Patents by Inventor Cheng-Kung Lu

Cheng-Kung Lu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7052810
    Abstract: A method of correcting optical proximity effect of contact holes. Corresponding relations between mask critical dimensions (mCDs) and photoresist critical dimensions (pCDs) for each pitch (d) are formed. Correction of each mCD for each combination of pCDs and pitches is determined based on the corresponding relations. The correction is used first to correct each contact hole of a processing mask pattern. The first corrected contact hole of the processing mask pattern is corrected again to a square having the same area as the first corrected contact hole and the same center as the uncorrected contact hole.
    Type: Grant
    Filed: June 18, 2004
    Date of Patent: May 30, 2006
    Assignee: Nanya Technology Corporation
    Inventors: Tsan Lu, Wen-Bin Wu, Yung-Long Hung, Cheng-Kung Lu
  • Publication number: 20050003284
    Abstract: A method of correcting optical proximity effect of contact holes. Corresponding relations between mask critical dimensions (mCDs) and photoresist critical dimensions (pCDs) for each pitch (d) are formed. Correction of each mCD for each combination of pCDs and pitches is determined based on the corresponding relations. The correction is used first to correct each contact hole of a processing mask pattern. The first corrected contact hole of the processing mask pattern is corrected again to a square having the same area as the first corrected contact hole and the same center as the uncorrected contact hole.
    Type: Application
    Filed: June 18, 2004
    Publication date: January 6, 2005
    Applicant: NANYA TECHNOLOGY CORPORATION
    Inventors: Tsan Lu, Wen-Bin Wu, Yung-Long Hung, Cheng-Kung Lu