Abstract: Methods of making volume phase holograms and/or making computer-generated holograms using silver ion-exchanged silicate glass articles that include a photo-darkenable-refractive (PDR) glass plate and/or a photo-bleachable-refractive (PBR) glass plate. In one embodiment, a method of forming a volume phase hologram includes the steps of making a PBR glass plate that has at least one photosensitive glass layer of a silver ion-exchanged holographic recording (SIHR) glass, and of exposing the photosensitive glass layer to the bleaching-light radiation of laser write beams, causing the volume phase hologram to form in the photosensitive glass layer of the PBR glass plate. The base glass composition of the SIHR glass has been ion-exchanged in an aqueous ion-exchange solution containing silver ions. The SIHR glass is then uniformly darkened with darkening-light radiation.

Abstract: Silicate glasses for storing holographic data and for producing computer-generated holograms, including photo-darkenable-refractive (PDR) and photo-bleachable-refractive (PBR) glasses. In one embodiment, a PBR glass plate contains a photosensitive glass layer of a silver ion-exchanged holographic recording (SIHR) glass, with a base glass composition that has been ion-exchanged in an aqueous ion-exchange solution containing silver ions. The SIHR glass is uniformly darkened with darkening-light radiation, causing a refractive index change in the photosensitive glass layer upon exposure to bleaching-light radiation without any post-exposure steps. In another embodiment, an optical information recording medium includes a PDR glass plate containing SIHR glass optimized for multiplex recording and for reproducing information, which utilizes holography with darkening-light radiation as recording beams.

Abstract: A narrowly defined range of zinc silicate glass compositions is found to produce High Energy Beam Sensitive-glass (HEBS-glass) that possesses the essential properties of a true gray level mask which is necessary for the fabrication of general three dimensional microstructures with one optical exposure in a conventional photolithographic process. The essential properties are (1) A mask pattern or image is grainiless even when observed under optical microscope at 1000× or at higher magnifications. (2) The HEBS-glass is insensitive and/or inert to photons in the spectral ranges employed in photolithographic processes, and is also insensitive and/or inert to visible spectral range of light so that a HEBS-glass mask blank and a HEBS-glass mask are permanently stable under room lighting conditions. (3) The HEBS-glass is sufficiently sensitive to electron beam exposure, so that the cost of making a mask using an e-beam writer is affordable for at least certain applications.

Abstract: A narrowly defined range of zinc silicate glass compositions is found to produce High Energy Beam Sensitive-glass (HEBS-glass) that possesses the essential properties of a true gray level mask which is necessary for the fabrication of general three dimensional microstructures with one optical exposure in a conventional photolithographic process. The essential properties are (1) A mask pattern or image is grainiless even when observed under optical microscope at 1000× or at higher magnifications. (2) The HEBS-glass is insensitive and/or inert to photons in the spectral ranges employed in photolithographic processes, and is also insensitive and/or inert to visible spectral range of light so that a HEBS-glass mask blank and a HEBS-glass mask are permanently stable under room lighting conditions. (3) The HEBS-glass is sufficiently sensitive to electron beam exposure, so that the cost of making a mask using an e-beam writer is affordable for many applications.

Abstract: A narrowly defined range of zinc silicate glass compositions is found to produce High Energy Beam Sensitive-glass (HEBS-glass) that possesses the essential properties of a true gray level mask which is necessary for the fabrication of general three dimensional microstructures with one optical exposure in a conventional photolithographic process. The essential properties are (1) A mask pattern or image is grainiless even when observed under optical microscope at 1000× or at higher magnifications. (2) The HEBS-glass is insensitive and/or inert to photons in the spectral ranges employed in photolithographic processes, and is also insensitive and/or inert to visible spectral range of light so that a HEBS-glass mask blank and a HEBS-glass mask are permanently stable under room lighting conditions. (3) The HEBS-glass is sufficiently sensitive to electron beam exposure, so that the cost of making a mask using an e-beam writer is affordable for many applications.

Abstract: A narrowly defined range of zinc silicate glass compositions is found to produce High Energy Beam Sensitive-glass (HEBS-glass) that possesses the essential properties of a true gray level mask which is necessary for the fabrication of general three dimensional microstructures with one optical exposure in a conventional photolithographic process. The essential properties are (1) A mask pattern or image is grainiless even when observed under optical microscope at 1000× or at higher magnifications. (2) The HEBS-glass is insensitive and/or inert to photons in the spectral ranges employed in photolithographic processes, and is also insensitive and/or inert to visible spectral range of light so that a HEBS-glass mask blank and a HEBS-glass mask are permanently stable under room lighting conditions. (3) The HEBS-glass is sufficiently sensitive to electron beam exposure, so that the cost of making a mask using an e-beam writer is affordable for at least certain applications.

Abstract: A narrowly defined range of zinc silicate glass compositions is found to produce High Energy Beam Sensitive-glass (HEBS-glass) that possesses the essential properties of a true gray level mask which is necessary for the fabrication of general three dimensional microstructures with one optical exposure in a conventional photolithographic process. The essential properties are (1) A mask pattern or image is grainiless even when observed under optical microscope at 1000× or at higher magnifications. (2) The HEBS-glass is insensitive and/or inert to photons in the spectral ranges employed in photolithographic processes, and is also insensitive and/or inert to visible spectral range of light so that a HEBS-glass mask blank and a HEBS-glass mask are permanently stable under room lighting conditions. (3) The HEBS-glass is sufficiently sensitive to electron beam exposure, so that the cost of making a mask using an e-beam writer is affordable for at least certain applications.

Abstract: The invention relates to a high energy beam-sensitive glass (HEBS glass) exhibiting insensitivity and/or inertness to actinic radiation. Silver ion exchange in acidic aqueous solution results in a slab waveguide having a constant refractive index in the thickness dimension. Low loss single mode as well as multimode waveguides were fabricated with a great precision in the designed thickness and step index .DELTA.n. Channel waveguides were patterned and fabricated in one process step within a HEBS glass via a lithographic printing method using a high energy beam. Alternatively, predesigned pattern of channel waveguides were fabricated instantaneously upon direct write with a laser beam pattern generator employing a focused laser beam, within a HEBS glass which has been flood exposed to a high energy beam.

Abstract: The invention relates to high energy beam-sensitive glass articles exhibiting insensitivity and/or inertness to actinic radiation, glass articles which are darkened and/or colored within a thin surface layer of about 0.1-3 .mu.m upon exposure to a high energy beam, electron beam, and ion beams in particular, without a subsequent development step, and which need no fixing to stabilize the colored image, since both the recorded image and the glass article are insensitive to radiation in the spectral range of uv and longer wavelengths. The instant invention is concerned with Ag.sup.+ ion-exchanged glass articles having base glass within alkali metal silicate composition fields containing at least one of the oxides of transition metals which have one to four d-electrons in an atomic state. The base glass composition can be varied widely, spontaneous reduction as well as photo-reduction of Ag.sup.+ ions are inhibited and/or eliminated due to the presence of said transition metal oxides in the glass article.

Abstract: The invention relates to high energy beam-sensitive glass articles exhibiting insensitivity and/or inertness to artinic radiation, i.e., glass articles which are darkened and/or colored within a thin surface layer of, e.g., about 0.1-3 .mu.m upon exposure to high energy beams, electron beams, and ion beams in particular, without a subsequent development step, and which need no fixing to stabilize the colored image, since both the recorded image and the glass article are sensitive to radiation in the spectral range of UV, and longer, wavelengths. More particularly, the instant invention is concerned with Ag+ ion-exchanged glass articles having base glass within alkali metal silicate composition fields containing at least one of the oxides of transition metals which have one to four d-electrons in an atomic state.

Abstract: The invention relates to high energy beam-sensitive glass articles exhibiting insensitivity and/or inertness to actinic radiation, i.e., glass articles which are darkened and/or colored within a thin surface layer of, e.g., about 0.1-3 .mu.m upon exposure to a high energy beam, electron beam, and ion beams in particular, without a subsequent development step, and which need no fixing to stabilize the colored image, since both the recorded image and the glass article are sensitive to radiation in the spectral range of uv and longer wavelengths. More particularly, the instant invention is concerned with Ag.sup.+ ion-exchanged glass articles having base glass within alkali metal silicate composition fields containing at least one of the oxides of transition metals which have one to four d-electrons in an atomic state. Whereas the base glass composition can be varied widely, spontaneous reduction as well as photo-reduction of Ag.sup.

Abstract: The invention relates to high energy beam-sensitive glass articles exhibiting insensitivity and/or inertness to actinic radiation, i.e., glass articles which are darkened and/or colored within a thin surface layer of, e.g., about 0.1-3 .mu.m upon exposure to a high energy beam, electron beam, and ion beams in particular, without a subsequent development step, and which need no fixing to stabilize the colored image, since both the recorded image and the glass article are insensitive to radiation in the spectral range of uv and longer wavelengths. More particularly, the instant invention is concerned with Ag.sup.+ ion-exchanged glass articles having base glass within alkali metal silicate composition fields containing at least one of the oxides of transition metals which have one to four d-electrons in an atomic state. Whereas the base glass composition can be varied widely, spontaneous reduction as well as photo-reduction of Ag.sup.

Abstract: A method for providing a dispersion of a photosensitive silver and chlorine-containing polyphosphate in the pores of a porous 96% silica glass, and a photosensitive product thus produced, are described. The method includes introducing NaCl and KH.sub.2 PO.sub.4 into the pores using at least one liquid vehicle and at least partly removing the liquid vehicle from the pores. Thereafter, AgNO.sub.3 is introduced into the NaCl and KH.sub.2 PO.sub.4 -containing pores using an liquid vehicle before heating the porous glass support to remove remaining liquid vehicle and to react the NaCl, KH.sub.2 PO.sub.4, and AgNO.sub.3 to form a photosensitive silver and chlorine-containing polyphosphate material in situ in the pores of said support.

Abstract: A photosensitive material in the form of a silver and chlorine-containing polyphosphate which exhibits permanent visible darkening on exposure to ultraviolet or short wavelength visible light, is described.

Abstract: This invention is concerned with hydrated glass articles having base compositions within the Na.sub.2 O and/or K.sub.2 O-ZnO-Al.sub.2 O.sub.3 -SiO.sub.2 -Cl field and having at least a surface layer thereon containing Ag-AgCl crystals which impart photo-anisotropic effects to the glass articles. Silver ions are introduced into the surface layer through a solution ion exchange process with sodium and/or potassium ions of the parent glass. The silver remains in the ionic state until exposure to ultraviolet radiation which results in the development of silver-containing aggregates, i.e., Ag-AgCl, via a photolytic reaction. The aggregates contribute to photo-anisotropic absorption bands which are centered around 340 nm and 700 nm. Polarization of the photo-dichroic and photo-birefringent effects of the inventive products can be altered reversibly between two arbitrary directions without fatigue. The photo-anisotropic image can be read cyclically essentially indefinitely without destruction.

Abstract: The instant invention is directed to a method for writing and erasing images in the surface of a photosensitive glass which demonstrates photoanisotropic behavior at a mega Hz or higher rate. This is accomplished by utilizing an erasing beam of linearly-polarized red light having about a 45.degree. change in the direction of polarization from that of the writing beam. Also, this invention provides a method for preventing the alteration of an image written into said glass surface, the method involving exposing the area of the image to ultraviolet radiation.

Abstract: This invention is concerned with hydrated glass articles having base compositions within the Na.sub.2 O and/or K.sub.2 O--ZnO--Al.sub.2 O.sub.3 --SiO.sub.2 --Cl field and having at least a surface layer thereon containing Ag--AgCl crystals which impart photoanisotropic effects to the glass articles. Silver ions are introduced into the surface layer through a solution ion exchange process with sodium and/or potassium ions of the parent glass. The silver remains in the ionic state until exposure to ultraviolet radiation which results in the development of silver-containing aggregates, i.e., Ag-AgCl, via a photolytic reaction. The aggregates contribute to photo-anisotropic absorption bands which are centered around 340 nm and 700 nm. Polarization of the photo-dichroic and photo-birefringent effects of the inventive products can be altered reversibly between two arbitrary directions without fatigue. The photo-anisotropic image can be read cyclically essentially indefinitely without destruction.

Abstract: This invention is concerned with the preparation of glass articles containing silver ions which exhibit thermoplastic properties and may, optionally, demonstrate photosensitivity to ultraviolet radiation. Such articles are produced through the exchange of Ag.sup.+ ions for Na.sup.+ and/or K.sup.+ ions in a hydrated Na.sub.2 O and/or K.sub.2 O--SiO.sub.2 glass. The articles will demonstrate photosensitivity when the compositions thereof also contain halide ions.

Abstract: The present invention is directed to the preparation of hydrated glasses in the Na.sub.2 O-K.sub.2 O-PbO-SiO.sub.2 base composition system containing an amount of BaO and/or Y.sub.2 O.sub.3 and/or ZnO and/or ZrO.sub.2 effective to cause the hydrated glass to be essentially colorless. Such glasses are transparent, exhibit refractive indices higher than 1.60, and which demonstrate intrinsic thermoplastic properties thereby enabling such to be readily molded into optical quality components at relatively low temperatures. The operable glasses in the anhydrous state consist essentially, in mole percent on the oxide basis, of 8-18% Na.sub.2 O, 2-6% K.sub.2 O, 10-23% Na.sub.2 O + K.sub.2 O, >15 but <21% PbO, 55-67% SiO.sub.2, the mole ratio PbO:SiO.sub.2 being between 0.225-0.3, and an effective amount of BaO and/or Y.sub.2 O.sub.3 and/or ZnO and/or ZrO.sub.2 up to the indicated maxima of 5% BaO, 5% Y.sub.2 O.sub.3, 8% ZnO, and 5% ZrO.sub.2, BaO + Y.sub.2 O.sub.3 + ZnO + ZrO.sub.2 not exceeding 10%.

Abstract: A glass article having an optical quality surface smoothness can be formed by molding a "silanol" glass material against a die having a molding surface which is a mirror of that required for the glass article, thereby obviating glass grinding and polishing steps. The article is prepared by first forming an anhydrous base glass comprising, in mole percent on the oxide basis, about 72 to 82% SiO.sub.2, 10 to 17% Na.sub.2 O and/or K.sub.2 O, and 5 to 15% of an oxide or oxides selected from ZnO and PbO. The base glass may include up to 5% Al.sub.2 O.sub.3 and up to 3% of B.sub.2 O.sub.3, BaO and/or MgO. The anhydrous base glass is then hydrated to include a water content ranging from 0.5 to 10% by weight to form a "silanol" glass. That glass is then molded against the die surface at a temperature ranging from about 250.degree. C. to 500.degree. C.