Abstract: A semiconductor structure includes a first interposer; a second interposer laterally adjacent to the first interposer, where the second interposer is spaced apart from the first interposer; and a first die attached to a first side of the first interposer and attached to a first side of the second interposer, where the first side of the first interposer and the first side of the second interposer face the first die.

Abstract: A method a for controlling a distribution sequence for a semiconductor device includes: acquiring the quantity of all chambers and an actual working duration of each radio frequency device in the machines; providing an optimal working duration of the radio frequency device to calculate an average interval; sorting all the data to form a first queue data set, and obtaining a difference between adjacent data in the first queue data set; using a difference between adjacent consecutive data as a feature value corresponding to the former or latter data in the consecutive data, and using data that does not correspond to the difference as a feature value corresponding to the data; obtaining a second queue data set and a third queue data set; and obtaining a distribution sequence of distributing N batches of wafers to all the radio frequency devices.

Abstract: Embodiments of the present disclosure provide a method and a device for determining a fabrication chamber. According to a current radio frequency power time of each of the fabrication chambers corresponding to adjacent process steps and service phases divided based on a service period of the fabrication chambers, a service phase is determined for the current radio frequency power time of each of the fabrication chambers. For target objects processed by the fabrication chambers in the current process step, fabrication chambers for the target objects to enter in a next process step are directly determined according to the service phase of the current radio frequency power time of each of the fabrication chambers.