Patents by Inventor Chengjun QI

Chengjun QI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11675237
    Abstract: An array substrate includes a base substrate, a light-shielding pattern, a buffer pattern, an active layer, a gate insulating layer and a first passivation layer provided with a first via, a second via and a third via, and a source and a drain. An entire orthographic projection of the active layer on the base substrate coincides with an orthographic projection of at least part of the buffer pattern on the base substrate. The orthographic projection of the buffer pattern on the base substrate is within a border of an orthographic projection of the light-shielding pattern on the base substrate, and its area is less than an area of the orthographic projection of the light-shielding pattern on the base substrate. One of the source and the drain is coupled to the active layer through the first via, and another one is coupled to the active layer through the second via and the light-shielding pattern through the third via.
    Type: Grant
    Filed: April 27, 2021
    Date of Patent: June 13, 2023
    Assignees: CHONGQING BOE OPTOELECTRONICS TECHNOLOGY CO., LTD., BOE TECHNOLOGY GROUP CO., LTD.
    Inventors: Maokun Tian, Zhonghao Huang, Xu Wu, Chengjun Qi, Jun Wang, Dan Liu
  • Publication number: 20220057679
    Abstract: An array substrate includes a base substrate, a light-shielding pattern, a buffer pattern, an active layer, a gate insulating layer and a first passivation layer provided with a first via, a second via and a third via, and a source and a drain. An entire orthographic projection of the active layer on the base substrate coincides with an orthographic projection of at least part of the buffer pattern on the base substrate. The orthographic projection of the buffer pattern on the base substrate is within a border of an orthographic projection of the light-shielding pattern on the base substrate, and its area is less than an area of the orthographic projection of the light-shielding pattern on the base substrate. One of the source and the drain is coupled to the active layer through the first via, and another one is coupled to the active layer through the second via and the light-shielding pattern through the third via.
    Type: Application
    Filed: April 27, 2021
    Publication date: February 24, 2022
    Inventors: Maokun TIAN, Zhonghao HUANG, Xu WU, Chengjun QI, Jun WANG, Dan LIU