Patents by Inventor Cheng-Yuan Yao

Cheng-Yuan Yao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of cleaning a chamber of a CVD machine and elements within
    Patent number: 6569253
    Abstract: The present invention provides a method of cleaning a chamber of a CVD machine and elements within. A gas mixture of carbon tetrafluoride (CF4) and perfluoro ethane (C2F6) is first injected into the chamber. After performing a surface treatment, comprising a sandblasting step or a polishing step, on the surfaces of the elements, the elements are then immersed in a cleaning solution, comprising at least ammonia water (NH4OH) and hydrogen peroxide (H2O2) at a temperature maintained between 40° C. to 70° C. Finally, the temperature of the cleaning solution is raised so that the residual layer on the surface of the elements can drop from the surfaces of the heater and the process kits or dissolve into the cleaning solution.
    Type: Grant
    Filed: April 25, 2001
    Date of Patent: May 27, 2003
    Assignee: United Microelectronics Corp.
    Inventors: Wei-Hsu Wang, Tsan-Chi Chu, Cheng-Yuan Yao, Wei-Hao Lee, Ping-Chung Chung
  • Method of cleaning a chamber of a CVD machine and elements within
    Publication number: 20020157687
    Abstract: The present invention provides a method of cleaning a chamber of a CVD machine and elements within. A gas mixture of carbon tetrafluoride (CF4) and perfluoro ethane (C2F6) is first injected into the chamber. After performing a surface treatment, comprising a sandblasting step or a polishing step, on the surfaces of the elements, the elements are then immersed in a cleaning solution, comprising at least ammonia water (NH4OH) and hydrogen peroxide (H2O2) at a temperature maintained between 40° C. to 70° C. Finally, the temperature of the cleaning solution is raised so that the residual layer on the surface of the elements can drop from the surfaces of the heater and the process kits or dissolve into the cleaning solution.
    Type: Application
    Filed: April 25, 2001
    Publication date: October 31, 2002
    Inventors: Wei-Hsu Wang, Tsan-Chi Chu, Cheng-Yuan Yao, Wei-Hao Lee, Ping-Chung Chung