Patents by Inventor Cheng-Hao Lai

Cheng-Hao Lai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20230028023
    Abstract: Methods and systems for IC photomask patterning are described. In some embodiments, a method includes inserting a dummy region in an IC design layout, the IC design layout includes an active region, and the active region and the dummy region is separated by a first distance. The method further includes performing one or more operations on the IC design layout, and the active region and the dummy region is separated by a second distance substantially less than the first distance. The method further includes performing a dummy region size reduction on the IC design layout to increase the second distance to a third distance substantially greater than the second distance, and the third distance is substantially greater than a minimum feature size to be patterned by a photolithography tool. The method further includes forming a photomask using the IC design layout.
    Type: Application
    Filed: January 27, 2022
    Publication date: January 26, 2023
    Inventors: Wei-Hao HUANG, Chun Ting LEE, Cheng-Tse LAI
  • Publication number: 20230010810
    Abstract: A system and a method for supplying target material in an EUV light source are provided. The system for supplying a target material comprises a priming assembly, a refill assembly and a droplet generator assembly. The priming is configured to transform the target material from a solid state to a liquid state. The refill assembly is in fluid communication with the priming assembly and configured to receive the target material in the liquid state from the priming assembly. Further, the refill assembly includes a purifier configured to purify the target material in the liquid state. The droplet generator assembly is configured to supply the target material in the liquid state from the refill assembly.
    Type: Application
    Filed: July 9, 2021
    Publication date: January 12, 2023
    Inventors: HSIN-FENG CHEN, MING-HSUN TSAI, LI-JUI CHEN, SHANG-CHIEH CHIEN, HENG-HSIN LIU, CHENG-HAO LAI, YU-HUAN CHEN, WEI-SHIN CHENG, YU-KUANG SUN, CHENG-HSUAN WU, YU-FA LO, CHIAO-HUA CHENG
  • Publication number: 20220415737
    Abstract: A semiconductor device includes semiconductor dies and a redistribution structure. The semiconductor dies are encapsulated in an encapsulant. The redistribution structure extends on the encapsulant and electrically connects the semiconductor dies. The redistribution structure includes dielectric layers and redistribution conductive layers alternately stacked. An outermost dielectric layer of the dielectric layers further away from the semiconductor dies is made of a first material. A first dielectric layer of the dielectric layers on which the outermost dielectric layer extends is made of a second material different from the first material. The first material includes at least one material selected from the group consisting of an epoxy resin, a phenolic resin, a polybenzooxazole, and a polyimide having a curing temperature lower than 250° C.
    Type: Application
    Filed: June 25, 2021
    Publication date: December 29, 2022
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Cheng-Chieh Wu, Ting Hao Kuo, Kuo-Lung Pan, Po-Yuan Teng, Yu-Chia Lai, Shu-Rong Chun, Mao-Yen Chang, Wei-Kang Hsieh, Pavithra Sriram, Hao-Yi Tsai, Po-Han Wang, Yu-Hsiang Hu, Hung-Jui Kuo
  • Publication number: 20220404716
    Abstract: A wafer table inspection tool described herein is capable of being positioned over a wafer table while the wafer table is positioned in a bottom module of an exposure tool of a lithography system. The wafer table inspection tool is capable of quickly evaluating the condition of surface burls on the wafer table and evaluating cleaning performance of a cleaning operation in which the surface burls are cleaned.
    Type: Application
    Filed: April 15, 2022
    Publication date: December 22, 2022
    Inventors: Ming-Hsun TSAI, Cheng-Hao LAI, Shang-Chieh CHIEN, Li-Jui CHEN, Heng-Hsin LIU
  • Patent number: 11533799
    Abstract: A system and a method for supplying target material in an EUV light source are provided. The system for supplying a target material comprises a priming assembly, a refill assembly and a droplet generator assembly. The priming is configured to transform the target material from a solid state to a liquid state. The refill assembly is in fluid communication with the priming assembly and configured to receive the target material in the liquid state from the priming assembly. Further, the refill assembly includes a purifier configured to purify the target material in the liquid state. The droplet generator assembly is configured to supply the target material in the liquid state from the refill assembly.
    Type: Grant
    Filed: July 9, 2021
    Date of Patent: December 20, 2022
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD.
    Inventors: Hsin-Feng Chen, Ming-Hsun Tsai, Li-Jui Chen, Shang-Chieh Chien, Heng-Hsin Liu, Cheng-Hao Lai, Yu-Huan Chen, Wei-Shin Cheng, Yu-Kuang Sun, Cheng-Hsuan Wu, Yu-Fa Lo, Chiao-Hua Cheng
  • Patent number: 11528797
    Abstract: An extreme ultraviolet (EUV) photolithography system generates EUV light by irradiating droplets with a laser. The system includes a droplet generator with a nozzle and a piezoelectric structure coupled to the nozzle. The generator outputs groups of droplets. A control system applies a voltage waveform to the piezoelectric structure while the nozzle outputs the group of droplets. The waveform causes the droplets of the group to have a spread of velocities that results in the droplets coalescing into a single droplet prior to being irradiated by the laser.
    Type: Grant
    Filed: April 16, 2021
    Date of Patent: December 13, 2022
    Assignee: Taiwan Semiconductor Manufacturing Co., Ltd.
    Inventors: Yu-Kuang Sun, Cheng-Hao Lai, Yu-Huan Chen, Wei-Shin Cheng, Ming-Hsun Tsai, Hsin-Feng Chen, Chiao-Hua Cheng, Cheng-Hsuan Wu, Yu-Fa Lo, Shang-Chieh Chien, Li-Jui Chen, Heng-Hsin Liu
  • Publication number: 20220376077
    Abstract: Semiconductor devices and methods which utilize a passivation dopant to passivate a gate dielectric layer are provided. The passivation dopant is introduced to the gate dielectric layer through a work function layer using a process such as a soaking method. The passivation dopant is an atom which may help to passivate electrical trapping defects, such as fluorine.
    Type: Application
    Filed: July 28, 2022
    Publication date: November 24, 2022
    Inventors: Chia-Wei Hsu, Pei Ying Lai, Cheng-Hao Hou, Xiong-Fei Yu, Chi On Chui
  • Publication number: 20220367279
    Abstract: A method includes depositing a high-k gate dielectric layer over and along sidewalls of a semiconductor fin. The method further includes depositing an n-type work function metal layer over the high-k gate dielectric layer and performing a passivation treatment on the high-k gate dielectric layer through the n-type work function metal layer. The passivation treatment comprises a remote plasma process. The method further includes depositing a fill metal over the n-type work function metal layer to form a metal gate stack over the high-k gate dielectric layer. The metal gate stack comprising the n-type work function metal layer and the fill metal.
    Type: Application
    Filed: July 20, 2022
    Publication date: November 17, 2022
    Inventors: Pei Ying Lai, Chia-Wei Hsu, Cheng-Hao Hou, Xiong-Fei Yu, Chi On Chui
  • Publication number: 20220334495
    Abstract: Impurities in a liquefied solid fuel utilized in a droplet generator of an extreme ultraviolet photolithography system are removed from vessels containing the liquefied solid fuel. Removal of the impurities increases the stability and predictability of droplet formation which positively impacts wafer yield and droplet generator lifetime.
    Type: Application
    Filed: October 5, 2021
    Publication date: October 20, 2022
    Inventors: Cheng-Hao LAI, Ming-Hsun TSAI, Hsin-Feng CHEN, Wei-Shin CHENG, Yu-Kuang SUN, Cheng-Hsuan WU, Yu-Fa LO, Shih-Yu TU, Jou-Hsuan LU, Shang-Chieh CHIEN, Li-Jui CHEN, Heng-Hsin LIU
  • Publication number: 20220338334
    Abstract: An extreme ultraviolet (EUV) photolithography system generates EUV light by irradiating droplets with a laser. The system includes a droplet generator with a nozzle and a piezoelectric structure coupled to the nozzle. The generator outputs groups of droplets. A control system applies a voltage waveform to the piezoelectric structure while the nozzle outputs the group of droplets. The waveform causes the droplets of the group to have a spread of velocities that results in the droplets coalescing into a single droplet prior to being irradiated by the laser.
    Type: Application
    Filed: April 16, 2021
    Publication date: October 20, 2022
    Inventors: Yu-Kuang SUN, Cheng-Hao LAI, Yu-Huan CHEN, Wei-Shin CHENG, Ming-Hsun TSAI, Hsin-Feng CHEN, Chiao-Hua CHENG, Cheng-Hsuan WU, Yu-Fa LO, Shang-Chieh CHIEN, Li-Jui CHEN, Heng-Hsin LIU
  • Patent number: 11462626
    Abstract: Semiconductor devices and methods which utilize a passivation dopant to passivate a gate dielectric layer are provided. The passivation dopant is introduced to the gate dielectric layer through a work function layer using a process such as a soaking method. The passivation dopant is an atom which may help to passivate electrical trapping defects, such as fluorine.
    Type: Grant
    Filed: June 12, 2020
    Date of Patent: October 4, 2022
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Chia-Wei Hsu, Pei Ying Lai, Cheng-Hao Hou, Xiong-Fei Yu, Chi On Chui
  • Patent number: 11134558
    Abstract: A droplet generator assembly includes a storage tank, a refill system, a droplet generator, and a temperature control system. The storage tank is configured to store a target material. The refill system is connected to the storage tank. The droplet generator includes a reservoir and a nozzle connected to the reservoir, in which the droplet generator is connected to the refill system, and the refill system is configured to deliver the target material to the reservoir. The temperature control system is adjacent to the refill system or the reservoir.
    Type: Grant
    Filed: July 11, 2019
    Date of Patent: September 28, 2021
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Shih-Yu Tu, Yu-Kuang Sun, Shao-Hua Wang, Han-Lung Chang, Hsiao-Lun Chang, Li-Jui Chen, Po-Chung Cheng, Cheng-Hao Lai, Hsin-Feng Chen, Wei-Shin Cheng, Ming-Hsun Tsai, Yen-Hsun Chen
  • Patent number: 11086225
    Abstract: A method includes providing a plurality of fuel droplets into an EUV source vessel by a fuel droplet generator, in which the fuel droplet generator has a first portion inside the EUV source vessel and a second portion outside the EUV source vessel; generating a plurality of output signals respectively from a plurality of oscillation sensors on the fuel droplet generator; determining whether the output signals are acceptable; and determining whether an unwanted oscillation originates from the first portion of the fuel droplet generator or the second portion of the fuel droplet generator when the output signals is determined as unacceptable.
    Type: Grant
    Filed: May 29, 2020
    Date of Patent: August 10, 2021
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Wei-Shin Cheng, Hsin-Feng Chen, Cheng-Hao Lai, Shao-Hua Wang, Han-Lung Chang, Li-Jui Chen, Po-Chung Cheng
  • Publication number: 20200292946
    Abstract: A method includes providing a plurality of fuel droplets into an EUV source vessel by a fuel droplet generator, in which the fuel droplet generator has a first portion inside the EUV source vessel and a second portion outside the EUV source vessel; generating a plurality of output signals respectively from a plurality of oscillation sensors on the fuel droplet generator; determining whether the output signals are acceptable; and determining whether an unwanted oscillation originates from the first portion of the fuel droplet generator or the second portion of the fuel droplet generator when the output signals is determined as unacceptable.
    Type: Application
    Filed: May 29, 2020
    Publication date: September 17, 2020
    Inventors: Wei-Shin CHENG, Hsin-Feng CHEN, Cheng-Hao LAI, Shao-Hua WANG, Han-Lung CHANG, Li-Jui CHEN, Po-Chung CHENG
  • Patent number: 10670970
    Abstract: A method includes providing a plurality of fuel droplets into an EUV source vessel by a fuel droplet generator, in which the fuel droplet generator has a first portion inside the EUV source vessel and a second portion outside the EUV source vessel; generating a plurality of output signals respectively from a plurality of oscillation sensors on the fuel droplet generator; determining whether the output signals are acceptable; and determining whether an unwanted oscillation originates from the first portion of the fuel droplet generator or the second portion of the fuel droplet generator when the output signals is determined as unacceptable.
    Type: Grant
    Filed: January 25, 2019
    Date of Patent: June 2, 2020
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Wei-Shin Cheng, Hsin-Feng Chen, Cheng-Hao Lai, Shao-Hua Wang, Han-Lung Chang, Li-Jui Chen, Po-Chung Cheng
  • Publication number: 20200107427
    Abstract: A droplet generator assembly includes a storage tank, a refill system, a droplet generator, and a temperature control system. The storage tank is configured to store a target material. The refill system is connected to the storage tank. The droplet generator includes a reservoir and a nozzle connected to the reservoir, in which the droplet generator is connected to the refill system, and the refill system is configured to deliver the target material to the reservoir. The temperature control system is adjacent to the refill system or the reservoir.
    Type: Application
    Filed: July 11, 2019
    Publication date: April 2, 2020
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Shih-Yu TU, Yu-Kuang SUN, Shao-Hua WANG, Han-Lung CHANG, Hsiao-Lun CHANG, Li-Jui CHEN, Po-Chung CHENG, Cheng-Hao LAI, Hsin-Feng CHEN, Wei-Shin CHENG, Ming-Hsun TSAI, Yen-Hsun CHEN
  • Patent number: 10331035
    Abstract: A method for generating a radiation light in a lithography exposure system. The method includes producing a predetermined gas pressure in a storage chamber to supply a first load of a target fuel in the storage chamber via a nozzle. The method further includes irradiating the target fuel from the nozzle with a laser to generate the radiation light. The method also includes increasing the gas pressure in a buffer chamber which receives a second load of target fuel to the predetermined gas pressure. In addition, the method includes actuating the flow of the target fuel from the buffer chamber to the storage chamber.
    Type: Grant
    Filed: June 7, 2018
    Date of Patent: June 25, 2019
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD.
    Inventors: Cheng-Hao Lai, Han-Lung Chang, Li-Jui Chen
  • Publication number: 20190137882
    Abstract: A method for generating a radiation light in a lithography exposure system. The method includes producing a predetermined gas pressure in a storage chamber to supply a first load of a target fuel in the storage chamber via a nozzle. The method further includes irradiating the target fuel from the nozzle with a laser to generate the radiation light. The method also includes increasing the gas pressure in a buffer chamber which receives a second load of target fuel to the predetermined gas pressure. In addition, the method includes actuating the flow of the target fuel from the buffer chamber to the storage chamber.
    Type: Application
    Filed: June 7, 2018
    Publication date: May 9, 2019
    Inventors: Cheng-Hao LAI, Han-Lung CHANG, Li-Jui CHEN
  • Publication number: 20140166081
    Abstract: A solar cell includes a semiconductor substrate, a back electrode layer and a front electrode layer including a first bus bar, a second bus bar, first finger bar units, second finger bar units, first interconnecting bars, and second interconnecting bars. The first finger bar units are spaced apart from the second finger bar units. Each of the first finger bar units has first finger bars and a first auxiliary bar connected to the first finger bars. Each of the second finger bar units has second finger bars and a second auxiliary bar connected to the second finger bars. Each first interconnecting bar interconnects two adjacent first finger bar units. Each second interconnecting bar interconnects two adjacent second finger bar units.
    Type: Application
    Filed: December 16, 2013
    Publication date: June 19, 2014
    Applicant: MOTECH INDUSTRIES INC.
    Inventors: Cheng-Hao Lai, Wei-Yu Chen, Che-Hung Chen, Yen-Chih Liu