Patents by Inventor Che-Hao CHEN

Che-Hao CHEN has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240162308
    Abstract: The present disclosure provides a semiconductor structure with having a source/drain feature with a central cavity, and a source/drain contact feature formed in central cavity of the source/drain region, wherein the source/drain contact feature is nearly wrapped around by the source/drain region. The source/drain contact feature may extend to a lower most of a plurality semiconductor layers.
    Type: Application
    Filed: February 9, 2023
    Publication date: May 16, 2024
    Inventors: Pin Chun SHEN, Che Chia CHANG, Li-Ying WU, Jen-Hsiang LU, Wen-Chiang HONG, Chun-Wing YEUNG, Ta-Chun LIN, Chun-Sheng LIANG, Shih-Hsun CHANG, Chih-Hao CHANG, Yi-Hsien CHEN
  • Patent number: 11951587
    Abstract: The present disclosure is directed to techniques of zone-based target control in chemical mechanical polishing of wafers. Multiple zones are identified on a surface of a wafer. The CMP target is achieved on each zone in a sequence of CMP processes. Each CMP process in the sequence achieves the CMP target for only one zone, using a CMP process selective to other zones.
    Type: Grant
    Filed: August 12, 2019
    Date of Patent: April 9, 2024
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Che-Liang Chung, Che-Hao Tu, Kei-Wei Chen, Chih-Wen Liu
  • Publication number: 20240105460
    Abstract: A method of removing a hard mask is provided. Gate stacks are patterned on a substrate, where the gate stacks include a polysilicon layer and the hard mask deposited over the polysilicon layer. A dielectric layer is deposited on the substrate and on the patterned gate stacks. A first portion of the dielectric layer is planarized by chemical mechanical polishing (CMP) to remove a topography of the dielectric layer. The hard mask and a second portion of the dielectric layer are removed by the CMP.
    Type: Application
    Filed: November 30, 2023
    Publication date: March 28, 2024
    Inventors: Che-Hao Tu, William Weilun Hong, Ying-Tsung Chen
  • Patent number: 11916487
    Abstract: An asymmetric half-bridge converter is provided. The asymmetric half-bridge converter includes a switch circuit, a resonance tank, a current sensor, and a controller. The current sensor senses a waveform of a resonance current flowing through the resonance tank to generate a sensing result. The controller determines the sensing result. When the sensing result indicates that an ending current value of a primary resonance waveform of the resonance current is greater than a predetermined value, the controller performs a first switching operation on the switch circuit. When the sensing result indicates that the ending current value of the primary resonance waveform is less than or equal to the predetermined value, the controller performs a second switching operation on the switch circuit.
    Type: Grant
    Filed: March 24, 2022
    Date of Patent: February 27, 2024
    Assignee: Power Forest Technology Corporation
    Inventors: Chao-Chang Chiu, Kuan-Chun Fang, Yueh-Chang Chen, Tzu-Chi Huang, Che-Hao Meng
  • Patent number: 11364605
    Abstract: A magnetic sleeve includes a body and a magnetic unit disposed in a second section of the body where a locking socket and a mounting hole are formed and communicating with each other. The mounting hole is enclosed by a peripheral wall while taking a reference point as center. The peripheral wall includes at least one engagement surface and at least one curved wall surface. Each engagement surface has two transition points for meeting the wall surface. The formation of one engagement surface or more engagement surfaces not only attains a firm engagement between the magnetic unit and the mounting hole but also forms a space therebetween to discharge air from the mounting hole smoothly, thereby preventing the magnetic unit from being broken during the installation. The space is also minimized to avoid undue accumulation of metal chips and allow the magnetic unit to be held in position stably.
    Type: Grant
    Filed: January 10, 2020
    Date of Patent: June 21, 2022
    Inventor: Che-Hao Chen
  • Publication number: 20210213591
    Abstract: A magnetic sleeve includes a body and a magnetic unit disposed in a second section of the body where a locking socket and a mounting hole are formed and communicating with each other. The mounting hole is enclosed by a peripheral wall while taking a reference point as center. The peripheral wall includes at least one engagement surface and at least one curved wall surface. Each engagement surface has two transition points for meeting the wall surface. The formation of one engagement surface or more engagement surfaces not only attains a firm engagement between the magnetic unit and the mounting hole but also forms a space therebetween to discharge air from the mounting hole smoothly, thereby preventing the magnetic unit from being broken during the installation. The space is also minimized to avoid undue accumulation of metal chips and allow the magnetic unit to be held in position stably.
    Type: Application
    Filed: January 10, 2020
    Publication date: July 15, 2021
    Inventor: CHE-HAO CHEN
  • Publication number: 20130333735
    Abstract: An umbrella includes a runner slidably mounted on a central shaft to spread and collapse rib-and-stretcher units to which a canopy is mounted. Each rib-and-stretcher unit includes a support rib, a stretcher, and an extension rib. When the runner is moved from an upper position to an uppermost position, each extension rib is driven to slide outwardly relative to a corresponding support rib via a pivot connection between a corresponding stretcher and the extension rib, and a main portion of the canopy is moved together with the extension ribs to outwardly draw a central portion of the canopy, which movably surrounds the central shaft, to partially cover each support rib.
    Type: Application
    Filed: January 30, 2013
    Publication date: December 19, 2013
    Inventor: Che-Hao CHEN