Patents by Inventor Cheng-Hsing Fan

Cheng-Hsing Fan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Random amorphous copolymer and manufacturing method thereof
    Patent number: 7687594
    Abstract: A random amorphous copolyester is synthesized by using diacid monomers and diol monomers. The random amorphous copolyester has a structure of the formula (I): wherein R1, R2 is an aromatic or aliphatic monomer, A is 0-0.8, B is 0-0.8, C is 0-1, D is 0-1, E is 0-0.8, F is 0-0.8, C+D<0.2 and A+B+E+F<0.8. The diacid monomer comprises TPA and an aromatic or aliphatic diacid monomer, the diol monomer comprises EG, 1,3 and 1,4-CHDM, and an aromatic or aliphatic diol monomer.
    Type: Grant
    Filed: June 24, 2008
    Date of Patent: March 30, 2010
    Assignee: Industrial Technology Research Institute
    Inventors: Chi-Yuan Hung, Cheng-Hsing Fan, Yuhsin Tsai, Fu-Yu Tsai
  • RANDOM AMORPHOUS COPOLYMER AND MANUFACTURING METHOD THEREOF
    Publication number: 20090137768
    Abstract: A random amorphous copolyester is provided. The copolyester of the invention is synthesized by using diacid monomers and diol monomers. The random amorphous copolyester has a structure of the formula (I): wherein R1, R2 is an aromatic or aliphatic monomer, and wherein A, B, C, D, E and F are numbers of repeating units, A is 0-0.8, B is 0-0.8, C is 0-1, D is 0-1, E is 0-0.8, F is 0-0.8, C+D>0.2 and A+B+E+F<0.8. The diacid monomer comprises TPA and an aromatic or aliphatic diacid monomer, the diol monomer comprises EG, 1,3 and 1,4-CHDM, and an aromatic or aliphatic diol monomer.
    Type: Application
    Filed: June 24, 2008
    Publication date: May 28, 2009
    Applicant: INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE
    Inventors: Chi-Yuan Hung, Cheng-Hsing Fan, Yuhsin Tsai, Fu-Yu Tsai