Patents by Inventor Cheng DIAO

Cheng DIAO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230159571
    Abstract: There is provided herein a silylated organo-modified compound which comprises: at least one moiety having the formula (A): wherein the subscript a is 1 or 2, each D is independently NH or O, each of X, Y and Z are independently an unsubstituted or substituted C or N, the dashed lines between X, Y, and Z indicate an optional double bond between either X and Y or Y and Z, with the proviso that when any of X, Y, or Z is a substituted N atom, such substituted N atom does not participate in a double bond, and each Q is independently O or S; and, at least two moieties having the formula (B):
    Type: Application
    Filed: November 17, 2022
    Publication date: May 25, 2023
    Inventors: Cheng Diao, Monjit Phukan, Neal Patel
  • Publication number: 20230125875
    Abstract: A composition comprising at least one thermoplastic resin and a silicone-masterbatch, articles comprising the compositions, devices comprising the articles, and processes for preparing the article. The compositions are suitable for use as part of or as a separator material for use in an electrochemical device. The composition is used to prepare a film, a membrane, a matrix, a resin, a coating, or a paint, etc., which can be employed as a separator or to coat or form part of a layer of a separator material useful in a device such as an electrical storage device such as, for example, a battery, a fuel cell, a capacitor, etc.
    Type: Application
    Filed: March 5, 2021
    Publication date: April 27, 2023
    Inventors: Kartick BINDUMADHAVAN, Monjit PHUKAN, Cheng DIAO, Shreedhar BHAT
  • Publication number: 20230043080
    Abstract: There is provided herein a resin composition comprising: (i) a silane coupling agent of the general formula (I): as described herein, and (ii) at least one resin which is interactive with one or more of the R1, R2 and X groups of silane coupling agent (i).
    Type: Application
    Filed: July 15, 2022
    Publication date: February 9, 2023
    Inventors: Cheng Diao, Monjit Phukan, Neal Patel
  • Publication number: 20220340734
    Abstract: A polyolefin composition is shown and described herein. The polyolefin composition is a composition comprising a polyolefin resin and a filler where the filler is treated with an acrylic functional silane. Employing a filler treated with an acrylic functional silane may allow for eliminating some common polyolefins reinforcing additives such as modified or grafted polyolefins. The composition can be employed to make a molded article.
    Type: Application
    Filed: April 27, 2022
    Publication date: October 27, 2022
    Inventors: Cheng Diao, Monjit Phukan, Neal Patel, Qian Wu
  • Patent number: 11008350
    Abstract: Functionalized fluoro polyhedral oligomeric silsesquioxane (F-POSS) materials as additives to improve liquid repellence of various polymers, the additive including at least one functionalized F-POSS material, wherein the functional group is at least one material selected from the group consisting of amines, isocyanates, epoxies, carboxylic acids, and esters.
    Type: Grant
    Filed: August 26, 2019
    Date of Patent: May 18, 2021
    Assignee: NBD NANOTECHNOLOGIES, INC.
    Inventors: Cheng Diao, Esra Altinok, Bong June Zhang, Perry L. Catchings, Sr.
  • Publication number: 20190389886
    Abstract: Functionalized fluoro polyhedral oligomeric silsesquioxane (F-POSS) materials as additives to improve liquid repellence of various polymers, the additive including at least one functionalized F-POSS material, wherein the functional group is at least one material selected from the group consisting of amines, isocyanates, epoxies, carboxylic acids, and esters.
    Type: Application
    Filed: August 26, 2019
    Publication date: December 26, 2019
    Inventors: Cheng DIAO, Esra ALTINOK, Bong June ZHANG, Perry L. CATCHINGS, SR.
  • Patent number: 10392409
    Abstract: Functionalized fluoro polyhedral oligomeric silsesquioxane (F-POSS) materials as additives to improve liquid repellence of various polymers, the additive including at least one functionalized F-POSS material, wherein the functional group is at least one material selected from the group consisting of amines, isocyanates, epoxies, carboxylic acids, and esters.
    Type: Grant
    Filed: March 28, 2017
    Date of Patent: August 27, 2019
    Assignee: NBD NANOTECHNOLOGIES, INC.
    Inventors: Cheng Diao, Esra Altinok, Bong June Zhang, Perry L. Catchings, Sr.
  • Publication number: 20170275437
    Abstract: Functionalized fluoro polyhedral oligomeric silsesquioxane (F-POSS) materials as additives to improve liquid repellence of various polymers, the additive including at least one functionalized F-POSS material, wherein the functional group is at least one material selected from the group consisting of amines, isocyanates, epoxies, carboxylic acids, and esters.
    Type: Application
    Filed: March 28, 2017
    Publication date: September 28, 2017
    Inventors: Cheng DIAO, Esra ALTINOK, Bong June ZHANG, Perry L. CATCHINGS, SR.