Patents by Inventor Cheng-Lun Liu

Cheng-Lun Liu has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6835897
    Abstract: A warpage preventing substrate is provided. A plurality of first and second conductive traces are respectively formed on a first surface and a second surface of a core layer of the substrate, each conductive trace having a terminal, and a plurality of first and second non-functional traces are respectively formed on the first and second surfaces of the core layer at area free of the conductive traces. The first non-functional traces are arranged in different density from the second non-functional traces in a manner that, stress generated from the first conductive traces and first non-functional traces counteracts stress generated from the second conductive traces and second non-functional traces, to thereby prevent warpage of the substrate and maintain flatness of the substrate.
    Type: Grant
    Filed: December 4, 2002
    Date of Patent: December 28, 2004
    Assignee: Siliconware Precision Industries Co., Ltd.
    Inventors: Chin-Huang Chang, Chin-Tien Chiu, Cheng-Lun Liu
  • Publication number: 20040065473
    Abstract: A warpage preventing substrate is provided. A plurality of first and second conductive traces are respectively formed on a first surface and a second surface of a core layer of the substrate, each conductive trace having a terminal, and a plurality of first and second non-functional traces are respectively formed on the first and second surfaces of the core layer at area free of the conductive traces. The first non-functional traces are arranged in different density from the second non-functional traces in a manner that, stress generated from the first conductive traces and first non-functional traces counteracts stress generated from the second conductive traces and second non-functional traces, to thereby prevent warpage of the substrate and maintain flatness of the substrate.
    Type: Application
    Filed: December 4, 2002
    Publication date: April 8, 2004
    Applicant: Siliconware Precision Industries, Ltd., Taiwan
    Inventors: Chin-Huang Chang, Chin-Tien Chiu, Cheng-Lun Liu