Patents by Inventor Chelladurai Devadoss

Chelladurai Devadoss has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Gap fill materials and bottom anti-reflective coatings comprising hyperbranched polymers
    Patent number: 7754818
    Abstract: New anti-reflective or fill compositions having improved flow properties are provided. The compositions comprise a dendritic polymer dispersed or dissolved in a solvent system, and preferably a light attenuating compound, a crosslinking agent, and a catalyst. The inventive compositions can be used to protect contact or via holes from degradation during subsequent etching in the dual damascene process. The inventive compositions can also be applied to substrates (e.g., silicon wafers) to form anti-reflective coating layers having high etch rates which minimize or prevent reflection during subsequent photoresist exposure and developing.
    Type: Grant
    Filed: January 11, 2005
    Date of Patent: July 13, 2010
    Assignee: Brewer Science Inc.
    Inventors: Chelladurai Devadoss, Mandar Bhave, Runhui Huang
  • Gap fill materials and bottom anti-reflective coatings comprising hyperbranched polymers
    Patent number: 7745540
    Abstract: New anti-reflective or fill compositions having improved flow properties are provided. The compositions comprise a dendritic polymer dispersed or dissolved in a solvent system, and preferably a light attenuating compound, a crosslinking agent, and a catalyst. The inventive compositions can be used to protect contact or via holes from degradation during subsequent etching in the dual damascene process. The inventive compositions can also be applied to substrates (e.g., silicon wafers) to form anti-reflective coating layers having high etch rates which minimize or prevent reflection during subsequent photoresist exposure and developing.
    Type: Grant
    Filed: September 7, 2007
    Date of Patent: June 29, 2010
    Assignee: Brewer Science Inc.
    Inventors: Chelladurai Devadoss, Mandar Bhave, Runhui Huang
  • GAP FILL MATERIALS AND BOTTOM ANTI-REFLECTIVE COATINGS COMPRISING HYPERBRANCHED POLYMERS
    Publication number: 20080213544
    Abstract: New anti-reflective or fill compositions having improved flow properties are provided. The compositions comprise a dendritic polymer dispersed or dissolved in a solvent system, and preferably a light attenuating compound, a crosslinking agent, and a catalyst. The inventive compositions can be used to protect contact or via holes from degradation during subsequent etching in the dual damascene process. The inventive compositions can also be applied to substrates (e.g., silicon wafers) to form anti-reflective coating layers having high etch rates which minimize or prevent reflection during subsequent photoresist exposure and developing.
    Type: Application
    Filed: September 7, 2007
    Publication date: September 4, 2008
    Inventors: Chelladurai Devadoss, Mandar Bhave, Runhui Huang