Patents by Inventor Chen-Yu Tai
Chen-Yu Tai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240107724Abstract: A display device is provided, including a housing, a panel, two outer circulation assemblies, an inner circulation assembly, and an optical device. The housing includes a closed inner space and a first side surface and a second side surface opposite to each other. The panel is adjacent to the first side surface and the second side surface. The two outer circulation assemblies are respectively arranged on the first side surface and the second side surface, and includes an air duct element to guides an air and a fan assembly. The air duct element guides an air. The inner circulation assembly is arranged in the inner space and includes a first fan element and a second fan element. The first fan element and the second fan element are arranged on two opposite ends. The optical device is arranged in the inner space and located on an end opposite to the panel.Type: ApplicationFiled: September 21, 2023Publication date: March 28, 2024Inventors: Chen-Yu Tai, Nan-Ching Lee
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Publication number: 20230402521Abstract: A semiconductor device structure, along with methods of forming such, are described. The semiconductor device structure includes a substrate and an isolation structure disposed on the substrate and between two neighboring transistors. The isolation structure includes a dielectric feature, an insulating material disposed below the dielectric feature. The insulating material includes an upper portion comprising a first sidewall and a top surface in contact with the dielectric feature, and a bottom portion having a second sidewall, wherein the second sidewall is surrounded by and in contact with the substrate. The insulating material further includes a middle portion having a third sidewall disposed between the first sidewall and the second sidewall. The semiconductor device structure also includes a dielectric material in contact with the dielectric feature, the first sidewall, the third sidewall, and the substrate.Type: ApplicationFiled: June 10, 2022Publication date: December 14, 2023Inventors: Tzu-Ging LIN, Chen-Yu TAI, Chun-Liang LAI, Chih-Chang HUNG
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Publication number: 20230395654Abstract: The present disclosure describes a structure that provides insulation in a semiconductor device and a method for forming the structure. The structure includes a first isolation structure including a first isolation layer disposed on a substrate, a second isolation layer disposed on the first isolation layer, and a first high-k dielectric layer having a first height and disposed on the second isolation layer. The structure further includes a second isolation structure including a third isolation layer disposed on the substrate, a fourth isolation layer disposed on the third isolation layer, and a second high-k dielectric layer having a second height and disposed on the fourth isolation layer, where the second height is less than the first height. The structure further includes a gate structure disposed on the first isolation structure, and an insulating structure disposed adjacent to the gate structure and on the second isolation structure.Type: ApplicationFiled: June 3, 2022Publication date: December 7, 2023Applicant: Taiwan Semiconductor Manufacturing Co., Ltd.Inventors: Tzu-Ging LIN, Chen-Yu Tai
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Publication number: 20230386927Abstract: The present disclosure describes fabricating devices with tunable gate height and effective capacitance. A method includes forming a first metal gate stack in a dummy region of a semiconductor substrate and a second metal gate stack in an active device region of the semiconductor substrate, and performing a chemical mechanical polishing (CMP) process using a slurry including charged abrasive nanoparticles. The first and second metal gate stacks are different in composition. The charged abrasive nanoparticles include a first concentration in the active device region different from a second concentration in the dummy region.Type: ApplicationFiled: August 4, 2023Publication date: November 30, 2023Inventors: Ming-Chang Wen, Chang-Yun Chang, Keng-Yao Chen, Chen-Yu Tai, Yi-Ting Fu
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Patent number: 11817354Abstract: The present disclosure describes fabricating devices with tunable gate height and effective capacitance. A method includes forming a first metal gate stack in a dummy region of a semiconductor substrate, the first metal gate stack including a first work function metal (WFM) layer; forming a second metal gate stack in an active device region of the semiconductor substrate, the second metal gate stack including a second WFM layer different than the first WFM layer; and performing a CMP process using a slurry including charged abrasive nanoparticles. The charged abrasive nanoparticles include a first concentration in the active device region different from a second concentration in the dummy region causing different polish rates in the active device region and dummy region. After the performing of the CMP process, the first metal gate stack has a first height different from a second height of the second metal gate stack.Type: GrantFiled: August 9, 2022Date of Patent: November 14, 2023Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTDInventors: Ming-Chang Wen, Chang-Yun Chang, Keng-Yao Chen, Chen-Yu Tai, Yi-Ting Fu
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Publication number: 20230361199Abstract: Provided is a device with a replacement spacer structure and a method for forming such a structure. The method includes forming an initial spacer structure, wherein the initial spacer structure has an initial etch rate for a selected etchant. The method further includes removing a portion of the initial spacer structure, wherein a remaining portion of the initial spacer structure is not removed. Also, the method includes forming a replacement spacer structure adjacent to the remaining portion of the initial spacer structure to form a combined spacer structure, wherein the combined spacer structure has an intermediate etch rate for the selected etchant that is less than the initial etch rate for a selected etchant. Further, the method includes etching the combined spacer structure with the selected etchant to form a final spacer structure.Type: ApplicationFiled: May 5, 2022Publication date: November 9, 2023Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.Inventors: Chang-Ta Chen, Ming-Chang Wen, Kuo-Feng Yu, Chen-Yu Tai, Yun Lee, Poya Chuang, Chun-Ming Yang, Yoh-Rong Liu, Ya-Ting Yang
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Publication number: 20220384262Abstract: The present disclosure describes fabricating devices with tunable gate height and effective capacitance. A method includes forming a first metal gate stack in a dummy region of a semiconductor substrate, the first metal gate stack including a first work function metal (WFM) layer; forming a second metal gate stack in an active device region of the semiconductor substrate, the second metal gate stack including a second WFM layer different than the first WFM layer; and performing a CMP process using a slurry including charged abrasive nanoparticles. The charged abrasive nanoparticles include a first concentration in the active device region different from a second concentration in the dummy region causing different polish rates in the active device region and dummy region. After the performing of the CMP process, the first metal gate stack has a first height different from a second height of the second metal gate stack.Type: ApplicationFiled: August 9, 2022Publication date: December 1, 2022Inventors: Ming-Chang Wen, Chang-Yun Chang, Keng-Yao Chen, Chen-Yu Tai, Yi-Ting Fu
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Patent number: 11508623Abstract: The present disclosure describes fabricating devices with tunable gate height and effective capacitance. A method includes forming a first metal gate stack in a dummy region of a semiconductor substrate, the first metal gate stack including a first work function metal (WFM) layer; forming a second metal gate stack in an active device region of the semiconductor substrate, the second metal gate stack including a second WFM layer different than the first WFM layer; and performing a CMP process using a slurry including a charged abrasive nanoparticles. The charged abrasive nanoparticles include a first concentration in the active device region different from a second concentration in the dummy region causing different polish rates in the active device region and dummy region. After the performing of the CMP process, the first metal gate stack has a first height greater different from a second height of the second metal gate stack.Type: GrantFiled: December 17, 2020Date of Patent: November 22, 2022Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.Inventors: Ming-Chang Wen, Chang-Yun Chang, Keng-Yao Chen, Chen-Yu Tai, Yi-Ting Fu
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Publication number: 20210202320Abstract: The present disclosure describes fabricating devices with tunable gate height and effective capacitance. A method includes forming a first metal gate stack in a dummy region of a semiconductor substrate, the first metal gate stack including a first work function metal (WFM) layer; forming a second metal gate stack in an active device region of the semiconductor substrate, the second metal gate stack including a second WFM layer different than the first WFM layer; and performing a CMP process using a slurry including a charged abrasive nanoparticles. The charged abrasive nanoparticles include a first concentration in the active device region different from a second concentration in the dummy region causing different polish rates in the active device region and dummy region. After the performing of the CMP process, the first metal gate stack has a first height greater different from a second height of the second metal gate stack.Type: ApplicationFiled: December 17, 2020Publication date: July 1, 2021Inventors: Ming-Chang Wen, Chang-Yun Chang, Keng-Yao Chen, Chen-Yu Tai, Yi-Ting Fu
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Publication number: 20070274099Abstract: A light expanding system for converting light beams generated from point-like light sources into a collimated planar light beam is described herein. The light expanding system is especially suitable for backlighting a liquid crystal flat panel display or other such arrangement requiring backlighting with LEDs as the light source. According to an embodiment of the invention, a system for producing a planar light beam includes a light pipe with microprisms on one of its surfaces, and a beam collector which has microprisms in a plane perpendicular to the microprisms in the light guide. According to another embodiment, the light guide has microprisms on two opposite surfaces, and is capable of multiple mode operation. This multiple mode backlight is capable of illuminating a given active area uniformly with light of different spectrum.Type: ApplicationFiled: May 25, 2006Publication date: November 29, 2007Applicant: CLIO TECHNOLOGIES, INC.Inventors: Chen-Yu Tai, Ping-Kaung Tai
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Patent number: 6740890Abstract: The present invention relates to the measurement of the time dependence of light emitted by a material after it is excited by a light or electric pulse. An embodiment of this invention utilizes a CCD camera and a mask with slits for time resolved spectroscopy of fluorescent materials illuminated with a light pulse. By converting a slit in space to a gate in time, the whole decay curve of the fluorescence may be obtained with a single material-exciting light pulse. The systems and methods of the present invention are particularly suitable for DNA and protein study.Type: GrantFiled: August 15, 2001Date of Patent: May 25, 2004Inventor: Chen-Yu Tai
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Publication number: 20030025457Abstract: An assembly especially suitable for aquarium and desk lighting or other such arrangement requiring lighting of only a limited area is disclosed herein. This lighting assembly is composed of one or more miniature fluorescent lamps, reflector arrangement and cylindrical lens to provide lighting with a controllable degree of collimation. This lighting system can illuminate a desired area with light of multiple colors. Applications of this compact and energy efficient lighting system in aquarium and desk lighting are described. 1 Cross Reference to Related Applications U.S. Pat. No. Documents 3069579 December, 1962 Berg et al. 313/511. 3609343 September, 1971 Howlett 362/562. 3749901 July, 1973 Clough 362/562. 3819973 June, 1974 Hosford 313/498. 3908598 September, 1975 Jewson 119/267. 4516529 May, 1985 Lotito et al. 119/253. 5067059 November, 1991 Hwang 362/101. 5211469 May, 1993 Matthias et al. 362/101. 5353746 October, 1994 Del Rosario 119/266.Type: ApplicationFiled: July 5, 2001Publication date: February 6, 2003Inventor: Chen-Yu Tai
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Patent number: 6092904Abstract: A system especially suitable for illuminating the front side of an object, as viewed by an observer is disclosed herein. This system includes a light pipe assembly having opposing forward and rearward faces; an arrangement for directing light into the light pipe assembly in a predetermined way; and an arrangement of optical components forming part of the light pipe assembly. This latter assembly is provide for reflecting substantially all of the light directed into the light pipe in a forward direction through the forward face of the light pipe. The light pipe assembly including the arrangement of optical components is substantially transparent to visible light or electromagnetic wave of a particular wavelength in the direction across the opposing forward and rearward faces of the assembly such that the light pipe assembly can be positioned between the object being illuminated and the observer or the detector without in any significant way disrupting the observer's or detector's view of the object.Type: GrantFiled: July 24, 1997Date of Patent: July 25, 2000Assignee: Clio TechnologiesInventors: Chen-Yu Tai, Ping-Kaung Tai
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Patent number: 5926601Abstract: An assembly backlighting a liquid crystal flat panel display or other such arrangement requiring backlighting is disclosed herein. The assembly includes a plurality of light pipes and is capable of a multi-mode operation as well as achieving an enhanced dimming. This assembly is composed of two or more light pipes placed in a stacked configuration. Each light pipe has a set of specially configured microprisms which, cooperating with the light pipe, provides an efficient backlighting technique with a controllable degree of collimation. The disclosed assembly is particularly useful for displays which require a very bright backlighting, a wide dimming range and which must be capable of illuminating a given active area with light of different spectra.Type: GrantFiled: May 2, 1996Date of Patent: July 20, 1999Assignee: Briteview Technologies, Inc.Inventors: Chen-Yu Tai, Ping-Kaung Tai
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Patent number: 5854872Abstract: An assembly for frontlighting or backlighting a display or other such arrangement requiring frontlighting or backlighting is disclosed herein. The assembly uses a light pipe with a set of specially configured microprisms to rotate the divergent angle of light. The divergent angle rotator is used with a flat collimator assembly for efficient display illuminating with light of a controllable degree of collimation in both dimensions.Type: GrantFiled: October 8, 1996Date of Patent: December 29, 1998Assignee: Clio Technologies, Inc.Inventor: Chen-Yu Tai
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Patent number: 5608837Abstract: Disclosed is a transmissive type display which uses ambient light for enhanced backlighting and which can be used with or without an artificial light source which is either built-in or external to the unit. The backlighting display assembly includes a light pipe with an arrangement of immediately adjacent microprisms serving as the back surface of the light pipe and a light injecting system. The backlighting system may also include a compensating plate or film which also has an immediately adjacent surface profile complementing that of the light pipe. The compensating plate, placed on top of the light pipe, is used to provide uniform illumination. Since outdoor ambient light provided by the sun usually comes from overhead, a light bending film may also be included in the backlighting system so that the display utilizes the overhead light effectively.Type: GrantFiled: May 15, 1995Date of Patent: March 4, 1997Assignee: Clio Technologies, Inc.Inventors: Ping-Kaung Tai, Chen-Yu Tai
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Patent number: 5390276Abstract: An assembly for backlighting a liquid crystal display is disclosed herein along with the liquid crystal display itself and a specific light polarization arrangement. The assembly for backlighting the liquid crystal display includes a backlighting light pipe into which light is directed in a particular manner and a specifically configured arrangement of immediately adjacent microprisms which cooperate with the backlighting light pipe for reflecting light within the ladder upwards through one of its surfaces in a generally collimated manner. The liquid crystal display backlighting assembly is also disclosed including a specifically designed arrangement for collimating the light directed into the light pipe such that the light exiting the light pipe does so on a more collimated manner.Type: GrantFiled: October 8, 1992Date of Patent: February 14, 1995Assignee: Briteview TechnologiesInventors: Chen-Yu Tai, Han Zou, Zhan Chen
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Patent number: 5371618Abstract: A liquid crystal display device and method for generating the three primary colors and combinations thereof including black and white is disclosed using, at most, two adjacent discrete subpixels which together form a full color pixel. At least one dual STN cell system is included in each device, such controlled by EXCLUSIVE OR (XOR) logic.Type: GrantFiled: January 5, 1993Date of Patent: December 6, 1994Assignee: Brite View TechnologiesInventors: Chen-Yu Tai, Han Zou
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Patent number: 5359691Abstract: An assembly for backlighting a liquid crystal flat panel display or other such arrangement requiring backlighting is disclosed herein. The assembly is composed of a multi-reflection light injection system, a light pipe and a set of specifically configured microprisms which, cooperating with the light pipe, provides an efficient backlighting technique with a controllable degree of collimation. The disclosed assembly may employ up to four light sources to give a brighter backlighting.Type: GrantFiled: April 19, 1993Date of Patent: October 25, 1994Assignee: Briteview TechnologiesInventors: Chen-Yu Tai, Han Zou