Patents by Inventor Cheng-Kweng Chen

Cheng-Kweng Chen has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for removing polymer as etching residue
    Patent number: 7199059
    Abstract: A method for removing polymer as an etching residue is described. A substrate with polymer as an etching residue thereon is provided, and a hydrogen-containing plasma is used to treat the substrate. A wet clean step is then performed to remove the polymer from the substrate. The treatment using hydrogen-containing plasma can change the chemical property of the polymer, so that the polymer can be removed more easily in the subsequent wet clean step.
    Type: Grant
    Filed: October 26, 2004
    Date of Patent: April 3, 2007
    Assignee: United Microelectronics Corp.
    Inventors: Yi-Fang Cheng, Shan-Jen Yu, Cheng-Kweng Chen, Yu-Ming Huang
  • METHOD FOR REMOVING POLYMER AS ETCHING RESIDUE
    Publication number: 20060089003
    Abstract: A method for removing polymer as an etching residue is described. A substrate with polymer as an etching residue thereon is provided, and a hydrogen-containing plasma is used to treat the substrate. A wet clean step is then performed to remove the polymer from the substrate. The treatment using hydrogen-containing plasma can change the chemical property of the polymer, so that the polymer can be removed more easily in the subsequent wet clean step.
    Type: Application
    Filed: October 26, 2004
    Publication date: April 27, 2006
    Inventors: Yi-Fang Cheng, Shan-Jen Yu, Cheng-Kweng Chen, Yu-Ming Huang