Patents by Inventor Cheng-Han Yeh

Cheng-Han Yeh has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • SYSTEM AND METHOD FOR CLEANING AN EUV MASK
    Publication number: 20230280666
    Abstract: An extreme ultraviolet (EUV) photolithography system cleans debris from an EUV reticle. The system includes a cleaning electrode configured to be positioned adjacent the EUV reticle. The system includes a voltage source that helps draw debris from the EUV reticle toward the cleaning electrode by applying a voltage of alternating polarity to the cleaning electrode.
    Type: Application
    Filed: May 9, 2023
    Publication date: September 7, 2023
    Inventors: Yen-Hui LI, Cheng-Han YEH, Tzung-Chi FU
  • System and method for cleaning an EUV mask
    Patent number: 11681235
    Abstract: An extreme ultraviolet (EUV) photolithography system cleans debris from an EUV reticle. The system includes a cleaning electrode configured to be positioned adjacent the EUV reticle. The system includes a voltage source that helps draw debris from the EUV reticle toward the cleaning electrode by applying a voltage of alternating polarity to the cleaning electrode.
    Type: Grant
    Filed: September 17, 2021
    Date of Patent: June 20, 2023
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Yen-Hui Li, Cheng-Han Yeh, Tzung-Chi Fu
  • SYSTEM AND METHOD FOR CLEANING AN EUV MASK
    Publication number: 20220283521
    Abstract: An extreme ultraviolet (EUV) photolithography system cleans debris from an EUV reticle. The system includes a cleaning electrode configured to be positioned adjacent the EUV reticle. The system includes a voltage source that helps draw debris from the EUV reticle toward the cleaning electrode by applying a voltage of alternating polarity to the cleaning electrode.
    Type: Application
    Filed: September 17, 2021
    Publication date: September 8, 2022
    Inventors: Yen-Hui LI, Cheng-Han Yeh, Tzung-Chi FU