Patents by Inventor Chen Max

Chen Max has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20030219978
    Abstract: The present invention provides an apparatus for liquid phase deposition, comprising: a saturation reaction system, including a mixture trough, at least two supply devices for raw materials, a stirrer device, a filter device, and valve control devices; a steady-flow over-saturation loop reaction system, including an over-saturation reaction trough, at least one liquid level control trough, at least two supply devices for raw materials, a stirrer device, a filter device, and valve control devices; an automatic solution concentration monitoring system, for controlling the reactant concentrations; and a waste liquid recycling system, comprising at least two storage troughs, a recycled waste liquid level sensor, a recycled waste liquid sensor, and valve control devices.
    Type: Application
    Filed: December 23, 2002
    Publication date: November 27, 2003
    Applicant: Industrial Technology Research Institute
    Inventors: Muh-Wang Liang, Pang-Min Chiang, Chen Max, Jen-Rong Huang, Ching-Fa Yeh
  • Patent number: 6653245
    Abstract: A method for liquid phase deposition, including the steps of providing at least two raw materials from at least two supply devices of a saturation reaction system into a mixture trough and stirring until saturation occurs, filtering out unnecessary solid-state particles, and providing saturated and filtered liquid into an over-saturation reaction trough of a steady-flow over-saturation loop reaction system and stopping the saturated and filtered liquid when the over-saturation reaction trough is filled and the saturated and filtered liquid over-flows into a liquid level control trough to a pre-determined level. The method also includes the steps of providing a substrate in the over-saturation reaction trough, providing reactants from at least two supply devices into the over-saturation reaction trough, and depositing a thin film onto the substrate when the saturated liquid becomes over-saturated.
    Type: Grant
    Filed: June 6, 2001
    Date of Patent: November 25, 2003
    Assignee: Industrial Technology Research Institute
    Inventors: Muh-Wang Liang, Pang-Min Chiang, Chen Max, Jen-Rong Huang, Ching-Fa Yeh
  • Publication number: 20020173170
    Abstract: The present invention provides an apparatus for liquid phase deposition, comprising: a saturation reaction system, including a mixture trough, at least two supply devices for raw materials, a stirrer device, a filter device, and valve control devices; a steady-flow over-saturation loop reaction system, including an over-saturation reaction trough, at least one liquid level control trough, at least two supply devices for raw materials, a stirrer device, a filter device, and valve control devices; an automatic solution concentration monitoring system, for controlling the reactant concentrations; and a waste liquid recycling system, comprising at least two storage troughs, a recycled waste liquid level sensor, a recycled waste liquid sensor, and valve control devices.
    Type: Application
    Filed: June 6, 2001
    Publication date: November 21, 2002
    Applicant: Industrial Technology Research Institute
    Inventors: Muh-Wang Liang, Pang-Min Chiang, Chen Max, Jen-Rong Huang, Ching-Fa Yeh