Patents by Inventor Chen Chung Tai

Chen Chung Tai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of preventing tungsten plugs from corrosion
    Patent number: 6703301
    Abstract: Tungsten plugs are prevented from corrosion, during fabrication of semiconductor devices, where the tungsten plug is formed in a substrate and coupled with a wire formed on the substrate. The substrate is dipped into a non-ionic benign solvent which substantially discharges the charges accumulated on a surface of the wire, followed by a rinsing process to clean the surface of the wire and then spin-drying.
    Type: Grant
    Filed: April 26, 2002
    Date of Patent: March 9, 2004
    Assignee: Macronix International Co., Ltd.
    Inventors: Chen Chung Tai, Tung Ke-Wei, Chung Chia Chi, Lee Chun Hung
  • Method of etching a photoresist layer disposed on a semiconductor substrate
    Publication number: 20040040934
    Abstract: A method of etching a photoresist layer disposed on a substrate includes applying a hydrogen-containing reactive solution onto the substrate to react with the photoresist layer, applying deionized water onto the substrate, and applying ozonated deionized water onto the substrate to remove at least a portion of the photoresist layer. The hydrogen-containing reactive solution can be made up of a spike sulfuric acid solution or a spike sulfuric acid and hydrogen peroxide solution.
    Type: Application
    Filed: September 4, 2002
    Publication date: March 4, 2004
    Inventor: Chen Chung Tai
  • Method of preventing tungsten plugs from corrosion
    Publication number: 20030203625
    Abstract: Tungsten plugs are prevented from corrosion, during fabrication of semiconductor devices, where the tungsten plug is formed in a substrate and coupled with a wire formed on the substrate. The substrate is dipped into a non-ionic benign solvent which substantially discharges the charges accumulated on a surface of the wire, followed by a rinsing process to clean the surface of the wire and then spin-drying.
    Type: Application
    Filed: April 26, 2002
    Publication date: October 30, 2003
    Inventors: Chen Chung Tai, Tung Ke-Wei, Chung Chia Chi, Lee Chun Hung