Patents by Inventor Cheng-Hsuan Chou

Cheng-Hsuan Chou has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11075155
    Abstract: A package structure includes a redistribution layer having a first surface, a second surface disposed opposite to the first surface, and at least one sidewall connected to the first surface and the second surface, at least one bonding electrode disposed on the first surface of the redistribution layer, and a mounting layer disposed on the second surface of the redistribution layer. The mounting layer includes a plurality of conductive pads that are spaced apart from each other. At least one of the conductive pads is exposed by the sidewall of the redistribution layer.
    Type: Grant
    Filed: October 16, 2019
    Date of Patent: July 27, 2021
    Assignee: InnoLux Corporation
    Inventors: Hsueh-Hsuan Chou, Chia-Chieh Fan, Cheng-Chi Wang, Kuan-Jen Wang
  • Publication number: 20210123143
    Abstract: Embodiments of the present disclosure relate to articles, coated articles, and methods of coating such articles with a corrosion resistant coating. The corrosion resistant coating can comprise hafnium aluminum oxide. The corrosion resistant coating may be deposited by a non-line of sight deposition, such as atomic layer deposition. Articles that may be coated may include chamber components, such as gas lines.
    Type: Application
    Filed: October 16, 2020
    Publication date: April 29, 2021
    Inventors: David Fenwick, Jennifer Y. Sun, Cheng-Hsuan Chou, Xiao-Ming He
  • Publication number: 20200310001
    Abstract: Described herein is a method of depositing a conformal, optically transparent coating onto a surface of one or more internal components that are enclosed within an assembled device using a non-line-of-sight deposition process without altering a structure of the assembled device or impacting functionality of the assembled device. Also described is an assembled device including one or more internal components enclosed within the assembled device and a coating deposited onto a surface of the internal components enclosed within the assembled device, where the coating is a conformal, optically transparent coating that is resistant to corrosion by at least one of fluorine-, chlorine-, sulfur-, hydrogen-, bromine-, or nitrogen-based acids and that does not negatively impact functionality of the internal components.
    Type: Application
    Filed: March 16, 2020
    Publication date: October 1, 2020
    Inventors: Alexander BERGER, Cheng-Hsuan CHOU, David KNAPP
  • Patent number: 10755900
    Abstract: A method of applying a multi-layer plasma resistant coating on an article comprises performing plating or ALD to form a conformal first plasma resistant layer on an article, wherein the conformal first plasma resistant layer is formed on a surface of the article and on walls of high aspect ratio features in the article. The conformal first plasma resistant coating has a porosity of approximately 0% and a thickness of approximately 200 nm to approximately 1 micron. One of electron beam ion assisted deposition (EB-IAD), plasma enhanced chemical vapor deposition (PECVD), aerosol deposition or plasma spraying is then performed to form a second plasma resistant layer that covers the conformal first plasma resistant layer at a region of the surface but not at the walls of the high aspect ratio features.
    Type: Grant
    Filed: April 27, 2018
    Date of Patent: August 25, 2020
    Assignee: APPLIED MATERIALS, INC.
    Inventors: Toan Tran, Laksheswar Kalita, Tae Won Kim, Dmitry Lubomirsky, Xiaowei Wu, Xiao-Ming He, Cheng-Hsuan Chou, Jennifer Y. Sun
  • Publication number: 20190382880
    Abstract: Disclosed are rare earth metal containing silicate coatings, coated articles (e.g., heaters and susceptors) or bodies of articles and methods of coating such articles with a rare earth metal containing silicate coating.
    Type: Application
    Filed: June 18, 2019
    Publication date: December 19, 2019
    Inventors: Xiao-Ming He, Cheng-Hsuan Chou, Jennifer Y. Sun
  • Publication number: 20190376202
    Abstract: An enhanced anodization method includes forming a porous anodization layer comprising columns of anodization layer material with pores between adjacent columns. The method further includes sealing the porous layer by forming a sealing layer at a top of the porous layer. The sealing layer may be formed by using a hybrid sealing process that combines, in any order, two or more of de-ionized (DI) water seal, Ni sealing, and, PTFE sealing. Alternatively, the sealing layer is formed by conformally coating the columns in the porous layer with one or more layers of a coating material. Further, the coating material may be surface-fluorinated to improve plasma resistance.
    Type: Application
    Filed: June 6, 2019
    Publication date: December 12, 2019
    Inventors: Xiao-Ming HE, Jennifer Y. SUN, David FENWICK, Cheng-Hsuan CHOU, Xiaowei WU, Chidambara A. RAMALINGAM, Michael R. RICE
  • Publication number: 20180330923
    Abstract: A method of applying a multi-layer plasma resistant coating on an article comprises performing plating or ALD to form a conformal first plasma resistant layer on an article, wherein the conformal first plasma resistant layer is formed on a surface of the article and on walls of high aspect ratio features in the article. The conformal first plasma resistant coating has a porosity of approximately 0% and a thickness of approximately 200 nm to approximately 1 micron. One of electron beam ion assisted deposition (EB-IAD), plasma enhanced chemical vapor deposition (PECVD), aerosol deposition or plasma spraying is then performed to form a second plasma resistant layer that covers the conformal first plasma resistant layer at a region of the surface but not at the walls of the high aspect ratio features.
    Type: Application
    Filed: April 27, 2018
    Publication date: November 15, 2018
    Inventors: Toan Tran, Laksheswar Kalita, Tae Won Kim, Dmitry Lubomirsky, Xiaowei Wu, Xiao-Ming He, Cheng-Hsuan Chou, Jennifer Y. Sun