Patents by Inventor Cheng-Tang Pan

Cheng-Tang Pan has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20020110755
    Abstract: A process method of using excimer laser for forming micro spherical and non-spherical polymeric structure array includes a photomask which has a selected curved pattern formed thereon. The curved pattern has non-constant widths along a straight line direction. An excimer laser beam source is deployed to project through the photomask on a substrate coated with a polymeric material while the substrate is moving in a direction normal to the straight line direction for the polymeric material to receive laser beam projection with different time period. The polymeric material thus may be etched to different depth to form a three dimensional pattern desired. By projecting and etching the polymeric material two times at different directions or through different photomask patterns, a sphere like or non-sphere like surface of micro array structure may be obtained.
    Type: Application
    Filed: August 23, 2001
    Publication date: August 15, 2002
    Applicant: Industrial Technology Research Institute
    Inventors: Hung-Yin Tsai, Cheng-Tang Pan, Min-Chieh Chou, Shih-Chou Chen, Yuh-Sheng Lin
  • Publication number: 20020110766
    Abstract: A process method of using excimer laser for forming micro spherical and non-spherical polymeric structure array includes a photomask which has a selected curved pattern formed thereon. The curved pattern has non-constant widths along a straight line direction. An excimer laser beam source is deployed to project through the photomask on a substrate coated with a polymeric material while the substrate is moving in a direction normal to the straight line direction for the polymeric material to receive laser beam projection with different time period. The polymeric material thus may be etched to different depth to form a three dimensional pattern desired. By projecting and etching the polymeric material two times at different directions or through different photomask patterns, a sphere like or non-sphere like surface of micro array structure may be obtained.
    Type: Application
    Filed: February 9, 2001
    Publication date: August 15, 2002
    Applicant: Industrial Technology Research Institute
    Inventors: Hung-Yin Tsai, Cheng-Tang Pan, Min-Chieh Chou, Shih-Chou Chen
  • Publication number: 20020094419
    Abstract: A simple method for fabricating three-dimensional microlens in batch is disclosed. The method for fabricating three-dimensional microlens includes (A) providing a substrate; (B) coating a layer of first polymer or compositions comprising first polymer on said substrate; (C) coating a layer of second polymer or compositions comprising second polymer on said layer of first polymer; (D) forming patterns of said layer of second polymer or compositions comprising second polymer; (E) heating said substrate coated with said polymers to a temperature ranging from said glass transition temperature (Tg) of second polymer to said glass transition temperature (Tg) of first polymer; (F) maintaining said coated substrate at said temperature to form microlens; and (G) cooling said microlens.
    Type: Application
    Filed: January 12, 2001
    Publication date: July 18, 2002
    Inventors: Yuh-Sheng Lin, Kun-Lung Lin, Cheng-Tang Pan, Shih-Chou Chen, Jauh-Jung Yang
  • Patent number: 6414803
    Abstract: A method of making a micro magneto-controlled optical path-guiding platform comprises an optical path-guiding platform, couples of the optical routes, a micro magneto-flux prism located at the intersection of the optical route on the topside of the platform, and a magnetic field generator oppositely mounted under the location of the micro magneto-flux prism of the platform bottom side respectively. Therefore, the reflection ratio and refraction ratio to the incident optical signal traveling through this designed micro magneto-flux prism will be completely manipulated by adjusting the magnetic field intensity that is generated by the magnetic generator. Conclusively, this invention can be used to change the traveling orientation of the optical route or control the optical energy intensity as desired.
    Type: Grant
    Filed: July 31, 2001
    Date of Patent: July 2, 2002
    Assignee: Industrial Technology Research Institute
    Inventors: Cheng-Tang Pan, Min-Chieh Chou, Sheng-Chih Shen, Kun-Lung Lin, Yu-Hsi Chao
  • Patent number: 6251565
    Abstract: A method of making molds for use in manufacturing high precision and high density multiple-lead microstructures. If employs microphoto etching process used in semiconductor manufacturing process to project X-ray and ultraviolet light on a photoresist layer through a X-ray co-mask and a generally used mask to produce exposing process. Through etching and electroplating processes, a plurality of identical punch molds may be made. The punch molds are aligned stacked up one upon the other until a desired height is reached. The stacked up punch molds are electroplated to form a lead punch die for producing microparts desired.
    Type: Grant
    Filed: August 16, 1999
    Date of Patent: June 26, 2001
    Assignee: Industrial Technology Research Institute
    Inventors: Hsi-Harng Yang, Min-Chieh Chou, Cheng-Tang Pan, Chuan-Kang Mu