Patents by Inventor Chein-Hao Huang

Chein-Hao Huang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • PHOTOMASK AND METHOD OF FABRICATING A PHOTOMASK
    Publication number: 20100081065
    Abstract: A method of fabricating a photomask is provided. A masking layer (e.g., chrome) is deposited on a substrate. A plasma treatment may be performed on the chrome layer. A photoresist layer may be formed on the treated chrome layer. In an embodiment, the plasma treatment roughens the chrome layer. In an embodiment, the plasma treatment forms a barrier film on the chrome layer. The photoresist layer may be used to pattern a sub-resolution assist feature.
    Type: Application
    Filed: October 1, 2008
    Publication date: April 1, 2010
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Dong-Hsu Cheng, Chein-Hao Huang, Cheng-Ming Lin