Abstract: A handheld electric mixer has a rotational output spindle for holding mixer work pieces, first and second gears located on the rotational output spindle, and a motor. The first gear is rotationally coupled to the motor output shaft. The mixer includes a two-speed gear-box receiving torque from the motor, and transmitting the torque to the output spindle. The two-speed gear-box includes a rotational lay shaft axially parallel to the rotational output spindle, third and fourth gears located on the lay shaft, the third gear meshing with the first gear and the fourth gear meshing with the second gear. A selector mechanism selects between a first gear ratio and a second gear ratio and includes a clutch disk on the spindle, and moveable axially for alternatively engaging and rotatably locking the one of the third or fourth gears that is engaged with the clutch disk.

Abstract: A handheld electric mixer has a rotational output spindle for holding mixer work pieces, first and second gears located on the rotational output spindle, and a motor. The first gear is rotationally coupled to the motor output shaft. The mixer includes a two-speed gear-box receiving torque from the motor, and transmitting the torque to the output spindle. The two-speed gear-box includes a rotational lay shaft axially parallel to the rotational output spindle, third and fourth gears located on the lay shaft, the third gear meshing with the first gear and the fourth gear meshing with the second gear. A selector mechanism selects between a first gear ratio and a second gear ratio and includes a clutch disk on the spindle, and moveable axially for alternatively engaging and rotatably locking the one of the third or fourth gears that is engaged with the clutch disk.

Abstract: A capacitor structure and a method of fabricating the capacitor structure wherein. The lower electrode and the upper electrode are constructed to be separated from each other by a predetermined interval and to be engaged with each other using a series of alternating ridges so that an effective surface area can increase within a limited area.

Abstract: Semiconductor devices and methods for fabricating a semiconductor devices are disclosed. A disclosed method comprises: forming a first gate electrode functioning as a flash memory; forming first spacers on sidewalls of the first gate electrode; forming a second gate electrode functioning as a normal gate electrode; forming a source/drain region with a shallow junction by performing a first ion implantation process using at least one of the first spacers as a mask; forming second spacers on a sidewall of the first spacer and on sidewalls of the second gate electrode; forming a source/drain region with a deep junction by performing a second ion implantation process using the second spacers as a mask.

Abstract: A capacitor for a semiconductor device includes a first inter metal dielectric layer is disposed on a substrate. A first electrode is disposed on the first inter metal dielectric layer. A second electrode partially overlaps the first electrode. A first dielectric layer is disposed between the first and second electrodes. A third electrode partially overlaps the second electrode. A second dielectric layer is disposed between the second and third electrodes. An etch stop layer is disposed on the first, second, and third electrodes. A second inter metal dielectric layer is formed on the etch stop layer and includes first, second, and third via holes exposing the first and third electrodes and the etch stop layer. First, second, and third plugs are disposed in the first, second, and third via holes.

Abstract: A semiconductor device having a silicide-blocking layer is provided. The device includes a field oxide layer defining an active region, source/drain regions in the active region of a substrate, a gate oxide layer and a gate electrode on the substrate between the source/drain regions, dielectric spacers on sidewalls of the gate electrode, and a silicide layer on both the gate electrode and the source/drain regions. The device also includes the silicide-blocking layer formed over the border between the field oxide layer and the source/drain regions. The silicide-blocking layer covers edges of the source/drain regions, obstructing the extension of the silicide layer.

Abstract: A CMOS image sensor and fabricating method thereof are disclosed, by which a light condensing effect is enhanced by providing an inner microlens to a semiconductor substrate. The present invention includes a plurality of photodiodes on a semiconductor substrate, a plurality of inner microlenses on a plurality of the photodiodes, an insulating interlayer on a plurality of the inner microlenses, a plurality of metal lines within the insulating interlayer, a device protecting layer on the insulating interlayer, and a plurality of microlenses on the device protecting layer.

Abstract: A capacitor structure and a method of fabricating the capacitor structure wherein. The lower electrode and the upper electrode are constructed to be separated from each other by a predetermined interval and to be engaged with each other using a series of alternating ridges so that an effective surface area can increase within a limited area.

Abstract: Disclosed are a vertical-type capacitor and a formation method thereof. The capacitor includes a first electrode wall and a second electrode wall perpendicular to a semiconductor substrate, and at least one dielectric layer on the substrate to insulate the first electrode wall from the second electrode wall. The first electrode wall includes a plurality of first conductive layers and a plurality of first contacts, the plurality of first conductive layers being interconnected with each other by each of the plurality of first contacts. The second electrode wall includes a plurality of second conductive layers and a plurality of second contacts, the plurality of second conductive layers being interconnected with each other by each of the plurality of second contacts.

Abstract: A copper line on a semiconductor device and a method for forming the same is disclosed, wherein an insulating layer is deposited so as to minimize the dishing of IMD without using a dummy area when performing the planarization process. The method of forming the copper line on the semiconductor device includes the steps of forming an IMD on a semiconductor substrate including a lower metal layer, forming an isolation layer on the IMD, exposing the lower metal layer by patterning the IMD and the isolation layer, forming a copper layer on the exposed lower metal layer and the isolation layer, and planarizing the copper layer.

Abstract: A capacitor for a semiconductor device includes a first inter metal dielectric layer is disposed on a substrate. A first electrode is disposed on the first inter metal dielectric layer. A second electrode partially overlaps the first electrode. A first dielectric layer is disposed between the first and second electrodes. A third electrode partially overlaps the second electrode. A second dielectric layer is disposed between the second and third electrodes. An etch stop layer is disposed on the first, second, and third electrodes. A second inter metal dielectric layer is formed on the etch stop layer and includes first, second, and third via holes exposing the first and third electrodes and the etch stop layer. First, second, and third plugs are disposed in the first, second, and third via holes.

Abstract: An isolation method in a semiconductor device is disclosed. The example method sequentially forms a pad oxide layer and a pad nitride layer on a semiconductor substrate, patterns the pad nitride and oxide layers to form an opening exposing a portion of the substrate, and forms a trench in exposed portion of the substrate. The example method also etches the patterned pad nitride layer to extend the opening, carries out SAC oxidation on the extended opening and the trench to provide a rounded corner to an upper corner of the substrate in the vicinity of the trench, and fills the trench with an insulating layer.

Abstract: A method of fabricating a metal-insulator-metal capacitor in a semiconductor device is disclosed. An example method for fabricating an MIM capacitor of a semiconductor device deposits a metal layer to be used as a lower electrode of an MIM capacitor, deposits a sacrificial layer on the metal layer, and removes some part of the sacrificial layer to form the MIM capacitor thereon. In addition, the example method deposits a dielectric layer and an upper metal layer and forms the MIM capacitor by patterning the dielectric layer and the upper metal layer.