Abstract: Semiconductor devices and methods of forming the same are provided. In some embodiments, a method includes receiving a workpiece having a redistribution layer disposed over and electrically coupled to an interconnect structure. In some embodiments, the method further includes patterning the redistribution layer to form a recess between and separating a first conductive feature and a second conductive feature of the redistribution layer, where corners of the first conductive feature and the second conductive feature are defined adjacent to and on either side of the recess. The method further includes depositing a first dielectric layer over the first conductive feature, the second conductive feature, and within the recess. The method further includes depositing a nitride layer over the first dielectric layer. In some examples, the method further includes removing portions of the nitride layer disposed over the corners of the first conductive feature and the second conductive feature.

Abstract: A photolithographic apparatus includes a particle removing cassette, a pump and a compressor. The particle removing cassette includes a first slit that includes an array of parallel wind blade nozzles arranged along a length of the first slit, protruding from the first slit, and configured to eject and direct pressurized cleaning material to a patterning surface of a mask to remove debris particles on the patterning surface. The pump and the compressor are controlled by a controller to adjust a flow rate and a pressure of the pressurized cleaning material based on an amount of debris particles on the patterning surface of the mask.

Abstract: An photolithographic apparatus includes a particle removing cassette selectively extendable from the processing apparatus. The particle removing cassette includes a wind blade slit and an exhausting slit. The wind blade slit is configured to direct pressurized cleaning material to a surface of the mask to remove the debris particles from the surface of the mask. The exhausting slit collects the debris particles separated from the surface of the mask and contaminants through the exhaust line. In some embodiments, the wind blade slit includes an array of wind blade nozzles spaced apart within the wind blade slit. In some embodiments, the exhausting slit includes array of exhaust lines spaced apart within the exhausting slit.

Abstract: In a method of manufacturing a semiconductor device a semiconductor wafer is retrieved from a load port. The semiconductor wafer is transferred to a treatment device. In the treatment device, the surface of the semiconductor wafer is exposed to a directional stream of plasma wind to clean a particle from the surface of the semiconductor wafer. The stream of plasma wind is generated by an ambient plasma generator and is directed at an oblique angle with respect to a perpendicular plane to the surface of the semiconductor wafer for a predetermined plasma exposure time. After the cleaning, a photo resist layer is disposed on the semiconductor wafer.

Abstract: A wafer cleaning module and a method for cleaning a wafer with the wafer cleaning module are disclosed. For example, the wafer cleaning module includes a wafer chuck to hold a wafer, an ozone source to provide ozone gas towards the wafer, and an ultraviolet (UV) lamp module to provide UV light. The UV lamp module includes a UV light source and a rotatable reflector around the UV light source. The rotatable reflector is movable to adjust an amount of UV light directed towards a surface of the wafer.

Abstract: An photolithographic apparatus includes a particle removing cassette selectively extendable from the processing apparatus. The particle removing cassette includes a wind blade slit and an exhausting slit. The wind blade slit is configured to direct pressurized cleaning material to a surface of the mask to remove the debris particles from the surface of the mask. The exhausting slit collects the debris particles separated from the surface of the mask and contaminants through the exhaust line. In some embodiments, the wind blade slit includes an array of wind blade nozzles spaced apart within the wind blade slit. In some embodiments, the exhausting slit includes array of exhaust lines spaced apart within the exhausting slit.

Abstract: An photolithographic apparatus includes a particle removing cassette selectively extendable from the processing apparatus. The particle removing cassette includes a wind blade slit and an exhausting slit. The wind blade slit is configured to direct pressurized cleaning material to a surface of the mask to remove the debris particles from the surface of the mask. The exhausting slit collects the debris particles separated from the surface of the mask and contaminants through the exhaust line. In some embodiments, the wind blade slit includes an array of wind blade nozzles spaced apart within the wind blade slit. In some embodiments, the exhausting slit includes array of exhaust lines spaced apart within the exhausting slit.

Abstract: A wafer cleaning module and a method for cleaning a wafer with the wafer cleaning module are disclosed. For example, the wafer cleaning module includes a wafer chuck to hold a wafer, an ozone source to provide ozone gas towards the wafer, and an ultraviolet (UV) lamp module to provide UV light. The UV lamp module includes a UV light source and a rotatable reflector around the UV light source. The rotatable reflector is movable to adjust an amount of UV light directed towards a surface of the wafer.

Abstract: An photolithographic apparatus includes a particle removing cassette selectively extendable from the processing apparatus. The particle removing cassette includes a wind blade slit and an exhausting slit. The wind blade slit is configured to direct pressurized cleaning material to a surface of the mask to remove the debris particles from the surface of the mask. The exhausting slit collects the debris particles separated from the surface of the mask and contaminants through the exhaust line. In some embodiments, the wind blade slit includes an array of wind blade nozzles spaced apart within the wind blade slit. In some embodiments, the exhausting slit includes array of exhaust lines spaced apart within the exhausting slit.

Abstract: A turbo decoder system decodes L-length digital data consisting of a systematic code and 1st and 2nd parity check codes, and includes a trellis controller obtaining the ratio of the bit-number Ep of the 1st/2nd parity check code to the bit-number D of an original systematic code and generating, based on the code rate of the digital data, a trellis control output indicating a target decoding trellis, which is selected by a turbo decoder to perform decoding operations. A zero-patch module patches zeros into the systematic code, and patches, based on the value of Ep/D, one or more zeros into the 1st/2nd parity check code so that parity check bits of the 1st/2nd parity check code and the zero-bit(s) form a periodically depunctured parity check code.

Abstract: A fan impeller includes a plurality of fan blade assembly members, each one of the fan blade assembly members respectively includes a metal ring bracket and a plurality of metal blades, one end of each one of the metal blades is respectively connected to the corresponding metal ring bracket and the plurality of metal blades of each one of the fan blade assembly members arranged radially to circumference the corresponding metal ring bracket. The metal ring brackets are configured to stack with each other and the metal blades are arranged in a radial centric row, a width of at least one portion of each one of the metal blades is not smaller than a distance between any two adjacent metal blades along a fan impeller circumferential direction. Accordingly, metal blades of a greater width can be densely arranged on the fan impeller.

Abstract: A turbo decoder system decodes L-length digital data consisting of a systematic code and 1st and 2nd parity check codes, and includes a trellis controller obtaining the ratio of the bit-number Ep of the 1st/2nd parity check code to the bit-number D of an original systematic code and generating, based on the code rate of the digital data, a trellis control output indicating a target decoding trellis, which is selected by a turbo decoder to perform decoding operations. A zero-patch module patches zeros into the systematic code, and patches, based on the value of Ep/D, one or more zeros into the 1st/2nd parity check code so that parity check bits of the 1st/2nd parity check code and the zero-bit(s) form a periodically depunctured parity check code.

Abstract: A method of manufacturing an axial fan wheel includes steps of providing a raw material; forging the raw material by a forging process to form a semifinished product of the axial fan wheel, wherein the semifinished product of the axial fan wheel includes a hub, a plurality of axial fan blades and an excess material, the axial fan blades extend from a periphery of the hub, an angle included between a surface of each axial fan blade and a rotation axis of the hub varies gradiently, and the excess material is connected to the hub and the axial fan blades; and removing the excess material to form the axial fan wheel with the hub and the axial fan blades.

Abstract: A fan impeller includes a plurality of fan blade assembly members, each one of the fan blade assembly members respectively includes a metal ring bracket and a plurality of metal blades, one end of each one of the metal blades is respectively connected to the corresponding metal ring bracket and the plurality of metal blades of each one of the fan blade assembly members arranged radially to circumference the corresponding metal ring bracket. The metal ring brackets are configured to stack with each other and the metal blades are arranged in a radial centric row, a width of at least one portion of each one of the metal blades is not smaller than a distance between any two adjacent metal blades along a fan impeller circumferential direction. Accordingly, metal blades of a greater width can be densely arranged on the fan impeller.

Abstract: A nursing system of the present invention can position where a person to be nursed through a sensor network widely deployed in an environment, instantaneously detect if the person to be nursed has an accident, and forward a message to inform a relative or medical staff. An autonomous robot will actively move beside the person to be nursed and transmit real-time images to a remote computer or PDA so that the relative or medical staff can swiftly ascertain the situation of the person to be nursed and the person to be nursed in case of emergency can be rescued as soon as possible.

Abstract: A quick assembly pneumatic tool may be connected to a tool bit and has a housing, an anvil casing, a rear cover, an air inlet assembly, a rotor assembly and an impact assembly. The housing has a handle and a rotor casing. The rotor casing is formed on the handle and has a front chamber and a rear chamber. The anvil casing and rear cover respectively cover the front and rear chambers. The rotor assembly is mounted in the rear chamber and is selectively driven by the air inlet assembly. The impact assembly is mounted in the front chamber and the anvil casing and is selectively rotated by the rotor assembly. The separate rotor and anvil casings allow the rotor and impact assemblies to be inserted respectively in the front and rear chambers so that assembling the pneumatic is easy and quick.

Abstract: A quick assembly pneumatic tool may be connected to a tool bit and has a housing, an anvil casing, a rear cover, an air inlet assembly, a rotor assembly and an impact assembly. The housing has a handle and a rotor casing. The rotor casing is formed on the handle and has a front chamber and a rear chamber. The anvil casing and rear cover respectively cover the front and rear chambers. The rotor assembly is mounted in the rear chamber and is selectively driven by the air inlet assembly. The impact assembly is mounted in the front chamber and the anvil casing and is selectively rotated by the rotor assembly. The separate rotor and anvil casings allow the rotor and impact assemblies to be inserted respectively in the front and rear chambers so that assembling the pneumatic is easy and quick.

Abstract: A nursing system of the present invention can position where a person to be nursed through a sensor network widely deployed in an environment, instantaneously detect if the person to be nursed has an accident, and forward a message to inform a relative or medical staff. An autonomous robot will actively move beside the person to be nursed and transmit real-time images to a remote computer or PDA so that the relative or medical staff can swiftly ascertain the situation of the person to be nursed and the person to be nursed in case of emergency can be rescued as soon as possible.

Abstract: A stacked type tooling is formed by stacking a plurality of slices. Each slice has a plurality of patterned openings. When these slices are stacked together, The patterned openings form at least a cavity. Unnecessary volume of the tooling can be avoided to shrink the size of the tooling and let the tooling be lightweight. Moreover, the manufacturing cost and time of the tooling can be substantially reduced.

Abstract: An air cylinder apparatus for a pneumatically driven power tool includes a unitary outer cylinder member, which has a bearing plate and a hollow cylindrical wall. A cylindrical chamber is formed eccentrically in the cylindrical wall. A bearing member is mounted removably on an end of the cylindrical wall. A cylindrical inner wall member is press fitted within the cylindrical wall of the outer cylinder member, and has two spaced adjacent axial sides that define an open-ended axial slot therebetween. The inner wall member can be compressed in a radial direction for removal from the outer cylinder member. Because the outer cylinder member is molded, the power tool can be manufactured easily and conveniently.