Patents by Inventor Cheng-Heng Chen

Cheng-Heng Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11996461
    Abstract: Semiconductor structures and methods of forming the same are provided. A semiconductor structure according to one embodiment includes first nanostructures, a first gate structure wrapping around each of the first nanostructures and disposed over an isolation structure, and a backside gate contact disposed below the first nanostructures and adjacent to the isolation structure. A bottom surface of the first gate structure is in direct contact with the backside gate contact.
    Type: Grant
    Filed: May 22, 2023
    Date of Patent: May 28, 2024
    Assignee: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Huan-Chieh Su, Chun-Yuan Chen, Lo-Heng Chang, Li-Zhen Yu, Lin-Yu Huang, Cheng-Chi Chuang, Chih-Hao Wang
  • Publication number: 20240096996
    Abstract: A semiconductor device includes a first dielectric layer, a stack of semiconductor layers disposed over the first dielectric layer, a gate structure wrapping around each of the semiconductor layers and extending lengthwise along a direction, and a dielectric fin structure and an isolation structure disposed on opposite sides of the stack of semiconductor layers and embedded in the gate structure. The dielectric fin structure has a first width along the direction smaller than a second width of the isolation structure along the direction. The isolation structure includes a second dielectric layer extending through the gate structure and the first dielectric layer, and a third dielectric layer extending through the first dielectric layer and disposed on a bottom surface of the gate structure and a sidewall of the first dielectric layer.
    Type: Application
    Filed: November 28, 2023
    Publication date: March 21, 2024
    Inventors: Huan-Chieh Su, Chun-Yuan Chen, Li-Zhen Yu, Lo-Heng Chang, Cheng-Chi Chuang, Kuan-Lun Cheng, Chih-Hao Wang
  • Publication number: 20240088156
    Abstract: A semiconductor device includes at least one fin, a first dielectric layer and a second dielectric layer. The first dielectric layer is disposed on the at least one fin. The second dielectric layer between the at least one fin and the first dielectric layer. A thickness of the first dielectric layer on a sidewall of the at least one fin is less than a thickness of the second dielectric layer on the sidewall of the at least one fin.
    Type: Application
    Filed: November 23, 2023
    Publication date: March 14, 2024
    Applicant: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Cheng-I Lin, Chun-Heng Chen, Ming-Ho Lin, Chi-On Chui
  • Patent number: 8514505
    Abstract: A wafer level optical lens substrate including a substrate and at least one lens is provided. The substrate has at least one through hole and at least one flange, wherein each flange is located on a side wall in each through hole. Each lens located in each through hole is embedded with each flange. A method of fabricating a wafer level optical lens substrate and a wafer level optical lens module are also provided respectively.
    Type: Grant
    Filed: May 3, 2011
    Date of Patent: August 20, 2013
    Assignee: Himax Semiconductor, Inc.
    Inventor: Cheng-Heng Chen
  • Publication number: 20120305526
    Abstract: A method of wet etching substrates for forming through holes to embed wafer level optical lens modules is provided. The provided etching method is capable of concurrently etching a plurality of substrates to form the through holes since bidirectional etching process is used. That means, all the desired through holes can be formed simultaneously during the wet etching process. Additionally, a plurality of substrates can be etched by each run of etching process. Thus, the newly provided wet etching method significantly and effectively reduces the process time and manufacturing cost.
    Type: Application
    Filed: June 3, 2011
    Publication date: December 6, 2012
    Applicant: HIMAX TECHNOLOGIES LIMITED
    Inventor: Cheng-Heng Chen
  • Patent number: 8190013
    Abstract: An optical system including a photo sensor, a wafer level optical (WLO) lens module and a focusing motor is provided. The WLO lens module is located at the photo sensor. The WLO lens module includes at least one transparent substrate and at least one lens, wherein the lens is disposed on the transparent substrate. The focusing motor is located between the WLO lens module and the photo sensor. The focusing motor drives the WLO lens module to move toward or backward the photo sensor.
    Type: Grant
    Filed: December 17, 2009
    Date of Patent: May 29, 2012
    Assignee: Himax Semiconductor, Inc.
    Inventor: Cheng-Heng Chen
  • Publication number: 20110222173
    Abstract: A wafer level optical lens substrate including a substrate and at least one lens is provided. The substrate has at least one through hole and at least one flange, wherein each flange is located on a side wall in each through hole. Each lens located in each through hole is embedded with each flange. A method of fabricating a wafer level optical lens substrate and a wafer level optical lens module are also provided respectively.
    Type: Application
    Filed: May 3, 2011
    Publication date: September 15, 2011
    Applicant: HIMAX SEMICONDUCTOR, INC.
    Inventor: Cheng-Heng Chen
  • Patent number: 7974023
    Abstract: A wafer level optical lens substrate including a substrate and at least one lens is provided. The substrate has at least one through hole and at least one flange, wherein each flange is located on a side wall in each through hole. Each lens located in each through hole is embedded with each flange. A method of fabricating a wafer level optical lens substrate and a wafer level optical lens module are also provided respectively.
    Type: Grant
    Filed: March 11, 2010
    Date of Patent: July 5, 2011
    Assignee: Himax Semiconductor, Inc.
    Inventor: Cheng-Heng Chen
  • Publication number: 20110150449
    Abstract: An optical zoom system including a photo sensor, a wafer level optical (WLO) lens module and a focusing motor is provided. The WLO lens module is located at the photo sensor. The WLO lens module includes at least one transparent substrate and at least one lens, wherein the lens is disposed on the transparent substrate. The focusing motor is located between the WLO lens module and the photo sensor. The focusing motor drives the WLO lens module to move toward or backward the photo sensor.
    Type: Application
    Filed: December 17, 2009
    Publication date: June 23, 2011
    Applicant: WISEPAL TECHNOLOGIES, INC.
    Inventor: Cheng-Heng Chen