Patents by Inventor Che-Chang Hsu

Che-Chang Hsu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20210026236
    Abstract: A reticle, a reticle container and a method for discharging static charges accumulated on a reticle are provided. The reticle includes a mask substrate, a reflective multilayer (ML) structure, a capping layer, an absorption structure and a conductive material structure. The mask substrate has a front-side surface and a back-side surface. The reflective ML structure is positioned over the front-side surface of mask substrate. The capping layer is positioned over the reflective ML structure. The absorption structure is positioned over the capping layer. The conductive material structure is positioned over a sidewall surface of the mask substrate and a sidewall surface of the absorption structure.
    Type: Application
    Filed: October 8, 2020
    Publication date: January 28, 2021
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Hsiao-Lun CHANG, Chueh-Chi KUO, Tsung-Yen LEE, Tzung-Chi FU, Li-Jui CHEN, Po-Chung CHENG, Che-Chang HSU
  • Patent number: 10877378
    Abstract: A source for generating extreme ultraviolet (EUV) radiation includes a chamber enclosing a low pressure environment. A gas inlet is configured to provide a cleaning gas in the chamber. A plurality of exhaust ports, each having a corresponding gate valve including a scanner gate valve corresponding to an exhaust port separating the chamber from an EUV scanner are provided to the chamber. A pressure sensor is disposed inside the chamber and adjacent to the scanner gate valve. A controller is configured to control the gate valves other than the scanner gate valve based on an output of the pressure sensor.
    Type: Grant
    Filed: September 25, 2019
    Date of Patent: December 29, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Ssu-Yu Chen, Che-Chang Hsu, Chi Yang, Shang-Chieh Chien, Li-Jui Chen, Po-Chung Cheng
  • Publication number: 20200379357
    Abstract: A method of controlling a feedback system with a data matching module of an extreme ultraviolet (EUV) radiation source is disclosed. The method includes obtaining a slit integrated energy (SLIE) sensor data and diffractive optical elements (DOE) data. The method performs a data match, by the data matching module, of a time difference of the SLIE sensor data and the DOE data to identify a mismatched set of the SLIE sensor data and the DOE data. The method also determines whether the time difference of the SLIE sensor data and the DOE data of the mismatched set is within an acceptable range. Based on the determination, the method automatically validates a configurable data of the mismatched set such that the SLIE sensor data of the mismatched set is valid for a reflectivity calculation.
    Type: Application
    Filed: August 17, 2020
    Publication date: December 3, 2020
    Inventors: Yu-Chih HUANG, Chi YANG, Che-Chang HSU, Li-Jui CHEN, Po-Chung CHENG
  • Publication number: 20200350194
    Abstract: A reticle holding tool is provided. The reticle holding tool includes a housing, a reticle chuck, and a gas delivery assembly. The housing includes an opening, a top housing member, and a lateral housing member extending from the top housing member and terminating at a lower edge which is located on a predetermined plane. The reticle chuck is positioned in the housing and has an effective surface configured to secure a reticle. The effective surface is located between the predetermined plane and the top housing member. The reticle chuck is movable between two boundary lines that are perpendicular to the effective surface. A width of the opening is greater than a distance between the two boundary lines. The gas delivery assembly is positioned within the housing and configured to supply gas into the housing.
    Type: Application
    Filed: July 13, 2020
    Publication date: November 5, 2020
    Inventors: Chueh-Chi KUO, Tsung-Yen LEE, Chia-Hsin CHOU, Tzung-Chi FU, Li-Jui CHEN, Po-Chung CHENG, Che-Chang HSU
  • Patent number: 10802394
    Abstract: A reticle, a reticle container and a method for discharging static charges accumulated on a reticle are provided. The reticle includes a mask substrate, a reflective multilayer (ML) structure, a capping layer, an absorption structure and a conductive material structure. The mask substrate has a front-side surface and a back-side surface. The reflective ML structure is positioned over the front-side surface of mask substrate. The capping layer is positioned over the reflective ML structure. The absorption structure is positioned over the capping layer. The conductive material structure is positioned over a sidewall surface of the mask substrate and a sidewall surface of the absorption structure.
    Type: Grant
    Filed: January 31, 2018
    Date of Patent: October 13, 2020
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Hsiao-Lun Chang, Chueh-Chi Kuo, Tsung-Yen Lee, Tzung-Chi Fu, Li-Jui Chen, Po-Chung Cheng, Che-Chang Hsu
  • Publication number: 20200314990
    Abstract: A radiation source apparatus includes a vessel, a laser, a collector, a container, and a cone structure. The vessel has an exit aperture. The laser is at one end of the vessel and configured to excite a target material to form a plasma. The collector is in the vessel and configured to collect at least radiation of a desired wavelength emitted by the plasma and to direct the collected radiation to the exit aperture of the vessel. The container is configured to receive a residue of the plasma. The cone structure is between the collector and the exit aperture and located besides the container. The cone structure includes a first inner sidewall, and a second inner sidewall adjoining the first inner sidewall and closer to the container than the first inner sidewall, and a first baffle assembly on the first inner sidewall.
    Type: Application
    Filed: March 27, 2019
    Publication date: October 1, 2020
    Inventors: Ssu-Yu CHEN, Chi YANG, Che-Chang HSU, Shang-Chieh CHIEN, Li-Jui CHEN, Po-Chung CHENG
  • Patent number: 10791616
    Abstract: A radiation source apparatus includes a vessel, a laser, a collector, a container, and a cone structure. The vessel has an exit aperture. The laser is at one end of the vessel and configured to excite a target material to form a plasma. The collector is in the vessel and configured to collect at least radiation of a desired wavelength emitted by the plasma and to direct the collected radiation to the exit aperture of the vessel. The container is configured to receive a residue of the plasma. The cone structure is between the collector and the exit aperture and located besides the container. The cone structure includes a first inner sidewall, and a second inner sidewall adjoining the first inner sidewall and closer to the container than the first inner sidewall, and a first baffle assembly on the first inner sidewall.
    Type: Grant
    Filed: March 27, 2019
    Date of Patent: September 29, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Ssu-Yu Chen, Chi Yang, Che-Chang Hsu, Shang-Chieh Chien, Li-Jui Chen, Po-Chung Cheng
  • Patent number: 10747119
    Abstract: A method of controlling a feedback system with a data matching module of an extreme ultraviolet (EUV) radiation source is disclosed. The method includes obtaining a slit integrated energy (SLIE) sensor data and diffractive optical elements (DOE) data. The method performs a data match, by the data matching module, of a time difference of the SLIE sensor data and the DOE data to identify a mismatched set of the SLIE sensor data and the DOE data. The method also determines whether the time difference of the SLIE sensor data and the DOE data of the mismatched set is within an acceptable range. Based on the determination, the method automatically validates a configurable data of the mismatched set such that the SLIE sensor data of the mismatched set is valid for a reflectivity calculation.
    Type: Grant
    Filed: September 11, 2019
    Date of Patent: August 18, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Yu-Chih Huang, Chi Yang, Che-Chang Hsu, Li-Jui Chen, Po-Chung Cheng
  • Patent number: 10714371
    Abstract: A reticle holding tool is provided. The reticle holding tool includes a housing including a top housing member and a lateral housing member. The lateral housing member extends from the top housing member and terminates at a lower edge. The reticle holding tool further includes a reticle chuck. The reticle chuck is positioned in the housing and configured to secure a reticle. The reticle holding tool also includes a gas delivery assembly. The gas delivery assembly is positioned within the housing and configured to supply gas into the housing.
    Type: Grant
    Filed: July 25, 2018
    Date of Patent: July 14, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Chueh-Chi Kuo, Tsung-Yen Lee, Chia-Hsin Chou, Tzung-Chi Fu, Li-Jui Chen, Po-Chung Cheng, Che-Chang Hsu
  • Publication number: 20200103746
    Abstract: A method of controlling a feedback system with a data matching module of an extreme ultraviolet (EUV) radiation source is disclosed. The method includes obtaining a slit integrated energy (SLIE) sensor data and diffractive optical elements (DOE) data. The method performs a data match, by the data matching module, of a time difference of the SLIE sensor data and the DOE data to identify a mismatched set of the SLIE sensor data and the DOE data. The method also determines whether the time difference of the SLIE sensor data and the DOE data of the mismatched set is within an acceptable range. Based on the determination, the method automatically validates a configurable data of the mismatched set such that the SLIE sensor data of the mismatched set is valid for a reflectivity calculation.
    Type: Application
    Filed: September 11, 2019
    Publication date: April 2, 2020
    Inventors: Yu-Chih HUANG, Chi YANG, Che-Chang HSU, Li-Jui CHEN, Po-Chung CHENG
  • Publication number: 20200103758
    Abstract: A source for generating extreme ultraviolet (EUV) radiation includes a chamber enclosing a low pressure environment. A gas inlet is configured to provide a cleaning gas in the chamber. A plurality of exhaust ports, each having a corresponding gate valve including a scanner gate valve corresponding to an exhaust port separating the chamber from an EUV scanner are provided to the chamber. A pressure sensor is disposed inside the chamber and adjacent to the scanner gate valve. A controller is configured to control the gate valves other than the scanner gate valve based on an output of the pressure sensor.
    Type: Application
    Filed: September 25, 2019
    Publication date: April 2, 2020
    Inventors: Ssu-Yu CHEN, Che-Chang HSU, Chi YANG, Shang-Chieh CHIEN, Li-Jui CHEN, Po-Chung CHENG
  • Publication number: 20190155139
    Abstract: A reticle, a reticle container and a method for discharging static charges accumulated on a reticle are provided. The reticle includes a mask substrate, a reflective multilayer (ML) structure, a capping layer, an absorption structure and a conductive material structure. The mask substrate has a front-side surface and a back-side surface. The reflective ML structure is positioned over the front-side surface of mask substrate. The capping layer is positioned over the reflective ML structure. The absorption structure is positioned over the capping layer. The conductive material structure is positioned over a sidewall surface of the mask substrate and a sidewall surface of the absorption structure.
    Type: Application
    Filed: January 31, 2018
    Publication date: May 23, 2019
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Hsiao-Lun CHANG, Chueh-Chi KUO, Tsung-Yen LEE, Tzung-Chi FU, Li-Jui CHEN, Po-Chung CHENG, Che-Chang HSU
  • Publication number: 20190148203
    Abstract: A reticle holding tool is provided. The reticle holding tool includes a housing including a top housing member and a lateral housing member. The lateral housing member extends from the top housing member and terminates at a lower edge. The reticle holding tool further includes a reticle chuck. The reticle chuck is positioned in the housing and configured to secure a reticle. The reticle holding tool also includes a gas delivery assembly. The gas delivery assembly is positioned within the housing and configured to supply gas into the housing.
    Type: Application
    Filed: July 25, 2018
    Publication date: May 16, 2019
    Inventors: Chueh-Chi KUO, Tsung-Yen LEE, Chia-Hsin CHOU, Tzung-Chi FU, Li-Jui CHEN, Po-Chung CHENG, Che-Chang HSU
  • Patent number: 10083377
    Abstract: A sensing method for a counterfeit bill detector includes (i) using multiple image-sensing modules to scan multiple pieces of image information of a bill and converting the multiple pieces of image information into multiple values of digital image, (ii) comparing each value of digital image with a pre-stored image threshold value to generate a reference value, (iii) adding the multiple reference values to generate an image validation value, (iv) comparing the image validation value with a pre-stored validation threshold value to acquire a comparison result, and (v) determining if the multiple pieces of image information are valid according to the comparison result. The sensing method tackles the issue of unsynchronized actions in bill sensing and bill scanning and simultaneously eliminates the problem of distorted scanned bill image arising from entry of misaligned bill to improve accuracy in bill validation.
    Type: Grant
    Filed: May 24, 2017
    Date of Patent: September 25, 2018
    Assignee: CLIMAX MACHINE INDUSTRY CO., LTD.
    Inventors: Tien-Lu Hsu, Chun-Yen Chen, Shin-Nung Lu, Jhih-Cheng Syu, Che-Chang Hsu
  • Publication number: 20180157935
    Abstract: A sensing method for a counterfeit bill detector includes (i) using multiple image-sensing modules to scan multiple pieces of image information of a bill and converting the multiple pieces of image information into multiple values of digital image, (ii) comparing each value of digital image with a pre-stored image threshold value to generate a reference value, (iii) adding the multiple reference values to generate an image validation value, (iv) comparing the image validation value with a pre-stored validation threshold value to acquire a comparison result, and (v) determining if the multiple pieces of image information are valid according to the comparison result. The sensing method tackles the issue of unsynchronized actions in bill sensing and bill scanning and simultaneously eliminates the problem of distorted scanned bill image arising from entry of misaligned bill to improve accuracy in bill validation.
    Type: Application
    Filed: May 24, 2017
    Publication date: June 7, 2018
    Applicant: CLIMAX MACHINE INDUSTRY CO., LTD.
    Inventors: Tien-Lu HSU, Chun-Yen CHEN, Shin-Nung LU, Jhih-Cheng SYU, Che-Chang HSU
  • Publication number: 20130103016
    Abstract: An automatic beauty therapy equipment contains a displacement driving device including a pedestal to be driven by a displacing mechanism so as to move straightly or curvedly in a first-axis direction, a second-axis direction, and a third-axis direction; a therapy device including a therapy element fixed in the pedestal; a controlling device including a controller electrically connecting with the displacement diving device and the therapy device, the controller being used to control the displacement driving device to urge the therapy element of the therapy device to move straightly or curvedly within a therapy area in the first-axis, the second-axis, and the third-axis directions, and the controller being served to set a therapy area so that the therapy element is driven to move vertically and swing with a curved profile of the therapy area to have a precise and stable beauty therapy in the therapy area.
    Type: Application
    Filed: December 17, 2011
    Publication date: April 25, 2013
    Inventors: Yi-San CHANG, Che-Chang Hsu, Shyang-Jye Chang, Sheau-Chiou Chao