Patents by Inventor Cheng-Lung Tsai

Cheng-Lung Tsai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12311878
    Abstract: A method of unlocking a vehicle door, including generating a dynamic password based on dynamic information by a vehicle chip, then generating a reference key based on the dynamic password, and storing the reference key in a storage medium; updating the dynamic password stored in a server, and according to the request of the mobile device, providing the dynamic password to the mobile device through the server, and the mobile device generating a mobile key according to the dynamic password. Finally, the reference key and the mobile key are compared, and if the dynamic passwords corresponding to the reference key and the mobile key are the same, the vehicle door corresponding to the vehicle chip is unlocked by the vehicle chip.
    Type: Grant
    Filed: August 22, 2023
    Date of Patent: May 27, 2025
    Assignee: AMBIT MICROSYSTEMS (SHANGHAI) LTD.
    Inventor: Cheng-Lung Tsai
  • Publication number: 20240166164
    Abstract: The disclosure provides a method of unlocking a vehicle door, including generating a dynamic password based on dynamic information by a vehicle chip, then generating a reference key based on the dynamic password, and storing the reference key in a storage medium; updating the dynamic password stored in a server, and according to the request of the mobile device, providing the dynamic password to the mobile device through the server, and the mobile device generating a mobile key according to the dynamic password. Finally, the reference key and the mobile key are compared, and if the dynamic passwords corresponding to the reference key and the mobile key are the same, the vehicle door corresponding to the vehicle chip is unlocked by the vehicle chip.
    Type: Application
    Filed: August 22, 2023
    Publication date: May 23, 2024
    Inventor: CHENG-LUNG TSAI
  • Patent number: 9692532
    Abstract: A method of antenna deployment determination in a wireless communication device is disclosed. The method includes transceiving a radio signal via the a first antenna port of the wireless communication device, obtaining a first strength result corresponding to the radio signal transmitted or received via the first antenna port, and determining a connecting status of the first antenna port according to the first strength result.
    Type: Grant
    Filed: November 2, 2012
    Date of Patent: June 27, 2017
    Assignee: MEDIATEK INC.
    Inventors: Yu-Ju Lee, Cheng-Lung Tsai, Hao-Sheng Hsu, Hui-Kuang Tseng
  • Publication number: 20150358906
    Abstract: An electronic device and an associated method are provided. The electronic device includes a wireless circuit and a controller. The wireless circuit is arranged to provide a soft access point. The controller is arranged to detect whether there is at least one client trying to connect to the soft access point when the electronic device operates in a sleep mode; and allow the electronic device to enter a working mode from the sleep mode when detecting that there is at least one client trying to connect to the soft access point.
    Type: Application
    Filed: May 26, 2015
    Publication date: December 10, 2015
    Inventors: Kuo-Pin Chiou, Cheng-Lung Tsai
  • Patent number: 9189588
    Abstract: Methods and systems for design of integrated circuits including performing OPC are discussed. In one embodiment, design data having a geometric feature is provided. A base feature is formed from the geometric feature, which has a substantially linear edge. A pseudo dissection point is determined on the base feature. Add or trim a polygon from the base feature to form a modified feature. An OPC process is performed on the modified feature to generate an output design. The output design is used to fabricate a semiconductor device on a semiconductor substrate.
    Type: Grant
    Filed: December 10, 2013
    Date of Patent: November 17, 2015
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Wen-Li Cheng, Ming-Hui Chih, Yu-Po Tang, Chia-Ping Chiang, Cheng-Lung Tsai, Sheng-Wen Lin, Kuei-Liang Lu, Wen-Chun Huang, Ru-Gun Liu
  • Publication number: 20150161321
    Abstract: Methods and systems for design of integrated circuits including performing OPC are discussed. In one embodiment, design data having a geometric feature is provided. A base feature is formed from the geometric feature, which has a substantially linear edge. A pseudo dissection point is determined on the base feature. Add or trim a polygon from the base feature to form a modified feature. An OPC process is performed on the modified feature to generate an output design. The output design is used to fabricate a semiconductor device on a semiconductor substrate.
    Type: Application
    Filed: December 10, 2013
    Publication date: June 11, 2015
    Inventors: Wen-Li Cheng, Ming-Hui Chih, Yu-Po Tang, Chia-Ping Chiang, Cheng-Lung Tsai, Sheng-Wen Lin, Kuei-Liang Lu, Wen-Chun Huang, Ru-Gun Liu
  • Patent number: 8751976
    Abstract: The present disclosure provides one embodiment of an integrated circuit (IC) method. The method includes building a pattern bank including a pattern having an area of interest. The method further includes recognizing that the pattern of the pattern bank corresponds to a pattern of an IC design layout. The method further includes identifying an area of interest of the pattern of the IC design layout that corresponds to the area of interest of the pattern of the pattern bank. The method further includes performing pattern recognition dissection on the area of interest of the pattern of the IC design layout to dissect the area of interest of the pattern of the IC design layout into a plurality of segments. The method further includes after performing pattern recognition dissection, producing a modified IC design layout.
    Type: Grant
    Filed: June 27, 2012
    Date of Patent: June 10, 2014
    Inventors: Cheng-Lung Tsai, Jui-Hsuan Feng, Sheng-Wen Lin, Wen-Li Cheng, Wen-Chun Huang, Ru-Gun Liu
  • Patent number: 8745554
    Abstract: The present disclosure provides an integrated circuit design method in many different embodiments. An exemplary IC design method comprises providing an IC design layout of a circuit in a first technology node; migrating the IC design layout of the circuit to a second technology node; applying an electrical patterning (ePatterning) modification to the migrated IC design layout according to an electrical parameter of the circuit; and thereafter fabricating a mask according to the migrated IC design layout of the circuit in the second technology node.
    Type: Grant
    Filed: December 28, 2009
    Date of Patent: June 3, 2014
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Ying-Chou Cheng, Tsong-Hua Ou, Josh J. H. Feng, Cheng-Lung Tsai, Ru-Gun Liu, Wen-Chun Huang
  • Patent number: 8739080
    Abstract: The present disclosure describes methods of forming a mask. In an example, the method includes receiving an integrated circuit (IC) design layout, modifying the IC design layout data using an optical proximity correction (OPC) process, thereby providing an OPCed IC design layout, and modifying the OPCed IC design layout data using a mask rule check (MRC) process, wherein the MRC process corrects rule violations of the OPCed IC design layout data using a mask error enhancement factor (MEEF) index, thereby providing a MRC/OPCed IC design layout.
    Type: Grant
    Filed: October 4, 2012
    Date of Patent: May 27, 2014
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Cheng-Lung Tsai, Jui-Hsuan Feng, Sheng-Wen Lin, Wen-Chun Huang, Ru-Gun Liu
  • Publication number: 20140007024
    Abstract: The present disclosure provides one embodiment of an integrated circuit (IC) method. The method includes building a pattern bank including a pattern having an area of interest. The method further includes recognizing that the pattern of the pattern bank corresponds to a pattern of an IC design layout. The method further includes identifying an area of interest of the pattern of the IC design layout that corresponds to the area of interest of the pattern of the pattern bank. The method further includes performing pattern recognition dissection on the area of interest of the pattern of the IC design layout to dissect the area of interest of the pattern of the IC design layout into a plurality of segments. The method further includes after performing pattern recognition dissection, producing a modified IC design layout.
    Type: Application
    Filed: June 27, 2012
    Publication date: January 2, 2014
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Cheng-Lung Tsai, Jui-Hsuan Feng, Sheng-Wen Lin, Wen-Li Cheng, Wen-Chun Huang, Ru-Gun Liu
  • Publication number: 20130181191
    Abstract: An electronic device including a bio-polymer material and a method for manufacturing the same are disclosed. The electronic device of the present invention comprises: a substrate; a first electrode disposed on the substrate; a bio-polymer layer disposed on the first electrode, wherein the bio-polymeric material is selected from a group consisting of wool keratin, collagen hydrolysate, gelatin, whey protein and hydroxypropyl methylcellulose; and a second electrode disposed on the biopolymer material layer. The present invention is suitable for various electronic devices such as an organic thin film transistor, an organic floating gate memory, or a metal-insulator-metal capacitor.
    Type: Application
    Filed: June 1, 2012
    Publication date: July 18, 2013
    Inventors: Jenn-Chang Hwang, Chao-Ying Hsieh, Lung-Kai Mao, Chun-Yi Lee, Li-Shiuan Tsai, Cheng-Lung Tsai, Wei-Cheng Chung, Ping-Chiang Lyu
  • Publication number: 20130126465
    Abstract: A method of manufacturing plastic metallized 3D circuit includes the steps of providing a 3D plastic main body; performing a surface pretreatment on the plastic main body; performing a metallization process on the plastic main body to deposit a thin metal film thereon; performing a photoresist coating process to form a photoresist protective layer on the thin metal film; performing an exposure and development process on the photoresist protective layer to form a patterned photoresist protective layer; performing an etching process on the exposed thin metal film to form a patterned metal circuit layer; stripping the patterned photoresist protective layer; and performing a surface treatment on the patterned metal circuit layer to form a metal protective layer. With the method, a 3D circuit pattern can be directly formed on a 3D plastic main body without providing additional circuit carrier to thereby meet the requirement for miniaturized and compact electronic devices.
    Type: Application
    Filed: December 30, 2011
    Publication date: May 23, 2013
    Applicants: ICT-LANTO LIMITED
    Inventors: Chuan Ling HU, Cheng Lung TSAI, Yu Wei CHEN, Chen Hao CHANG
  • Patent number: 8381153
    Abstract: The present disclosure provides one embodiment of an integrated circuit (IC) design method. The method includes receiving an IC design layout having a plurality of main features; applying a main feature dissection to the main features of the IC design layout and generating sub-portions of the main features; performing an optical proximity correction (OPC) to the main features; performing a mask rule check (MRC) to a main feature of the IC design layout; and modifying one of the sub-portions of the main feature if the main feature fails the MRC.
    Type: Grant
    Filed: September 17, 2010
    Date of Patent: February 19, 2013
    Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
    Inventors: Chia-Ping Chiang, Yu-Po Tang, Ming-Hui Chih, Cheng-Kun Tsai, Wei-Long Wang, Wen-Chun Huang, Ru-Gun Liu, Tsai-Sheng Gau, Cheng-Lung Tsai, Josh J. H. Feng, Bing-Syun Yeh, Jeng-Shiun Ho, Cheng-Cheng Kuo
  • Patent number: 8228807
    Abstract: Instead of scanning all the channels at once, the present method separates a channel scanning procedure into multiple channel scanning operations. The method reduces a data loss rate during the operation by returning to the operating channel an associated access point operates on in accordance with a return period for transceiving blocked packets.
    Type: Grant
    Filed: July 23, 2009
    Date of Patent: July 24, 2012
    Assignee: Ralink Technology Corporation
    Inventors: Cheng Lung Tsai, Sung Chien Tang
  • Patent number: 8219951
    Abstract: The present disclosure provides an integrated circuit method. The method includes providing an integrated circuit (IC) design layout; simulating thermal effect to the IC design layout; simulating electrical performance to the IC design layout based on the simulating thermal effect; and performing thermal dummy insertion to the IC design layout based on the simulating electrical performance.
    Type: Grant
    Filed: February 26, 2010
    Date of Patent: July 10, 2012
    Assignee: Taiwan Semiconductor Manufactuing Company, Ltd.
    Inventors: Ying-Chou Cheng, Tsong-Hua Ou, Chih-Wei Hsu, Cheng-Lung Tsai, Ru-Gun Liu, Wen-Chun Huang, Boren Luo
  • Publication number: 20120072874
    Abstract: The present disclosure provides one embodiment of an integrated circuit (IC) design method. The method includes receiving an IC design layout having a plurality of main features; applying a main feature dissection to the main features of the IC design layout and generating sub-portions of the main features; performing an optical proximity correction (OPC) to the main features; performing a mask rule check (MRC) to a main feature of the IC design layout; and modifying one of the sub-portions of the main feature if the main feature fails the MRC.
    Type: Application
    Filed: September 17, 2010
    Publication date: March 22, 2012
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Chia-Ping Chiang, Yu-Po Tang, Ming-Hui Chih, Cheng-Kun Tsai, Wei-Long Wang, Wen-Chun Huang, Ru-Gun Liu, Tsai-Sheng Gau, Cheng-Lung Tsai, Josh J.H. Feng, Bing-Syun Yeh, Jeng-Shiun Ho, Cheng-Cheng Kuo
  • Publication number: 20110214101
    Abstract: The present disclosure provides an integrated circuit method. The method includes providing an integrated circuit (IC) design layout; simulating thermal effect to the IC design layout; simulating electrical performance to the IC design layout based on the simulating thermal effect; and performing thermal dummy insertion to the IC design layout based on the simulating electrical performance.
    Type: Application
    Filed: February 26, 2010
    Publication date: September 1, 2011
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Ying-Chou Cheng, Tsong-Hua Ou, Chih-Wei Hsu, Cheng-Lung Tsai, Ru-Gun Liu, Wen-Chun Huang, Boren Luo
  • Publication number: 20110204470
    Abstract: An integrated circuit (IC) design method providing a circuit design layout having a plurality of functional blocks disposed a distance away from each other; identifying a local pattern density to an approximate dummy region, on the circuit design layout, within a predefined distance to one of the functional blocks; performing a local dummy insertion to the approximate dummy region according to the local pattern density; repeating the identifying and performing to at least some other of the functional blocks; and implementing a global dummy insertion to a non-local dummy region according to a global pattern density.
    Type: Application
    Filed: February 25, 2010
    Publication date: August 25, 2011
    Applicant: TAIWAN SEMICONDOCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Ying-Chou Cheng, Cheng-Lung Tsai, Tsong-Hua Ou, Cheng Kun Tsai, Ru-Gun Liu, Wen-Chun Huang
  • Publication number: 20110161907
    Abstract: The present disclosure provides an integrated circuit design method in many different embodiments. An exemplary IC design method comprises providing an IC design layout of a circuit in a first technology node; migrating the IC design layout of the circuit to a second technology node; applying an electrical patterning (ePatterning) modification to the migrated IC design layout according to an electrical parameter of the circuit; and thereafter fabricating a mask according to the migrated IC design layout of the circuit in the second technology node.
    Type: Application
    Filed: December 28, 2009
    Publication date: June 30, 2011
    Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD.
    Inventors: Ying-Chou Cheng, Tsong-Hua Ou, Josh J.H. Feng, Cheng-Lung Tsai, Ru-Gun Liu, Wen-Chun Huang
  • Publication number: 20100302981
    Abstract: An apparatus for roaming in a wireless network updates received signal strength indication (RSSI) values in accordance with all types of frames forwarded from the access point with which the apparatus associates. In addition, the apparatus actively forwards null frames to the access point with which the apparatus associates and updates RSSI values in accordance with acknowledgement frames forwarded from the access point.
    Type: Application
    Filed: December 21, 2009
    Publication date: December 2, 2010
    Applicant: RALINK TECHNOLOGY CORPORATION
    Inventors: Cheng Lung Tsai, Chia Hsiang Hsu