Patents by Inventor Chen MEI

Chen MEI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11979202
    Abstract: An emulated card selection method is implemented on a mobile device having a near field communication (NEC) NFC function. A first emulated card and a second emulated card are configured on the mobile device, When detecting an NFC radio frequency field, the mobile device detects whether there is fingerprint input. The mobile device selects the first emulated card if there is the fingerprint input. The mobile device selects the second emulated card if there is no fingerprint input. The mobile device performs NEC interaction with the NFC card reader based on the selected first emulated card or second emulated card. The mobile device can automatically select an emulated card in different emulated cards based on a card swiping status when a user uses an NEC emulated card.
    Type: Grant
    Filed: December 29, 2017
    Date of Patent: May 7, 2024
    Assignee: HUAWEI TECHNOLOGIES CO., LTD.
    Inventors: Sishan Wang, Xinmiao Chang, Xiaona Zhao, Jingqing Mei, Chen Dong
  • Patent number: 11959826
    Abstract: The disclosure is an engine simulation test device capable of realizing an ultrahigh compression temperature and pressure, belonging to the field of a diesel engine high-temperature and high-pressure system, solving the problems that the existing engine simulation test cannot achieve ultra-high compression temperature and pressure, and the temperature and pressure are not adjustable. It includes a compressed air inlet mechanism, a nitrogen gas inlet mechanism, a pressure stabilizing mechanism, a cyclic heating mechanism, an air inlet mechanism and a fast compressor mechanism.
    Type: Grant
    Filed: December 29, 2021
    Date of Patent: April 16, 2024
    Assignee: HARBIN ENGINEERING UNIVERSITY
    Inventors: Long Liu, Yue Wu, Dai Liu, Qian Xiong, Xinru Shi, Shihai Liu, Chen An, Qihao Mei
  • Publication number: 20230289211
    Abstract: A processor supports new thread group hierarchies by centralizing work distribution to provide hardware-guaranteed concurrent execution of thread groups in a thread group array through speculative launch and load balancing across processing cores. Efficiencies are realized by distributing grid rasterization among the processing cores.
    Type: Application
    Filed: March 10, 2022
    Publication date: September 14, 2023
    Inventors: Gentaro HIROTA, Tanmoy MANDAL, Jeff TUCKEY, Kevin STEPHANO, Chen MEI, Shayani DEB, Naman GOVIL, Rajballav DASH, Ronny KRASHINSKY, Ze LONG, Brian PHARRIS
  • Publication number: 20230236878
    Abstract: In various embodiments, scheduling dependencies associated with tasks executed on a processor are decoupled from data dependencies associated with the tasks. Before the completion of a first task that is executing in the processor, a scheduling dependency specifying that a second task is dependent on the first task is resolved based on a pre-exit trigger. In response to the resolution of the scheduling dependency, the second task is launched on the processor.
    Type: Application
    Filed: January 25, 2022
    Publication date: July 27, 2023
    Inventors: Jack Hilaire CHOQUETTE, Rajballav DASH, Shayani DEB, Gentaro HIROTA, Ronny M. KRASHINSKY, Ze LONG, Chen MEI, Manan PATEL, Ming Y. SIU
  • Patent number: 9236429
    Abstract: A semiconductor structure includes a substrate, a dam element, a first isolation layer, a second isolation layer, and a conductive layer. The substrate has a conductive pad, a trench, a sidewall, a first surface, and a second surface opposite to the first surface. The conductive pad is located on the second surface. The trench has a first opening at the first surface, and has a second opening at the second surface. The dam element is located on the second surface and covers the second opening. The dam element has a concave portion that is at the second opening. The first isolation layer is located on a portion of the sidewall. The second isolation layer is located on the first surface and the sidewall that is not covered by the first isolation layer, such that an interface is formed between the first and second isolation layers.
    Type: Grant
    Filed: April 29, 2015
    Date of Patent: January 12, 2016
    Assignee: XINTEC INC.
    Inventors: Yu-Lin Yen, Sheng-Hao Chiang, Hung-Chang Chen, Ho-Ku Lan, Chen-Mei Fan
  • Publication number: 20150318348
    Abstract: A semiconductor structure includes a substrate, a dam element, a first isolation layer, a second isolation layer, and a conductive layer. The substrate has a conductive pad, a trench, a sidewall, a first surface, and a second surface opposite to the first surface. The conductive pad is located on the second surface. The trench has a first opening at the first surface, and has a second opening at the second surface. The dam element is located on the second surface and covers the second opening. The dam element has a concave portion that is at the second opening. The first isolation layer is located on a portion of the sidewall. The second isolation layer is located on the first surface and the sidewall that is not covered by the first isolation layer, such that an interface is formed between the first and second isolation layers.
    Type: Application
    Filed: April 29, 2015
    Publication date: November 5, 2015
    Inventors: Yu-Lin YEN, Sheng-Hao CHIANG, Hung-Chang CHEN, Ho-Ku LAN, Chen-Mei FAN
  • Publication number: 20150177748
    Abstract: A control method includes pre-setting a PMV index range for an internal space in which a fan and an air conditioner is mounted and measuring a PMV value of the internal space; comparing the PMV value of the internal space with the PMV index range; and increasing a rotational speed of the fan when the PMV value of the internal space is greater than the PMV value of the PMV index region, and decreasing the rotational speed of the fan when the PMV value of the internal space is less than the PMV value of the PMV index region.
    Type: Application
    Filed: December 8, 2014
    Publication date: June 25, 2015
    Inventor: Chen-Mei LO
  • Patent number: 8624383
    Abstract: The invention provides an integrated circuit package and method of fabrication thereof. The integrated circuit package comprises an integrated circuit chip having a photosensitive device thereon; a bonding pad formed on an upper surface of the integrated circuit chip and electrically connected to the photosensitive device; a barrier formed between the bonding pad and the photosensitive device; and a conductive layer formed on a sidewall of the integrated circuit chip and electrically connected to the bonding pad. The barrier layer blocks overflow of the adhesive layer into a region, on which the photosensitive device is formed, to improve yield for fabricating the integrated circuit package.
    Type: Grant
    Filed: July 14, 2010
    Date of Patent: January 7, 2014
    Inventors: Yu-Lin Yen, Chen-Mei Fan
  • Patent number: 8003442
    Abstract: The invention provides an integrated circuit package and method of fabrication thereof. The integrated circuit package comprises an integrated circuit chip having a photosensitive device thereon; a bonding pad formed on an upper surface of the integrated circuit chip and electrically connected to the photosensitive device; a barrier formed between the bonding pad and the photosensitive device; and a conductive layer formed on a sidewall of the integrated circuit chip and electrically connected to the bonding pad. The barrier layer blocks overflow of the adhesive layer into a region, on which the photosensitive device is formed, to improve yield for fabricating the integrated circuit package.
    Type: Grant
    Filed: July 25, 2007
    Date of Patent: August 23, 2011
    Inventors: Yu-Lin Yen, Chen-Mei Fan
  • Publication number: 20100276774
    Abstract: The invention provides an integrated circuit package and method of fabrication thereof. The integrated circuit package comprises an integrated circuit chip having a photosensitive device thereon; a bonding pad formed on an upper surface of the integrated circuit chip and electrically connected to the photosensitive device; a barrier formed between the bonding pad and the photosensitive device; and a conductive layer formed on a sidewall of the integrated circuit chip and electrically connected to the bonding pad. The barrier layer blocks overflow of the adhesive layer into a region, on which the photosensitive device is formed, to improve yield for fabricating the integrated circuit package.
    Type: Application
    Filed: July 14, 2010
    Publication date: November 4, 2010
    Inventors: Yu-Lin YEN, Chen-Mei Fan
  • Publication number: 20080230860
    Abstract: The invention provides an integrated circuit package and method of fabrication thereof. The integrated circuit package comprises an integrated circuit chip having a photosensitive device thereon; a bonding pad formed on an upper surface of the integrated circuit chip and electrically connected to the photosensitive device, a barrier formed between the bonding pad and the photosensitive device; and a conductive layer formed on a sidewall of the integrated circuit chip and electrically connected to the bonding pad. The barrier layer blocks overflow of the adhesive layer into a region, on which the photosensitive device is formed, to improve yield for fabricating the integrated circuit package.
    Type: Application
    Filed: July 25, 2007
    Publication date: September 25, 2008
    Inventors: Yu-Lin Yen, Chen-Mei Fan
  • Patent number: 6742532
    Abstract: A cleaning container and method for using the same for chemically cleaning elongated members including quartz thermocouple sleeves including a first body member and a second body member said first body member and second body member respectively forming a first containing space and a second containing space including a first means for reversibly compressively sealing the first body member and the second body member to a form a combined containing space for sealably holding a cleaning solution level; a cap member disposed at a distal end of the first body member said cap member including a second means for reversibly compressively sealing a first opening in communication with the first containing space; and, a second opening centrally disposed in a distal end of the second containing space said second opening including a third means for reversibly compressively sealing around at least one elongated member penetrating through said second opening.
    Type: Grant
    Filed: January 9, 2002
    Date of Patent: June 1, 2004
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Yung-Pin Lin, Chung-Ray Chen, Chen-Mei Fan, Chan-Chung Shu
  • Publication number: 20030127114
    Abstract: A cleaning container and method for using the same for chemically cleaning elongated members including quartz thermocouple sleeves including a first body member and a second body member said first body member and second body member respectively forming a first containing space and a second containing space including a first means for reversibly compressively sealing the first body member and the second body member to a form a combined containing space for sealably holding a cleaning solution level; a cap member disposed at a distal end of the first body member said cap member including a second means for reversibly compressively sealing a first opening in communication with the first containing space; and, a second opening centrally disposed in a distal end of the second containing space said second opening including a third means for reversibly compressively sealing around at least one elongated member penetrating through said second opening.
    Type: Application
    Filed: January 9, 2002
    Publication date: July 10, 2003
    Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Yung-Pin Lin, Chung-Ray Chen, Chen-Mei Fan, Chien-Chung Hsu
  • Patent number: 6538237
    Abstract: An apparatus for fixing the position of a quartz furnace tube in a semiconductor processing furnace is described. The furnace is of the type that has a cylindrical body possessing an open end through which the tube may be withdrawn, and a base postioned on the open end, wherein the tube includes a flange portion secured to the base through which gas may be withdrawn from or introduced into the furnace tube. The tube is coaxially disposed within the furnace body. The apparatus may include two clamp halves each has a half-circular shape for engaging the flange portion of the furnace tube onto the base, and a mounting means for mounting the two clamp halves to the base.
    Type: Grant
    Filed: January 8, 2002
    Date of Patent: March 25, 2003
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd
    Inventors: Ming-Hsun Yang, Chen-Mei Fan, Allan Wang, June-Yie Kao
  • Patent number: 6252410
    Abstract: A pico fuse detector assembly incorporating a probe structure that minimizes short-out of closely adjacent pico fuses during testing has two probe arms, each pivotably connected at one end to a detector body with their free ends adjustably dispaceable from each other and respectively accomodating improved probe elements thereon. Each probe element has a conductive lead disposed inside an insulating housing connected at one end to a set of test contacts extending from the bottom of the housing. The other end of the lead is coupled by a spring to a test circuit. The restricting of the contact area with the isolating housing limits the chance of the contacts accidentally being placed at a location to cause damage to two closely arranged adjacent pico fuses under test and thus obviates the problem of fuse short-out during measuring of the closely arranged fuses. Also, the contacts and lead are axially movable by virtue of the spring-mounting to the test circuit.
    Type: Grant
    Filed: January 29, 1999
    Date of Patent: June 26, 2001
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd
    Inventor: Chen Mei Fan
  • Patent number: 6191035
    Abstract: In a CVD vacuum chamber processing system for depositing a blanket of refractory material, such as tungsten, upon a frontside of a semiconductor wafer, an inert gas, such as argon is directed to the backside of the wafer in a manner so as to prevent the chamber reaction gases from reacting with polysilicon or other materials on the backside of the wafer as well as to prevent the deposition of the blanket material on the backside of the wafer. This method alleviates the problems of particulate generation and loss of wafer backside datum surface due to the inadvertent buildup of unwanted materials. The wafer is placed on a heater platen and is secured by a specified range of vacuum pressures. The wafer is exposed to specified ranges of chamber pressure during the deposition phase. During the purge phase, the chamber pressure is reduced and the wafer chucking pressure is increased to a specified range. The method is terminated with the equalization of pressure between the front and backside of the wafer.
    Type: Grant
    Filed: May 17, 1999
    Date of Patent: February 20, 2001
    Assignee: Taiwan Semiconductor Manufacturing Company
    Inventors: Kuo-Hsien Cheng, Chen-Mei Fan
  • Patent number: D1017882
    Type: Grant
    Filed: February 21, 2023
    Date of Patent: March 12, 2024
    Assignee: JIAXING SUPER LIGHTING ELECTRIC APPLIANCE CO., LTD
    Inventors: Tao Jiang, Ming-Bin Wang, Chen-Kun Chen, Dong-Mei Zhang