Abstract: A rotary engine with axially directly connected compression and power cylinders is disclosed, which includes a compression cylinder, a power cylinder, an intermediate cylinder wall located between the compression and the power cylinder to serve as a common inner-end wall of the two cylinders, and a combustion chamber unit fixed to a circumferential surface of the intermediate cylinder wall, so that the rotary engine has axially directly connected compression and power cylinders. A compression-side and a power-side rotational valve are separately fitted in two recessed end surfaces of the intermediate cylinder wall. The compression-side and the power-side rotational valve are provided with three L-shaped first and second openings, respectively.

Abstract: A rotary engine with axially directly connected compression and power cylinders is disclosed, which includes a compression cylinder, a power cylinder, an intermediate cylinder wall located between the compression and the power cylinder to serve as a common inner-end wall of the two cylinders, and a combustion chamber unit fixed to a circumferential surface of the intermediate cylinder wall, so that the rotary engine has axially directly connected compression and power cylinders. A compression-side and a power-side rotational valve are separately fitted in two recessed end surfaces of the intermediate cylinder wall. The compression-side and the power-side rotational valve are provided with three L-shaped first and second openings, respectively.

Abstract: A film deposition apparatus is disclosed. The apparatus comprises: a reaction chamber, a susceptor, a heating module, a driving module, and a cooling module. The susceptor is used for bearing at least one wafer; the heating module is used for heating the wafer; the driving module is used for driving the susceptor to rotate. The cooling module is disposed between the heating module and the driving module. The cooling module is configured to make the temperature distribution between the heating module and the driving module discontinuous.

Abstract: A chemical vapor deposition (CVD) apparatus includes at least one susceptor mounted in a non-horizontal position, and at least one holder rotatably mounted on a first surface of the susceptor for holding wafers. The holder may be rotatable around a holder axis. A showerhead may be mounted at or near a center of the susceptor. The showerhead may release a reaction gas that flows radially toward a periphery of the susceptor. The holder may have a mass center that is eccentric from the holder axis to allow movement relative to the susceptor when the susceptor rotates.

Abstract: An embodiment of this invention provides a gas preheating system for heating one or more gases used in a chemical vapor deposition. The preheating system comprises a heating module and a delivery module. The delivery module is used for passing the one or more gases, and the heating module is configured to heat the one or more gases indirectly via the delivery module.

Abstract: A system for forming one or more layers of material on one or more substrates is disclosed. The system includes a susceptor that rotates around a central susceptor axis. One or more holder gears are located on the susceptor. The holder gears may rotate around the central susceptor axis with the susceptor. A central gear engaged to the holder gears may cause the holder gears to rotate around holder axes of the respective holder gears while the holder gears rotate around the central susceptor axis. The susceptor and the central gear may rotate independently.

Abstract: System and method for forming one or more layers of one or more materials on one or more substrates. The system includes a rotating shell, a susceptor component supported by the rotating shell, and a driving component below the susceptor component and configured to drive the rotating shell and the susceptor component to rotate around a susceptor axis. Additionally, the system includes one or more holder gears located on the susceptor component and configured to rotate around the susceptor axis with the susceptor component and support the one or more substrates, and a central gear engaged to the one or more holder gears and configured to cause the one or more holder gears to rotate around one or more holder axes respectively if the one or more holder gears rotate around the susceptor axis. The susceptor axis is different from the one or more holder axes.

Abstract: A gas-exhausting module for a multichamber thin-film deposition apparatus, which has one or more reactor chambers, includes a collecting chamber and a plurality of gas pipes. The collecting chamber includes an upper portion and a lower portion. The cross-sectional area of the lower portion is less than the cross-sectional area of the upper portion. One end of each gas pipe communicates with one of the reactor chambers. The other end of each gas pipe communicates with the upper portion in a tangential direction. During operation, a cyclonic airflow is provided within the collecting chamber to uniformly extract the exhaust gas from each reactor chamber.