Patents by Inventor Cheng-Sheng Tsung

Cheng-Sheng Tsung has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11983848
    Abstract: Aspects of the disclosure provide a frame processor for processing frames with aliasing artifacts. For example, the frame processor can include a super-resolution (SR) and anti-aliasing (AA) engine and an attention reference frame generator coupled to the SR and AA engine. The SR and AA engine can be configured to enhance resolution and remove aliasing artifacts of a frame to generate a first high-resolution frame with aliasing artifacts and a second high-resolution frame with aliasing artifacts removed. The attention reference frame generator can be configured to generate an attention reference frame based on the first high-resolution frame and the second high-resolution frame.
    Type: Grant
    Filed: January 6, 2023
    Date of Patent: May 14, 2024
    Assignee: MEDIATEK INC.
    Inventors: Cheng-Lung Jen, Pei-Kuei Tsung, Chih-Wei Chen, Yao-Sheng Wang, Shih-Che Chen, Yu-Sheng Lin, Chih-Wen Goo, Shih-Chin Lin, Tsung-Shian Huang, Ying-Chieh Chen
  • Publication number: 20220152252
    Abstract: The invention provides a method for removing haze and inhibiting bacteria. First preparing a dehaze and bacteriostatic film comprising a substrate material layer and a composite surface plasmon layer. The composite surface plasmon layer includes a particle stacked film layer and a particle suspension layer which jointly generate a composite surface plasmon wave. Then, exciting the composite surface plasmon wave by visible light to resonate different types of surface plasmon waves generated by the composite surface plasmon wave, and adding up energy of the surface plasmon waves to ionize water and oxygen. Since energy of the generated electromagnetic field can ionize substances at a certain distance, such as dissociated water is rich in hydroxide ions that performs dehaze and bacteriostatic effect. The dehaze and bacteriostatic effect can be enhanced through increasing in thickness (number of layers) of the particle stacked film layer and the particle suspension layer.
    Type: Application
    Filed: February 7, 2022
    Publication date: May 19, 2022
    Inventor: Cheng-Sheng TSUNG
  • Publication number: 20210381971
    Abstract: A dehaze and bacteriostatic film includes a substrate material layer and a composite surface plasmon layer formed on the substrate material layer. The composite surface plasmon layer includes a particle stacked film layer and a particle suspension layer located on the substrate material layer, and the particle stacked film layer and the particle suspension layer jointly generate a composite surface plasmon wave. Accordingly, the composite surface plasmon wave is excited by visible light, so that different types of surface plasmon waves generated by the structures resonate and multiply with each other. The different surface plasmon waves add up to generate electromagnetic field intensity capable of dissociating spatial materials at a certain distance, such as water vapor to be partially ionized which is rich in hydroxide ions with effects of dehazing and inhibiting growth of bacteria.
    Type: Application
    Filed: June 5, 2020
    Publication date: December 9, 2021
    Inventor: Cheng-Sheng Tsung
  • Patent number: 9450154
    Abstract: A method for fabricating a microstructure to generate surface plasmon waves comprises steps of: preparing a substrate, and using a carrier material to carry a plurality of metallic nanoparticles and letting the metallic nanoparticles undertake self-assembly to form a microstructure on the substrate, wherein the metallic nanoparticles are separated from each other or partially agglomerated to allow the microstructure to be formed with a discontinuous surface. The present invention fabricates the microstructure having the discontinuous surface by a self-assembly method to generate the surface plasmon waves, thus exempts from using the expensive chemical vapor deposition (CVD) technology and is able to reduce the time and cost of fabrication. The present invention also breaks the structural limitation on generation of surface plasmon waves to enhance the effect of generating the surface plasmon waves.
    Type: Grant
    Filed: April 3, 2014
    Date of Patent: September 20, 2016
    Inventor: Cheng-Sheng Tsung
  • Patent number: 9293659
    Abstract: A method for fabricating a microstructure to generate surface plasmon waves comprises steps of: preparing a substrate, and using a carrier material to carry a plurality of metallic nanoparticles and letting the metallic nanoparticles undertake self-assembly to form a microstructure on the substrate, wherein the metallic nanoparticles are separated from each other or partially agglomerated to allow the microstructure to be formed with a discontinuous surface. The present invention fabricates the microstructure having the discontinuous surface by a self-assembly method to generate the surface plasmon waves, thus exempts from using the expensive chemical vapor deposition (CVD) technology and is able to reduce the time and cost of fabrication. The present invention also breaks the structural limitation on generation of surface plasmon waves to enhance the effect of generating the surface plasmon waves.
    Type: Grant
    Filed: April 23, 2015
    Date of Patent: March 22, 2016
    Assignee: CHENG-SHENG TSUNG
    Inventor: Cheng-Sheng Tsung
  • Publication number: 20150228863
    Abstract: A method for fabricating a microstructure to generate surface plasmon waves comprises steps of: preparing a substrate, and using a carrier material to carry a plurality of metallic nanoparticles and letting the metallic nanoparticles undertake self-assembly to form a microstructure on the substrate, wherein the metallic nanoparticles are separated from each other or partially agglomerated to allow the microstructure to be formed with a discontinuous surface. The present invention fabricates the microstructure having the discontinuous surface by a self-assembly method to generate the surface plasmon waves, thus exempts from using the expensive chemical vapor deposition (CVD) technology and is able to reduce the time and cost of fabrication. The present invention also breaks the structural limitation on generation of surface plasmon waves to enhance the effect of generating the surface plasmon waves.
    Type: Application
    Filed: April 23, 2015
    Publication date: August 13, 2015
    Inventor: Cheng-Sheng Tsung
  • Publication number: 20150099321
    Abstract: A method for fabricating a microstructure to generate surface plasmon waves comprises steps of: preparing a substrate, and using a carrier material to carry a plurality of metallic nanoparticles and letting the metallic nanoparticles undertake self-assembly to form a microstructure on the substrate, wherein the metallic nanoparticles are separated from each other or partially agglomerated to allow the microstructure to be formed with a discontinuous surface. The present invention fabricates the microstructure having the discontinuous surface by a self-assembly method to generate the surface plasmon waves, thus exempts from using the expensive chemical vapor deposition (CVD) technology and is able to reduce the time and cost of fabrication. The present invention also breaks the structural limitation on generation of surface plasmon waves to enhance the effect of generating the surface plasmon waves.
    Type: Application
    Filed: April 3, 2014
    Publication date: April 9, 2015
    Inventor: Cheng-Sheng Tsung