
    Inventors: Ching-Huan LIAO, Hsin-Tao HUANG, Franklin Chau-Nan HONG, Cyun-Jhe YAN, Wen-De ZHENG, Yu-Lun HSIAO
  • Publication number: 20160348269
    Abstract: A method for manufacturing metal nano-wires is described, which is suitable for manufacturing silver nano-wires and copper nano-wires and includes the following steps. A metal nano-particle resulting solution is prepared to mix a first metal ionic compound, a first reductant and a first capping agent, so as to form various metal nano-particles. An illumination treatment is performed on the metal nano-particle resulting solution. A portion of the metal nano-particle resulting solution after the illumination treatment is mixed with a metal nano-wire resulting solution to form metal nano-wires by using the metal nano-particles of the portion of the metal nano-particle resulting solution as seeds. The metal nano-wire resulting solution includes a second metal ionic compound, a second reductant and a second capping agent.
    Type: Application
    Filed: September 25, 2015
    Publication date: December 1, 2016
    Inventors: Chau-Nan HONG, Cyun-Jhe YAN
  • Patent number: 9498793
    Abstract: A wet coating method is described, which includes the following steps. A film coating is applied to at least one surface of a substrate using a wet process. A plasma-assisted filling treatment is performed on the film coating to crystallize the film coating into a film. The plasma-assisted filling treatment includes using a filling coating.
    Type: Grant
    Filed: December 19, 2013
    Date of Patent: November 22, 2016
    Assignee: NATIONAL CHENG KUNG UNIVERSITY
    Inventors: Chau-Nan Hong, Chun-Chia Yeh, Hsiang-En Hsu, Ke-Fong Li, Cyun-Jhe Yan, Chung-Sheng Chiang, Yu-Ling Cheng
  • Patent number: 9474141
    Abstract: An arc atmospheric pressure plasma device is described. The arc atmospheric pressure plasma device includes a first electrode, a second electrode and a nozzle. The first electrode is configured to connect to a power supply. The second electrode has a chamber and is grounded. The first electrode is located within the chamber. The nozzle is connected to a bottom of the second electrode, and has at least two nozzle channels. The nozzle channels communicate with the chamber.
    Type: Grant
    Filed: January 7, 2016
    Date of Patent: October 18, 2016
    Assignee: CREATING NANO TECHNOLOGIES, INC.
    Inventors: Chau-Nan Hong, Yi-Ming Hsu, Li-Min Wang
  • Publication number: 20150118408
    Abstract: A wet coating method is described, which includes the following steps. A film coating is applied to at least one surface of a substrate using a wet process. A plasma-assisted filling treatment is performed on the film coating to crystallize the film coating into a film. The plasma-assisted filling treatment includes using a filling coating.
    Type: Application
    Filed: December 19, 2013
    Publication date: April 30, 2015
    Applicant: NATIONAL CHENG KUNG UNIVERSITY
    Inventors: Chau-Nan HONG, Chun-Chia YEH, Hsiang-En HSU, Ke-Fong LI, Cyun-Jhe YAN, Chung-Sheng CHIANG, Yu-Ling CHENG
  • Patent number: 8916766
    Abstract: A solar concentrator and photoelectric conversion structure is described. The solar concentrator and photoelectric conversion structure includes a glass concentrator and at least one photoelectric conversion layer. The glass concentrator forms a light incident surface and a plane. The plane includes a plurality of concentrating elements. Each concentrating element includes a hollow taper and a hollow pillar. The hollow taper includes a first opening. The hollow pillar includes a second opening and a third opening on opposite sides, in which the second opening is correspondingly connected to the first opening. The photoelectric conversion layer deposited onto inner side surfaces of the hollow tapers and the hollow pillars of the concentrating elements. The photoelectric conversion layer includes at least one p-type material and at least one n-type material.
    Type: Grant
    Filed: December 6, 2013
    Date of Patent: December 23, 2014
    Assignee: National Cheng Kung University
    Inventors: Chau-Nan Hong, Shu-Chun Chu, Wang-Chieh Yu, Shan-Bin Chang, Min-Hsiung Hon
  • Publication number: 20140090690
    Abstract: A solar concentrator and photoelectric conversion structure is described. The solar concentrator and photoelectric conversion structure includes a glass concentrator and at least one photoelectric conversion layer. The glass concentrator forms a light incident surface and a plane. The plane includes a plurality of concentrating elements. Each concentrating element includes a hollow taper and a hollow pillar. The hollow taper includes a first opening. The hollow pillar includes a second opening and a third opening on opposite sides, in which the second opening is correspondingly connected to the first opening. The photoelectric conversion layer deposited onto inner side surfaces of the hollow tapers and the hollow pillars of the concentrating elements. The photoelectric conversion layer includes at least one p-type material and at least one n-type material.
    Type: Application
    Filed: December 6, 2013
    Publication date: April 3, 2014
    Applicant: NATIONAL CHENG KUNG UNIVERSITY
    Inventors: Chau-Nan HONG, Shu-Chun CHU, Wang-Chieh YU, Shan-Bin CHANG, Min-Hsiung HON
  • Patent number: 8669464
    Abstract: A thermophotovoltaic system is described. The thermophotovoltaic system includes a chamber body, an emitter, a filter and a photovoltaic cell. The chamber body has an ellipsoid chamber including a first focus and a second focus. The emitter is disposed on the first focus, and the emitter is suitable for emitting a plurality of electromagnetic waves. The filter is surrounding the emitter to filter the electromagnetic waves and to pass the electromagnetic waves with a predetermined wavelength band. The photovoltaic cell is disposed on the second focus and is suitable for receiving the electromagnetic waves with the predetermined wavelength band.
    Type: Grant
    Filed: December 3, 2010
    Date of Patent: March 11, 2014
    Assignee: National Cheng Kung University
    Inventors: Wen-Chi Hou, Tung-Hsien Wu, Chih-Jui Ni, Chih-Lien Chiang, Chau-Nan Hong
  • Patent number: 8664515
    Abstract: A solar concentrator is described. The solar concentrator includes a plane including a plurality of concentrating elements, wherein each concentrating element includes a hollow taper including a first opening; and at least one photoelectric conversion layer covering inner side surfaces of the concentrating elements.
    Type: Grant
    Filed: March 15, 2010
    Date of Patent: March 4, 2014
    Assignee: National Cheng Kung University
    Inventors: Chau-Nan Hong, Shu-Chun Chu, Wang-Chieh Yu, Shan-Bin Chang, Min-Hsiung Hon
  • Publication number: 20130327379
    Abstract: A cell has a substrate, a first microstructure and an active layer. The first microstructure is formed on the substrate and has therein a first material with a concentration gradient toward one side of the substrate to provide a first built-in electric field. The active layer is mounted on the first microstructure so as to reduce recombination of electrons and holes in the cell.
    Type: Application
    Filed: June 12, 2012
    Publication date: December 12, 2013
    Applicant: Bureau of Energy Ministry of Economic Affairs
    Inventors: Wen-Chi Hou, Tung-Hsien Wu, Chih-Jui Ni, Jyong-Sian Tsai, Wen-Yi Tsai, Chau-Nan Hong
  • Publication number: 20130199602
    Abstract: A solar cell includes a substrate; multiple silicon rods formed on a surface of the substrate; an insulator layer formed on the surface of the substrate while the silicon rods are still exposed; a silicon shell layer formed on outside of each of the silicon rods; and a InxGa1?xAsyP1?y layer formed on the silicon shell layer to form a first cell, wherein 0?x?1 and 0?y?1.
    Type: Application
    Filed: February 3, 2012
    Publication date: August 8, 2013
    Applicant: Bureau of Energy Ministry of Economic Affairs
    Inventors: Wen-Chi Hou, Tung-Hsien Wu, Chih-Jui Ni, Jyong-Sian Tsai, Wen-Yi Tsai, Chau-Nan Hong
  • Publication number: 20120024359
    Abstract: A thermophotovoltaic system is described. The thermophotovoltaic system includes a chamber body, an emitter, a filter and a photovoltaic cell. The chamber body has an ellipsoid chamber including a first focus and a second focus. The emitter is disposed on the first focus, and the emitter is suitable for emitting a plurality of electromagnetic waves. The filter is surrounding the emitter to filter the electromagnetic waves and to pass the electromagnetic waves with a predetermined wavelength band. The photovoltaic cell is disposed on the second focus and is suitable for receiving the electromagnetic waves with the predetermined wavelength band.
    Type: Application
    Filed: December 3, 2010
    Publication date: February 2, 2012
    Applicant: NATIONAL CHENG KUNG UNIVERSITY
    Inventors: Wen-Chi HOU, Tung-Hsien WU, Chih-Jui NI, Chih-Lien CHIANG, Chau-Nan HONG
  • Publication number: 20110151134
    Abstract: A method for manufacturing a micro-nano imprint mould and an imprinting process are described. The method for manufacturing a micro-nano imprint mould includes: providing a mould body including a first surface and a second surface on opposite sides, wherein the mould body includes an imprinting pattern structure set in the first surface, and the imprinting pattern structure includes a plurality of concaves and a plurality of convexes between the concaves; and performing a surface treatment step on the first surface of the mould body to make a first contact angle form between an imprint fluid and the concaves and a second contact angle form between the imprint fluid and the convexes, wherein the first contact angle is different from the second contact angle.
    Type: Application
    Filed: December 23, 2009
    Publication date: June 23, 2011
    Applicant: NATIONAL CHENG KUNG UNIVERSITY
    Inventors: Yu-Chih KAO, Yoou-Bin GUO, Chau-Nan HONG, Min-Hsiung HON
  • Publication number: 20110148008
    Abstract: A micro-nano imprint mould and an imprinting process are described. The micro-nano imprint mould includes: a porous body including a first surface and a second surface on opposite sides, wherein the porous body includes a plurality of holes, and a fluid can flow between the first surface and the second surface through the holes; and an imprint pattern structure set in the first surface of the porous body, wherein the imprint pattern structure includes a plurality of convexes and a plurality of concaves between the convexes.
    Type: Application
    Filed: December 23, 2009
    Publication date: June 23, 2011
    Applicant: NATIONAL CHENG KUNG UNIVERSITY
    Inventors: Yoou-Bin GUO, Yu-Chih KAO, Chau-Nan HONG
  • Publication number: 20100229920
    Abstract: A solar concentrator is described. The solar concentrator includes a plane including a plurality of concentrating elements, wherein each concentrating element includes a hollow taper including a first opening; and at least one photoelectric conversion layer covering inner side surfaces of the concentrating elements.
    Type: Application
    Filed: March 15, 2010
    Publication date: September 16, 2010
    Applicant: NATIONAL CHENG KUNG UNIVERSITY
    Inventors: Chau-Nan HONG, Shu-Chun CHU, Wang-Chieh YU, Shan-Bin CHANG, Min-Hsiung HON
  • Patent number: 7618574
    Abstract: A synthesis for a silated acidic polymer by a copolymerization of several monomers includes one acidic monomer and one silated monomer. The silated acidic polymer is used as a resist barrier in imprint lithography and is easily removed by an environmental basic aqua-solution during the stripping process without using RIE (reactive ion etching) process or organic solvent at the last step of resist stripping so that the throughput is enhanced and good etching resistibility together with cost-saving is obtained.
    Type: Grant
    Filed: July 14, 2005
    Date of Patent: November 17, 2009
    Assignee: National Cheng Kung University
    Inventors: Lien-Chung Hsu, Weng-Chung Liao, Min-Hsiung Hon, Chau-Nan Hong
  • Publication number: 20070205180
    Abstract: A polymer resist having a good flow is used in a nanoimprint lithography. A residual layer remained is thus thinner. Hence, a time spent for etching the residual layer is reduced. And a pattern obtained after the nanoimprint lithography will not be ruined because of a long-time etching. Nevertheless, the present invention can be applied on a hard substrate, like a silicon chip, or a soft substrate, like PET.
    Type: Application
    Filed: January 19, 2007
    Publication date: September 6, 2007
    Applicant: National Cheng Kung University
    Inventors: Weng-Chung Liao, Steve Hsu, Min-Hsiung Hon, Chau-Nan Hong
  • Publication number: 20070012652
    Abstract: The present invention processes a synthesis for a silated acidic polymer by a copolymerization of several monomers including one acidic monomer and one silated monomer. The silated acidic polymer is used as a resist barrier in imprint lithography and is easily removed by an environmental basic aqua-solution during the stripping process without using RIE (reactive ion etching) process or organic solvent at the last step of resist stripping so that the throughput is enhanced and good etching resistibility together with cost-saving is obtained.
    Type: Application
    Filed: July 14, 2005
    Publication date: January 18, 2007
    Inventors: Lien-Chung Hsu, Weng-Chung Liao, Min-Hsiung Hon, Chau-Nan Hong
  • Patent number: 7063939
    Abstract: The present invention relates a method for high aspect ratio pattern transfer, by using combination of imprint and Step and Flash techniques to transfer high aspect ratio pattern. The present invention simultaneously saves the developing time and the amount of developer used during the photo-resist pattern transfer process. The present invention is able to avoid separation and dissolution between pattern and substrate that is attacked by developer, and is able to yield high aspect ratio patterns.
    Type: Grant
    Filed: February 20, 2004
    Date of Patent: June 20, 2006
    Assignee: National Cheng Kung University
    Inventors: Weng-Chung Liao, Lien-Chung Hsu, Po-I Lee, Min-Hsiung Hon, Chau-Nan Hong
  • Publication number: 20060045988
    Abstract: A pretreatment process of a substrate in a micro/nano imprinting technology is disclosed, comprising deposing the substrate on a holder and performing a plasma treatment or an ion treatment on the substrate. In the plasma treatment of the substrate, a reactive gas is first injected into the chamber to form a plasma, such that the plasma causes a physical reaction and a chemical reaction on the substrate to activate the substrate surface and also remove particles and contaminants adhering to the substrate surface. When the ion treatment is performed on the substrate, an ion source is placed into the chamber and ions and neutral atoms generated by the ion source bombard the substrate, causing a physical reaction and a chemical reaction on the substrate to activate the substrate surface and also remove particles and contaminants adhering to the substrate surface.
    Type: Application
    Filed: August 26, 2005
    Publication date: March 2, 2006
    Inventors: Yoou-Bin Guo, Chiao-Yang Cheng, Chau-Nan Hong, Min-Hsiung Hon