Abstract: Embodiments of the present invention are directed to improving the reclamation rate of the waste water of wet benches in semiconductor fabrication. In accordance with an aspect of the invention, a method for improvement of water reclamation rate comprises choosing a rinse recipe for a wet bench. The wet bench is activated, and waste water quality of waste water produced by the rinse recipe from the wet bench is detected to generate water quality data for a plurality of reclamation switch time levels. The waste water is directed to a water reclamation system during a reclamation time period after each of the plurality of reclamation switch time levels. The water quality data of the waste water is analyzed for the plurality of reclamation switch time levels. The method further comprises determining from analyzing the water quality data the best reclamation switch time for the chosen rinse recipe for the wet bench.

Abstract: According to the present invention, an apparatus for determining various processes of wafer fabrication suitable for a plurality of various processes of wafer fabrication, having: a plurality of wafer cassettes, each having a distinct transparency, used in the various processes of wafer fabrication; a sensor-set, used to detect the distinct transparency of each of the wafer cassettes, and output a signal corresponding to the distinct transparency; and an amplifier, connected to the sensor-set to receive the signal, thus reading the distinct transparency, so as to determine the type of the wafer cassettes. Furthermore, a method for determining various processes of wafer fabrication includes the steps of: providing a plurality of wafer cassettes, each having a distinct transparency, used in the various processes of wafer fabrication; reading the distinct transparency of each of the wafer cassettes; and determining the type of the wafer cassettes according to the distinct transparency.

Abstract: Embodiment of the present invention are directed to improving the reclamation rate of the waste water of wet benches in semiconductor fabrication. The invention does so by ascertaining the best reclamation switch time before a given rinse recipe runs. In accordance with an aspect of the invention, a method for improvement of water reclamation rate comprises choosing a rinse recipe for a wet bench. The wet bench is activated, and waste water quality of waste water produced for the rinse recipe from the wet bench is detected to generate water quality data for a plurality of reclamation switch time levels. The waste water is directed to a water reclamation system during a reclamation time period after each of the plurality of reclamation switch time levels. The water quality data of the waste water is analyzed for the plurality of reclamation switch time levels.

Abstract: According to the present invention, an apparatus for determining various processes of wafer fabrication suitable for a plurality of various processes of wafer fabrication, comprising: a plurality of wafer cassettes, each having a distinct transparency, used in the various processes of wafer fabrication; a sensor-set, used to detect the distinct transparency of each of the wafer cassettes, and output a reflection intensity corresponding to the distinct transparency; and an amplifier, connected to the sensor-set to receive the reflection intensity, thus reading the distinct transparency, so as to determine the type of one of the wafer cassettes.