Abstract: An apparatus for protecting a vacuum system of semiconductor equipment is disclosed. The apparatus comprises a process tool and a gas-exploding unit. The process tool includes a gas reaction chamber, and the process tool is connected with a first gas piping to exhaust a waste gas in the gas reaction chamber. The gas-exploding unit includes a gas-exploding chamber, a gas valve, a pressure sensor, and a gas-exploding device for sealing an opening in a wall of the gas-exploding chamber. The gas-exploding chamber is connected with the first gas piping to receive the waste gas. The waste gas in the gas-exploding chamber is transported to a local scrubber through a second gas piping, and then exhausted to a central scrubber. The pressure sensor is used to detect a pressure in the gas-exploding chamber.

Abstract: A gas-exploding apparatus for a vacuum system of semiconductor equipment is disclosed. The gas-exploding apparatus includes two parts of a process tool and gas-exploding apparatus. The process tool contains a gas reaction chamber, and the process tool connects a first gas piping and dry pump to exhaust waste gas in the chamber. The gas-exploding apparatus includes a gas-exploding chamber, a gas valve and a pressure sensor. Here the gas-exploding chamber contains a gas-exploding disk thereon, wherein the chamber connects a first gas piping and second gas piping to receive the waste gas. The chamber connects a third gas piping to transport the waste gas to a local scrubber through the third gas piping, wherein the second gas piping connects the dry pump. The gas valve connects the chamber via a first pipe to release the waste gas to a central scrubber through a fourth gas piping. The pressure sensor connects the chamber via a second pipe to detect the pressure in the chamber.