Patents by Inventor Chen-Fu Chiang

Chen-Fu Chiang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11956563
    Abstract: A method for identifying video signal source is provided. The method includes the following steps. A first identification code is assigned to a first transmitter device by a receiver control unit of a receiver device. A first video data is transmitted by the first transmitter device. The first video data and a first identification image corresponding to the first identification code are combined as a first combined video data by the receiver control unit. The first combined video data is outputted to a display device by the receiver control unit.
    Type: Grant
    Filed: January 7, 2021
    Date of Patent: April 9, 2024
    Assignee: BenQ Corporation
    Inventors: Chia-Nan Shih, Chen-Chi Wu, Lin-Yuan You, Chin-Fu Chiang, Ron-Kun Tseng, Chuang-Wei Wu
  • Patent number: 11942433
    Abstract: In an embodiment, a structure includes: a first integrated circuit die including first die connectors; a first dielectric layer on the first die connectors; first conductive vias extending through the first dielectric layer, the first conductive vias connected to a first subset of the first die connectors; a second integrated circuit die bonded to a second subset of the first die connectors with first reflowable connectors; a first encapsulant surrounding the second integrated circuit die and the first conductive vias, the first encapsulant and the first integrated circuit die being laterally coterminous; second conductive vias adjacent the first integrated circuit die; a second encapsulant surrounding the second conductive vias, the first encapsulant, and the first integrated circuit die; and a first redistribution structure including first redistribution lines, the first redistribution lines connected to the first conductive vias and the second conductive vias.
    Type: Grant
    Filed: January 17, 2022
    Date of Patent: March 26, 2024
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chen-Hua Yu, Jen-Fu Liu, Ming Hung Tseng, Tsung-Hsien Chiang, Yen-Liang Lin, Tzu-Sung Huang
  • Patent number: 9583573
    Abstract: A compound semiconductor device is disclosed. The compound semiconductor device comprises a substrate having at least a first doped region and at least a second doped region; a semiconductor layer disposed on the substrate; and a buffer layer located between said substrate and said semiconductor layer; wherein doping conditions of said first doped region and said second doped region are different from each other; wherein said semiconductor layer has different thicknesses on locations corresponding to said first doped region and said second doped region respectively, and is formed as a structure with difference in thickness.
    Type: Grant
    Filed: October 31, 2014
    Date of Patent: February 28, 2017
    Assignee: EPISTAR CORPORATION
    Inventors: Chun-Ju Tun, Yi-Chao Lin, Chen-Fu Chiang, Cheng-Huang Kuo
  • Patent number: 9142621
    Abstract: A compound semiconductor device and method of fabricating the same according to the present invention is disclosed. The compound semiconductor device comprises a substrate having at least a first doped region and at least a second doped region, and a semiconductor layer disposed on the substrate, wherein doping conditions of said first doped region and said second doped region may be different from each other.
    Type: Grant
    Filed: August 26, 2013
    Date of Patent: September 22, 2015
    Assignee: Formosa Epitaxy Incorporation
    Inventors: Chun-Ju Tun, Yi-Chao Lin, Chen-Fu Chiang, Cheng-Huang Kuo
  • Publication number: 20150053997
    Abstract: A compound semiconductor device and method of fabricating the same according to the present invention is disclosed. The compound semiconductor device comprises a substrate having at least a first doped region and at least a second doped region, and a semiconductor layer disposed on the substrate, wherein doping conditions of said first doped region and said second doped region may be different from each other.
    Type: Application
    Filed: October 31, 2014
    Publication date: February 26, 2015
    Inventors: CHUN-JU TUN, YI-CHAO LIN, CHEN-FU CHIANG, CHENG-HUANG KUO
  • Publication number: 20140061860
    Abstract: A compound semiconductor device and method of fabricating the same according to the present invention is disclosed. The compound semiconductor device comprises a substrate having at least a first doped region and at least a second doped region, and a semiconductor layer disposed on the substrate, wherein doping conditions of said first doped region and said second doped region may be different from each other.
    Type: Application
    Filed: August 26, 2013
    Publication date: March 6, 2014
    Applicant: FORMOSA EPITAXY INCORPORATED
    Inventors: CHUN-JU TUN, YI-CHAO LIN, CHEN-FU CHIANG, CHENG-HUANG KUO
  • Publication number: 20050236636
    Abstract: In a GaN-based light-emitting diode structure, a transparent conductive oxide layer is formed as a window layer on a GaN contact layer having a surface textured layer, and the textured layer acts as an ohmic contact layer with the transparent conductive oxide layer. Therefore, it is possible to reduce effectively the contact resistance and the working voltage, while the optical guiding effect is interrupted by the textured layer, to obtain thereby an enhancement of light extraction efficiency and thus an increase in the external quantum yield.
    Type: Application
    Filed: April 23, 2004
    Publication date: October 27, 2005
    Inventors: Schang-Jing Hon, Mu-Jen Lai, Chi-Feng Chan, Jenn-Bin Huang, Chen-Fu Chiang