Abstract: A flow guiding device in an immersion-cooled chassis of a server comprises at least one deflector located above a chip on a mainboard in the chassis, each deflector comprises a first end for mounting to the mainboard above the chip and a second end inclined away from the mainboard. The first end is immersed in coolant, the second end is higher than the first end; the deflector further comprises a hollow part including multiple through holes for interrupting upward movement vapor bubbles generated by the hot chip, which reduces probability of the vapor bubbles escaping from the coolant liquid and the chassis. A liquid-cooled chassis having the flow guiding device is also disclosed.

Abstract: A method of forming a semiconductor device includes: forming a fin protruding above a substrate, where a top portion of the fin comprises a layer stack that includes alternating layers of a first semiconductor material and a second semiconductor material; forming a dummy gate structure over the fin; forming openings in the fin on opposing sides of the dummy gate structure; forming source/drain regions in the openings; removing the dummy gate structure to expose the first semiconductor material and the second semiconductor material under the dummy gate structure; performing a first etching process to selectively remove the exposed first semiconductor material, where after the first etching process, the exposed second semiconductor material form nanostructures, where each of the nanostructures has a first shape; and after the first etching process, performing a second etching process to reshape each of the nanostructures into a second shape different from the first shape.

Abstract: A foldable stand has a base, a riser, and a switching mechanism. The riser is located on the base. The switching mechanism connects the base and the riser such that the riser selectively pivots relative to the base from an upright position to a folded position. The switching mechanism has a locked status and a released status. In the locked status, the switching mechanism prevents the riser from pivoting relative to the base. In the released status, the switching mechanism allows the riser to pivot relative to the base from an upright position to a folded position. The switching mechanism is configured to be switched from the locked status to the released status by rotation of the riser around a centerline of the riser.

Abstract: An electronic device and a related tiled electronic device are disclosed. The electronic device includes a protective layer, a circuit structure, a sensing element and a control unit. The circuit structure is disposed on the protective layer and surrounds the sensing element. The control unit is disposed between the circuit structure and the protective layer and electrically connected to the sensing element. The protective layer surrounds the control unit and contacts a surface of the circuit structure.

Abstract: An optical module is disclosed. The optical module includes a carrier, an optical emitter disposed over the carrier, and a monitor disposed over the carrier and configured to adjust a property of a first light emitted from the optical emitter.

Abstract: A twisted nematic liquid crystal display (TN-LCD) structure is provided, which includes a twisted nematic (TN) liquid crystal layer, a first laminated polarizing film, and a second laminated polarizing film. The first laminated polarizing film and the second laminated polarizing film are respectively disposed on a first side and a second side of the TN liquid crystal layer. By means of an angle formed between a first absorption axis of a first linear polarizing film for the first laminated polarizing film and a second absorption axis of a second linear polarizing film for the second laminated polarizing film, the LCD structure of the present invention has the efficacy of an enlarged view angle, improved contrast, and low cost.

Abstract: A method to monitor a nanocrystalline film surface structure and the thickness thereof uses the surface structure characteristics of the vapor deposition nanocrystalline thin films having the low volume fraction to make a nanocrystalline thin film become a nonhomogeneous double-layer structure comprising a dense bottom layer having high index of refraction and a surface layer having the low volume fraction. The optical module of this double-layer structure can be used to simulate the characteristics of the nanocrystalline structure. That is to say, in the thin film deposition manufacturing process, if the thin film structure satisfies the optical module of the double-layer structure, this means it has the nanocrystalline characteristic. Hence, in the manufacturing process, use the optical instruments to measure the thin film and the substrate and to calculate the optical parameters; thus a nanocrystalline film surface structure and the thickness thereof can be precisely monitored immediately.