Patents by Inventor Chen-Shou HSU

Chen-Shou HSU has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11746466
    Abstract: A water-repellent fabric includes a base cloth and a water-repellent resin. The water-repellent resin is disposed on the base cloth, in which a method of fabricating the water-repellent resin includes the following steps. A first thermal process is performed to mix a polyol, a cross-linking agent, and a choline to form a first mixture, in which a reaction temperature of the first thermal process is between 90° C. and 120° C. A second thermal process is performed to mix the first mixture and a water repellent to form the water-repellent resin, in which the water repellent includes a hydroxyl group, an amino group, or combinations thereof, and a reaction temperature of the second thermal process is between 120° C. and 150° C.
    Type: Grant
    Filed: January 3, 2022
    Date of Patent: September 5, 2023
    Assignee: TAIWAN TEXTILE RESEARCH INSTITUTE
    Inventors: Chen-Shou Hsu, Sun-Wen Juan, Chun-Hung Lin
  • Publication number: 20230174706
    Abstract: A zwitterionic resin is manufactured by a manufacturing method which includes the following steps. A first thermal process is performed on a first crosslinking agent and a choline having hydroxyl group or amino group to form a first mixture, in which the first crosslinking agent includes an isocyanate group. A second thermal process is performed on the first mixture, a second crosslinking agent, a chain extender, and an amino acid to form the zwitterionic resin, in which the chain extender includes a polyol.
    Type: Application
    Filed: July 1, 2022
    Publication date: June 8, 2023
    Inventors: Chen-Shou HSU, Sun-Wen JUAN, Chun-Hung LIN
  • Patent number: 11486088
    Abstract: An anti-staining fabric includes a base cloth and an anti-staining resin. The anti-staining resin is disposed on the base cloth, in which a method of fabricating the anti-staining resin includes the following steps. A first thermal process is performed to mix a polyol, a cross-linking agent, and a choline to form a first mixture, in which a reaction temperature of the first thermal process is between 90° C. and 120° C. A second thermal process is performed to mix the first mixture and a chain extender to form the anti-staining resin, in which the chain extender includes a first reagent and a second reagent, and a reaction temperature of the second thermal process is between 120° C. and 150° C.
    Type: Grant
    Filed: January 8, 2021
    Date of Patent: November 1, 2022
    Assignee: TAIWAN TEXTILE RESEARCH INSTITUTE
    Inventors: Chen-Shou Hsu, Sun-Wen Juan, Chun-Hung Lin
  • Publication number: 20220235517
    Abstract: A water-repellent fabric includes a base cloth and a water-repellent resin. The water-repellent resin is disposed on the base cloth, in which a method of fabricating the water-repellent resin includes the following steps. A first thermal process is performed to mix a polyol, a cross-linking agent, and a choline to form a first mixture, in which a reaction temperature of the first thermal process is between 90° C. and 120° C. A second thermal process is performed to mix the first mixture and a water repellent to form the water-repellent resin, in which the water repellent includes a hydroxyl group, an amino group, or combinations thereof, and a reaction temperature of the second thermal process is between 120° C. and 150° C.
    Type: Application
    Filed: January 3, 2022
    Publication date: July 28, 2022
    Inventors: Chen-Shou HSU, Sun-Wen JUAN, Chun-Hung LIN
  • Publication number: 20220010484
    Abstract: An anti-staining fabric includes a base cloth and an anti-staining resin. The anti-staining resin is disposed on the base cloth, in which a method of fabricating the anti-staining resin includes the following steps. A first thermal process is performed to mix a polyol, a cross-linking agent, and a choline to form a first mixture, in which a reaction temperature of the first thermal process is between 90° C. and 120° C. A second thermal process is performed to mix the first mixture and a chain extender to form the anti-staining resin, in which the chain extender includes a first reagent and a second reagent, and a reaction temperature of the second thermal process is between 120° C. and 150° C.
    Type: Application
    Filed: January 8, 2021
    Publication date: January 13, 2022
    Inventors: Chen-Shou HSU, Sun-Wen JUAN, Chun-Hung LIN