Patents by Inventor Chaur Wu

Chaur Wu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20050235202
    Abstract: An automatic graphical layout printing system is described. In a distributed client server computer network, a print generation system is employed to convert documents and data objects generated and managed in various different formats into a generic electronic form format for print output. The print generation system imports form and content data comprising a document or similar data object. The graphical layout information and content data are extracted from the document to produce a stripped document. Metadata comprising rules that define the data field coordinate and type information within the document is generated from the graphical layout information and content data. New content data to be included in the document is then merged with the stripped document and metadata. A printable document consisting of the merged stripped document, metadata and content data is then generated.
    Type: Application
    Filed: April 20, 2004
    Publication date: October 20, 2005
    Inventors: Tsu-Wang Chen, Ting-Hu Wu, Chaur Wu
  • Patent number: 6705113
    Abstract: The refrigeration system for an ethylene plant comprises a closed loop tertiary refrigerant system containing methane, ethylene and propylene. The tertiary refrigerant from a compressor final discharge is separated into a methane-rich vapor fraction and two levels of propylene-rich liquids so as to provide various temperatures and levels of refrigeration in various heat exchange stages while maintaining a nearly constant refrigerant composition flowing back to the compressor and with the bulk of the total return refrigerant flow going to the first stage compressor section. This tertiary system can also be applied to an ethylene plant with a high pressure demethanizer.
    Type: Grant
    Filed: January 15, 2003
    Date of Patent: March 16, 2004
    Assignee: ABB Lummus Global Inc.
    Inventors: Vitus Tuan Wei, Qi Ma, James Tzong-Chaur Wu, Charles Sumner
  • Patent number: 6637237
    Abstract: The refrigeration system for an ethylene plant comprises a closed loop tertiary refrigerant system containing methane, ethylene and propylene. The tertiary refrigerant from a compressor is separated into an inter-stage discharge and the final compressor discharge to produce a methane-rich vapor fraction and two levels of propylene-rich liquids so as to provide various temperatures and levels of refrigeration in various heat exchange stages while maintaining a nearly constant refrigerant composition flowing back to the compressor and with the bulk of the total return refrigerant flow going to the first stage compressor section. This tertiary system can also be applied to an ethylene plant with a high pressure demethanizer.
    Type: Grant
    Filed: April 11, 2002
    Date of Patent: October 28, 2003
    Assignee: ABB Lummus Global Inc.
    Inventors: Vitus Tuan Wei, Qi Ma, James Tzong-Chaur Wu
  • Publication number: 20030192341
    Abstract: The refrigeration system for an ethylene plant comprises a closed loop tertiary refrigerant system containing methane, ethylene and propylene. The tertiary refrigerant from a compressor is separated into an inter-stage discharge and the final compressor discharge to produce a methane-rich vapor fraction and two levels of propylene-rich liquids so as to provide various temperatures and levels of refrigeration in various heat exchange stages while maintaining a nearly constant refrigerant composition flowing back to the compressor and with the bulk of the total return refrigerant flow going to the first stage compressor section. This tertiary system can also be applied to an ethylene plant with a high pressure demethanizer.
    Type: Application
    Filed: April 11, 2002
    Publication date: October 16, 2003
    Inventors: Vitus Tuan Wei, Qi Ma, James Tzong-Chaur Wu
  • Publication number: 20030192342
    Abstract: The refrigeration system for an ethylene plant comprises a closed loop tertiary refrigerant system containing methane, ethylene and propylene. The tertiary refrigerant from a compressor final discharge is separated into a methane-rich vapor fraction and two levels of propylene-rich liquids so as to provide various temperatures and levels of refrigeration in various heat exchange stages while maintaining a nearly constant refrigerant composition flowing back to the compressor and with the bulk of the total return refrigerant flow going to the first stage compressor section. This tertiary system can also be applied to an ethylene plant with a high pressure demethanizer.
    Type: Application
    Filed: January 15, 2003
    Publication date: October 16, 2003
    Inventors: Vitus Tuan Wei, Qi Ma, James Tzong-Chaur Wu, Charles Sumner