Abstract: An ESD protection circuit is implemented for a semiconductor device having a first circuit system operating with a first power supply voltage and a first complementary power supply voltage, and a second circuit system operating with a second power supply voltage and a second complementary power supply voltage. The ESD protection circuit includes a first diode having an anode coupled to the first power supply voltage and a cathode coupled to a first node connecting the first circuit system and the second circuit system for preventing a crosstalk of current between the first power supply voltage and the second complementary power supply voltage. A first MOS transistor module is coupled between the first node and the first complementary power supply for selectively creating a current path from the first node to the first complementary supply voltage for dissipating an ESD current during an ESD event.

Abstract: An ESD protection circuit is implemented for a semiconductor device having a first circuit system operating with a first power supply voltage and a first complementary power supply voltage, and a second circuit system operating with a second power supply voltage and a second complementary power supply voltage. The ESD protection circuit includes a first diode having an anode coupled to the first power supply voltage and a cathode coupled to a first node connecting the first circuit system and the second circuit system for preventing a crosstalk of current between the first power supply voltage and the second complementary power supply voltage. A first MOS transistor module is coupled between the first node and the first complementary power supply for selectively creating a current path from the first node to the first complementary supply voltage for dissipating an ESD current during an ESD event.

Abstract: In accordance with the objectives of the invention a new arrangement is provided for ESD protection of mounted flip chips. In a first embodiment of the invention, the Input/Output cells and power cells are provided with ESD protection that is connected to a dedicated bump pad. The substrate of the flip chip package interconnects all of the dedicated bump pads, completing the ESD network. Under the second embodiment of the invention, the Input/Output cells and power cells are provided with ESD protection that is connected to a dedicated bump pad, a last metal layer interconnects all of the dedicated bump pads, completing the ESD network.

Abstract: An electrostatic discharge (ESD) protection circuit is provided for use in an integrated circuit (IC) to provide protection against an ESD on a contact pad of the IC. The IC includes a driver circuit. The ESD protection circuit is connectable to a first power supply voltage and includes an ESD protection device connectable between the contact pad and the first power supply voltage and a capacitor connectable between the contact pad and the driver circuit.

Abstract: In accordance with the objectives of the invention a new arrangement is provided for ESD protection of mounted flip chips. In a first embodiment of the invention, the Input/Output cells and power cells are provided with ESD protection that is connected to a dedicated bump pad. The substrate of the flip chip package interconnects all of the dedicated bump pads, completing the ESD network. Under the second embodiment of the invention, the Input/Output cells and power cells are provided with ESD protection that is connected to a dedicated bump pad, a last metal layer interconnects all of the dedicated bump pads, completing the ESD network.

Abstract: In accordance with the objectives of the invention a new method is provided for ESD protection of mounted flip chips. In a first embodiment of the invention, the Input/Output cells and power cells are provided with ESD protection that is connected to a dedicated bump pad. The substrate of the flip chip package interconnects all of the dedicated bump pads, completing the ESD network. Under the second embodiment of the invention, the Input/Output cells and power cells are provided with ESD protection that is connected to a dedicated bump pad, a last metal layer interconnects all of the dedicated bump pads, completing the ESD network.

Abstract: In accordance with the objectives of the invention a new method is provided for ESD protection of mounted flip chips. In a first embodiment of the invention, the Input/Output cells and power cells are provided with ESD protection that is connected to a dedicated bump pad. The substrate of the flip chip package interconnects all of the dedicated bump pads, completing the ESD network. Under the second embodiment of the invention, the Input/Output cells and power cells are provided with ESD protection that is connected to a dedicated bump pad, a last metal layer interconnects all of the dedicated bump pads, completing the ESD network.

Abstract: A protection device for preventing power-on sequence induced latch-up, which device is used in a power supply system having a first power supply and a second power supply wherein the voltage of the first power supply is higher than that of the second power supply.

Abstract: A circuit for evaluating the asymmetric antenna effect of a transistor pair is provided, which can be implemented by using bipolar or complementary metal oxide semiconductor (CMOS) transistors to implement a differential amplifier, with which a pair of transistors Q1 and Q2 having similar characteristics are connected. The transistors Q1 and Q2 have a structure of, for example, one polysilicon layer and three metal layers, in which a second metal layer M2 and a third metal layer M3 are used for signal input, and metal layer M1 close to the gate oxide layer of both the transistors Q1 and Q2 are used to obtain a differential antenna ratio. The differential amplifier comprises transistors Q3 and Q4 serving as an active load, and transistor Q5, which is used for adjusting the voltage gain.

Abstract: A capacitor-triggered electrostatic discharge (ESD) protection circuit is disposed between a metal pad and V.sub.ss potential level, wherein the pad may be an input pad, an output pad, or a V.sub.DD power rail. The circuit includes a thick oxide device, a capacitor, and a resistor. The thick oxide device is configured with its drain and source connected to the pad and circuit ground V.sub.SS, respectively. The gate of the thick oxide device is tied to the pad, and the oxide device bulk is coupled by the resistor to circuit ground V.sub.SS. The capacitor is connected between the pad and the bulk of the thick oxide device. The bulk of the device is constructed by a P-well region formed in a substrate. The capacitor is formed between the pad and a polysilicon layer just therebelow, without consuming extra layout areas.

Abstract: An apparatus and method for use in a semiconductor memory device to reduce internal circuit damage resulting from the effects of electro-static discharge (ESD) on a bitline pull-up or other type of circuit. Each of a plurality of bitlines in the memory device are coupled to a source terminal of a corresponding N-type MOSFET. Each source terminal is formed in a separate corner portion of at least one active region of the memory device, and is coupled to a given bitline via a bitline contact arranged in the corner portion. Each drain terminal of the N-type MOSFETS is formed from another portion of the active region and is coupled to a VDD supply of the memory device via a VDD contact. A gate terminal of a given MOSFET is formed from a polysilicon gate region overlying a channel in the active region. The gate region has an approximately 90.degree.

Abstract: An electrostatic discharge protection circuit formed in a semiconductor substrate includes a vertical bipolar junction transistor having a base which is grounded, an emitter connected to an output/input bonding pad of an integrated circuit, and a collector connected to a high power source via a resistor. The resistor is a parasitic resistor created by controlling the distance between the diffusion regions or the distance between a p-type well region and an n-type well region or formed by a lightly doped diffusion region in the semiconductor substrate to prevent current crowding and increase electrostatic protection.

Abstract: A CMOS device containing a plurality of hexagon cells over a semiconductor substrate is disclosed. Each hexagon cell includes a hexagonal ring gate, a drain diffusion region and a source diffusion region. The hexagonal ring gate is made of conducting materials and a dielectric layer over the substrate, therefore defining a channel region in the substrate between the gate and the substrate. The entire drain diffusion region in the substrate is enclosed by the hexagonal ring gate. The source diffusion region surrounds the hexagonal ring gate in the substrate. Each hexagon cell further provides a drain contact in the center of the drain diffusion region. A plurality of source contacts are arranged around the ring gate over the substrate. The hexagon cells of a unique hexagon device are surrounded by a first guard ring and a second guard ring. The hexagon device can be used as a CMOS output buffer or input ESD protection circuit to reduce the layout area of an integrated circuit.

Abstract: An electrostatic discharge (ESD) protection device includes a drain region and a source region, each having a heavily-doped region and a lightly-doped region, wherein the junction depth of the lightly-doped region is deeper than that of the heavily doped region. Accordingly, the ESD current density will be decreased owing to the enlarged junction area during the ESD event. In addition, the heat dissipation can be spread over the enlarged junction area instead of being focused on the drain cylindrical edge. Moreover, low parasitic capacitance in the bond pad is achieved because the junction capacitance of the lightly-doped region is smaller than that of the heavily-doped region. Furthermore, conducting blocks are arranged between the lightly-doped regions and the source/drain electrodes, respectively, to prevent the metal melt filament from spiking the junction.

Abstract: A bit-line pull-up circuit for an SRAM device which utilizes an improved diffusion structure for enhanced immunity of the SRAM device against electrostatic discharge. The improved diffusion structure includes an undivided diffusion region that serves as a common drain for a plurality of MOS transistors. The undivided diffusion region has at least a pair of recessed diffusion edges formed on opposite sides thereof. The forming of the recessed diffusion edges prevents the so-called electrical field crowding effect and also enhances ESD immunity for the MOS transistor. Further, since the drain diffusion region is an undivided area, an increased number of metal contact windows are provided therein, and at least one of the metal contact windows is arranged substantially between the two recessed diffusion edges. In the event of an electrostatic discharge, this allows the discharge current flowing into the drain to be divided into a greater number of small-magnitude currents flowing to the source.

Abstract: An electrostatic discharge protection network which diverts ESD stress arising between any two contact pads of an IC device, in order to prevent damage to the internal circuitry of the IC device. An ESD discharge bus is arranged around the periphery of an IC chip. Between each IC pad and the discharge bus, there is a protection circuit to directly bypass an ESD stress arising at any two IC pads. Each ESD protection circuit includes a diode, a thick-oxide device, a resistor, and a capacitor. The protection circuit is operated in snapback mode without causing breakdown. Therefore, the triggering voltage of the ESD protection circuit is lowered to the level of the snapback voltage but not to the level of the breakdown voltage.

Abstract: The present invention is an electronic device, and more particularly an MOS transistor. A square-type layout style is used to realize the MOS device. By using the present layout style, the output driving/sinking capability of output buffers as well as the ESD protection capability of NMOS and PMOS devices in output buffers or input ESD protection circuits are significantly improved within smaller layout area. Both drain diffusion area and drain-to-bulk parasitic capacitance at the output node are reduced by this square-type layout. Devices using the present layout style can be assembled to form larger, rectangular (or square) and similarly functioning devices. Thus, the present square-type layout style is very attractive to submicron CMOS VLSI/ULSI in high-density and high-speed applications.

Abstract: An electrostatic discharge (ESD) protection circuit connected to an integrated circuit pad for protecting an internal circuit from ESD damage. The ESD protection circuit includes an NMOS/PMOS transistor, a capacitor, and a load. The NMOS/PMOS is configured with a drain connected to the IC pad and a source for connection to the circuit V.sub.SS /V.sub.DD. A gate of the NMOS/PMOS transistor is tied to the source. The capacitor is connected between the IC pad and the bulk of the NMOS/PMOS transistor. The load, which is either another NMOS/PMOS transistor or a resistor, is to be connected between the V.sub.SS /V.sub.DD and the bulk of the NMOS/PMOS transistor. In accordance with the invention, the NMOS/PMOS transistor is fabricated in a P-well/N-well region of a semiconductor substrate. The capacitor includes an IC pad and a polysilicon layer therebelow, with an intervening dielectric layer.

Abstract: An electrostatic discharge (ESD) protection circuit is disposed between a metal pad and a circuit ground, wherein the pad may be an input pad or an output pad. The circuit includes a thick oxide device, a capacitor, and an NMOS transistor. The thick oxide device is configured with its drain and source connected to the pad and circuit ground, respectively. The gate of the thick oxide device is tied to the pad, and the oxide device bulk is connected to the drain of the NMOS transistor. The NMOS transistor is configured with its source connected to the circuit ground and its gate controlled by a power rail. The capacitor is connected between the pad and the bulk of the thick oxide device. The bulk of the device is constructed by a P-well region formed in a substrate. The capacitor is formed between the pad and a polysilicon layer just therebelow, without consuming extra layout area.

Abstract: An electrostatic discharge (ESD) protection circuit connected to an integrated circuit pad for protecting an internal circuit from ESD damage. The ESD protection circuit includes an NMOS/PMOS transistor, a capacitor, and a load The NMOS/PMOS is configured with a drain connected to the IC pad and a source for connection to the circuit VSS/VDD. Agate of the NMOS/PMOS transistor is tied to the source. The capacitor is connected between the IC pad and the bulk of the NMOS/PMOS transistor The load, which is either another NMOS/PMOS transistor or a resistor, is to be connected between the VSS/VDD and the bulk of the NMOS/PMOS transistor. In accordance with the invention, the NMOS/PMOS transistor is fabricated in a P-well/N-well region of a semiconductor substrate. The capacitor includes an IC pad and a polysilicon layer therebelow, with an intervening dielectric layer.