Patents by Inventor Cheng-Ku Chiang

Cheng-Ku Chiang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7887996
    Abstract: Pattern transfer is achieved by forming a first patterned hard mask layer with a circuit pattern and a plurality of dummy patterns on a substrate, forming a second pattern mask layer on the substrate, exposing the circuit pattern of the first pattern mask layer, and removing a portion of the substrate exposed by the first patterned mask layer, so as to transfer the circuit pattern to the substrate.
    Type: Grant
    Filed: November 6, 2007
    Date of Patent: February 15, 2011
    Assignee: Nanya Technology Corp.
    Inventors: Hung-Jen Liu, Cheng-Ku Chiang
  • Publication number: 20080241734
    Abstract: Pattern transfer is achieved by forming a first patterned hard mask layer with a circuit pattern and a plurality of dummy patterns on a substrate, forming a second pattern mask layer on the substrate, exposing the circuit pattern of the first pattern mask layer, and removing a portion of the substrate exposed by the first patterned mask layer, so as to transfer the circuit pattern to the substrate.
    Type: Application
    Filed: November 6, 2007
    Publication date: October 2, 2008
    Inventors: Hung-Jen Liu, Cheng-Ku Chiang