Abstract: Embodiments disclose a method for fabricating a color filter, comprising: providing a substrate; forming a planarization layer on the substrate; forming a first color layer over the planarization layer; exposing and developing the first color layer to form a patterned first color filter unit over the planarization layer; forming a second color layer over the planarization layer and the patterned first color filter unit; exposing and developing the second color layer to form a patterned second color filter unit over the planarization layer; forming a third color layer over the planarization layer and the patterned first and second color filter units; and etching back or chemical mechanical polishing (CMP) the third color layer to form a patterned third color filter unit over the planarization layer.