Abstract: The present invention is directed towards designing integrated circuit and provides systems and methods for lithography-aware floorplanning. According to one embodiment of the invention, a method for circuit floorplanning is provided. The method comprises generating a floorplan through a floorplanner, performing a lithography-analysis within the floorplanner on at least a portion of the floorplan, and generating one or more violations that result from the lithography-analysis. Some embodiment, in addition to viewing a floorplan, further comprise of modifying the floorplan. Furthermore, some embodiments provide a method that further comprises fixing the violations that result from the lithography analysis.

Abstract: Disclosed are methods, systems, computer program products for editing electrical circuits that facilitate and speed the layout of electrical circuits. Embodiments disclosed herein provide high-altitude editing capabilities to the user that enable the user to more easily select circuit items in congested layouts and schematic diagrams, and modify and arrange circuit items with respect to one another in congested layouts and schematic diagrams. Additional embodiments disclosed herein are directed to enabling EDA commands and the like to have context sensitivity, neighborhood awareness, and/or an ability to anticipate intentions of the user.

Abstract: Embodiments of the invention provide system and methods for EDA tools. Specifically, some embodiments of the invention provide an input infrastructure for EDA tools that gathers pertinent information surrounding an input cursor's present locality (or neighborhood) and then analyzes the pertinent information in view of an issued command to automatically determine suitable targets or subsequent operations that a user of the EDA tool may want to select next.