Patents by Inventor Cheng-Kai Liao

Cheng-Kai Liao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250070500
    Abstract: A cable assembly, configured to be mounted to a circuit board having a first conductive pad and a second conductive pad, includes a first cable, a second cable and a support member. The first cable includes a first core, a first insulator and a first shielding layer. The second cable includes a second core, a second insulator and a second shielding layer. The first core and the second core are configured to be in contact with the first conductive pad and the second conductive pad. The support member includes a support portion. The support portion is configured to support the first insulator and the second insulator. The connection portion is in contact with the first shielding layer and the second shielding layer. A cable connector having the cable assembly is also disclosed.
    Type: Application
    Filed: April 29, 2024
    Publication date: February 27, 2025
    Applicant: Luxshare Precision Industry Company Limited
    Inventors: Cheng-Kai LIAO, Wei WANG, Minquan YU, Po-Chang HUANG, Ming-Yu HO
  • Patent number: 8999194
    Abstract: The present invention is to provide an etching solution capable of effectively reducing Galvanic effect, wherein the etching solution is obtained by way of dissolving an etchant and a nitrogen containing five-member heterocyclic compound in water. Thus, when at least one first metal (e.g., gold) and at least one second metal (e.g., copper) disposed on a substrate is treated with a wet etching process by using this etching solution, the nitrogen containing five-member heterocyclic compound would form an organic protecting film on the first metal having higher reduction potential, so as to effectively avoid the second metal from being over etched resulted from the Galvanic effect.
    Type: Grant
    Filed: February 24, 2014
    Date of Patent: April 7, 2015
    Assignee: E-Chem Enterprise Corp.
    Inventors: Cheng-Ying Tsai, Cheng-Kai Liao, Su-Fei Hsu