Abstract: In an embodiment, a method includes: forming a first fin and a second fin over a semiconductor substrate; forming an isolation region between the first fin and the second fin, forming the isolation region comprising: depositing an oxide liner along the first fin, the second fin, and the semiconductor substrate, the oxide liner comprising a first upper portion and a first lower portion along the first fin, the first lower portion being between the first upper portion and the semiconductor substrate; thinning the oxide liner; depositing an insulation material over the oxide liner; and recessing the insulation material; and forming a gate structure over the first fin, the second fin, and the isolation region.

Abstract: Examples pertaining to preamble puncturing negotiation in wireless communications are described. A station (STA) may receive a control frame, and, in response, apply the MRU pattern for one or more transmissions or receptions in a transmission opportunity (TXOP). In the control frame, either a plurality of first reserved bits in a SERVICE field or a plurality of bits in a User Info field are set to indicate a multiple resource unit (MRU) pattern regarding preamble puncturing.

Abstract: A multiple function button for an information handling system includes an outer shell and an inner button. The outer shell includes multiple channels having first, second, third and fourth channels. The inner button is inserted within the outer shell. The inner button includes a tab and a contact component. The tab moves within the multiple channels. When the tab is within the first channel, the inner button is in a first position and contact component is positioned over a first contact of the information handling system. When the tab is within the third channel, the inner button is in a second position and the contact component is positioned over a second contact of the information handling system.

Abstract: A wafer position status inspection apparatus includes a wafer transportation device, a robotic arm rotatably mounted on the wafer transportation device, an image capture device arranged on the robotic arm, a light flashing device arranged at one side of the image capture device, and a status inspection section in information connection with the image capture device. An image capturing direction of the image capture device is set consistent with a gripping direction of the robotic arm, and a light projecting direction of the light flashing device is consistent with the image capturing direction. The light flashing device projects light on a wafer to generate a light-reflecting contour, which is captured by the image capture device to form a wafer contour image based on which the status inspection section acquires a wafer deposition status to identify various wafer statuses including incline, overlap, absence, and warp.

Abstract: A gas circulation structure of an equipment front end module is provided, having a main structure including a chamber, a filter assembly, at least one connection pipeline, at least one wind collection device, at least one first fan, at least one second fan, at least one gas inlet port, at least one gas outlet port, and at least one gas discharge valve. By means of the above structure, gas is introduced through the gas inlet port into the connection pipeline and passes through the first fan to move, through the filter module, into the chamber to be caused by the second fan to return back to the connection pipeline to complete circulation. As such, the time required for filling gas is shortened; gas is caused to converge to thereby enhance the circulation efficiency; noise is reduced; dust is properly blown away; and subsequent service and maintenance is made easy.