Abstract: The present invention comprises a method for generating a pseudo-CT image volume from multiple MRI scans through determining and then applying multi-variable polynomial mapping functions. An exemplary example extracts intensity values of voxels in images from acquired multiple MRI scans and CT scan from a plurality of training subjects to determine a multi-variable high-degree polynomial function for each of three regions, which is then applied to voxels in corresponding regions from images of multiple MRI scans of the target subject to generate the pseudo-CT image volume.

Abstract: The present invention comprises a method for generating a pseudo-CT image volume from multiple MRI scans through determining and then applying multi-variable polynomial mapping functions. An exemplary example extracts intensity values of voxels in images from acquired multiple MRI scans and CT scan from a plurality of training subjects to determine a multi-variable high-degree polynomial function for each of three regions, which is then applied to voxels in corresponding regions from images of multiple MRI scans of the target subject to generate the pseudo-CT image volume.

Abstract: The invention relates to a composition for improving the syndrome of diabetes and complication thereof. The composition comprises an effective amount of Lactobacillus strain which is at least one selected from the group consisting of: Lactobacillus reuteri GMNL-89 strain, Lactobacillus gasseri GMNL-205 strain, Lactobacillus reuteri GMNL-263 strain and a pharmaceutical acceptable vehicle. The Lactobacillus gasseri GMNL-205 strain and Lactobacillus reuteri GMNL-263 strain are novel isolated Lactobacillus strains. In addition, the invention also relates to a novel use of the composition or the Lactobacillus strains for improving the syndrome of diabetes and complication thereof.

Abstract: The invention relates to a composition for improving the syndrome of diabetes and complication thereof. The composition comprises an effective amount of Lactobacillus strain which is at least one selected from the group consisting of: Lactobacillus reuteri GMNL-89 strain, Lactobacillus gasseri GMNL-205 strain, Lactobacillus reuteri GMNL-263 strain and a pharmaceutical acceptable vehicle. The Lactobacillus gasseri GMNL-205 strain and Lactobacillus reuteri GMNL-263 strain are novel isolated Lactobacillus strains. In addition, the invention also relates to a novel use of the composition or the Lactobacillus strains for improving the syndrome of diabetes and complication thereof.

Abstract: A method for forming shallow trench isolation (STI) structure including providing a substrate comprising an overlying hardmask layer; patterning the hardmask layer to form a hardmask layer opening for etching a trench through a substrate thickness portion; etching a trench according to the patterned overlying hardmask layer; carrying out a wet chemical oxidizing process to form an oxidized surface portion on the hardmask layer; carrying out a wet chemical etching process to remove at least a portion of the oxidized surface portion to form the hardmask opening having an enlarged width and the trench opening comprising rounded upper corners; and, forming a completed planarized STI structure filled with oxide.

Abstract: A process for forming a semiconductor device with multiple gate insulator thicknesses, wherein exposed surfaces of a semiconductor substrate are protected during a photoresist stripping procedure, has been developed. After growth of an insulator layer on the entire surface of a semiconductor substrate portions of the insulator layer not covered by a photoresist masking shape are selectively removed. A two step photoresist removal procedure is then employed initiating with an ozone water cycle which partially removes the photoresist shape while forming a thin silicon oxide layer on the portions of bare semiconductor surface. A acid-hydrogen peroxide mixture (SPM), is then used to complete the photoresist removal procedure including removal of photoresist residues, with the thin silicon oxide layer formed during the ozone water cycle protecting the previously bare underlying semiconductor surface.

Abstract: A molding machine (2) for producing a light guide plate includes an injection machine (20) and a mold (22). The mold includes a first plate (222) and a second plate (221). The first plate has a slanted side wall (2262), and the second plate has a side wall (2261) opposite to the side wall of the first plate. A cavity (226) for molding a light guide plate (3) is defined between the first plate and the second plate. A fluid passageway (229) for cooling and solidifying a transparent resin injected into the cavity is provided in the first plate. The fluid passageway of the first plate is parallel to the side wall of the second plate. This enables molten resin to dissipate heat uniformly. The molten resin undergoes little or no strain as it cools and solidifies, and the resulting molded light guide plate has little or no internal strain.