Patents by Inventor Chenbo Zhang

Chenbo Zhang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230068596
    Abstract: A portable gas water maker comprises a water maker body with a shell having a hollow structure. A water inlet communicating with the shell and used for injecting water into the shell is formed at an upper end of the water maker body. The water maker body is inverted U-shaped, so that the lower half part of the water maker body is divided into a left cavity and a right cavity. One group of Peltier semiconductor assemblies is arranged in each of the left cavity and the right cavity. A front-end semiconductor and a rear-end semiconductor in each group of Peltier semiconductor assemblies are connected through a wire. The group of semiconductor assemblies in the left cavity is used for generating electricity, and the group of semiconductor assemblies in the right cavity is used for refrigeration.
    Type: Application
    Filed: August 23, 2022
    Publication date: March 2, 2023
    Applicant: XIJING UNIVERSITY
    Inventors: Kai CHEN, Qian ZHANG, Yao QIN, Xinfei LIU, Chenbo ZHANG, Wei ZHANG
  • Patent number: 11228197
    Abstract: The present disclosure provides an energy conversion system and method for generating electricity directly from heat by phase transformation of ferroelectric materials without any external power sources. The energy conversion system includes an electric circuit comprising a phase-changing capacitor and a charge reservoir. The phase-changing capacitor has a dielectric layer comprising a phase-transforming ferroelectric material. When the phase-changing capacitor is initialized and subjected to thermal cycles through a transformation temperature of the phase-transforming ferroelectric material, the polarization of the dielectric layer undergoes an abrupt change between a ferroelectric phase and a paraelectric phase such that a current flow between the phase-changing capacitor and the charge reservoir via a load thereby converting heat into electrical energy. The present energy conversion method does not require any external bias fields during the energy conversion.
    Type: Grant
    Filed: March 27, 2020
    Date of Patent: January 18, 2022
    Assignee: The Hong Kong University of Science and Technology
    Inventors: Chenbo Zhang, Xian Chen
  • Patent number: 10990000
    Abstract: The present disclosure teaches a photolithography plate and a mask correction method, and relates to the field of semiconductor technologies. In forms of the mask correction method, a patterned mask is formed on a substrate, a location of a scattering bar embedded in the substrate is determined according to the mask, and an opening is formed at the determined location so as to embed the scattering bar in the opening. A scattering bar is embedded in a substrate of a photolithography plate so as to effectively avoid the impact of the scattering bar on a mask pattern, reduce a deposition loss, improve the correction effect, and shorten a correction time.
    Type: Grant
    Filed: August 10, 2018
    Date of Patent: April 27, 2021
    Assignees: Semiconductor Manufacturing (Shanghai) International Corporation, Semiconductor Manufacturing (Beijing) International Corporation
    Inventors: Jiancheng Zhang, Wei Wu, Chenbo Zhang
  • Publication number: 20200335997
    Abstract: The present disclosure provides an energy conversion system and method for generating electricity directly from heat by phase transformation of ferroelectric materials without any external power sources. The energy conversion system includes an electric circuit comprising a phase-changing capacitor and a charge reservoir. The phase-changing capacitor has a dielectric layer comprising a phase-transforming ferroelectric material. When the phase-changing capacitor is initialized and subjected to thermal cycles through a transformation temperature of the phase-transforming ferroelectric material, the polarization of the dielectric layer undergoes an abrupt change between a ferroelectric phase and a paraelectric phase such that a current flow between the phase-changing capacitor and the charge reservoir via a load thereby converting heat into electrical energy. The present energy conversion method does not require any external bias fields during the energy conversion.
    Type: Application
    Filed: March 27, 2020
    Publication date: October 22, 2020
    Inventors: Chenbo ZHANG, Xian CHEN
  • Publication number: 20190179226
    Abstract: The present disclosure teaches a photolithography plate and a mask correction method, and relates to the field of semiconductor technologies. In forms of the mask correction method, a patterned mask is formed on a substrate, a location of a scattering bar embedded in the substrate is determined according to the mask, and an opening is formed at the determined location so as to embed the scattering bar in the opening. A scattering bar is embedded in a substrate of a photolithography plate so as to effectively avoid the impact of the scattering bar on a mask pattern, reduce a deposition loss, improve the correction effect, and shorten a correction time.
    Type: Application
    Filed: August 10, 2018
    Publication date: June 13, 2019
    Applicants: Semiconductor Manufacturing International (Shangha i) Corporation, Semiconductor Manufacturing International (Beijing ) Corporation
    Inventors: Jiancheng Zhang, Wei Wu, Chenbo Zhang