Abstract: A monitoring system detects and measures a quantity of radical particles within a gas. A test chamber is coupled to a flow channel that transmits a gas. The test chamber defines an aperture connecting the test chamber and the flow channel, and the aperture permits a subset of the gas to enter the test chamber from the flow channel. An ionizer is positioned within the test chamber and generates radical ions from radical particles of the subset of the gas. A mass spectrometer measures a quantity of the radical ions, thereby providing a measurement of the radical particles in the gas.

Abstract: Provided are a display panel, a detection device therefor, and a display device. In an embodiment, the display panel includes an array layer, along a thickness direction of the display panel, the array layer including first and second conductive layers, and at least an insulating layer being located between the first and second conductive layers; a light-emitting element located at a side of the array layer facing a light-exiting surface of the display panel; and a first through-hole. In an embodiment, the first and second conductive layers are connected to each other through the first through-hole, and at least one first through-hole is reused as an alignment connection hole; and/or, along the thickness direction of the display panel, orthographic projections of at least two first through-holes onto a plane of the light-exiting surface of the display panel have different shapes.

Abstract: An apparatus for feedback control in plasma processing systems using radical sensing, and a method for feedback control in plasma processing systems using radical sensing, the apparatus comprising at least one process gas supply system configured to output at least one process gas, at least one plasma source configured to receive the at least one process gas and generate at least one radical flow, at least one process chamber in communication with the at least one plasma source, wherein the process chamber receives the at least one radical flow and directs at least a portion of the at least one radical flow to one or more devices, the process chamber configured to output at least one process chamber output, at least one gas analyzer in communication with and configured to sample at least one of the at least one process gas, at least one radical flow, at least one radical flow within the at least one process chamber, and the at least one process chamber output, and at least one controller in communication with

Abstract: The gravity compressed air energy storage system includes: a shaft, into which a pressure-bearing cylinder is movably inserted; a locking component arranged at a top of the pressure-bearing cylinder to support the pressure-bearing cylinder on a ground at a top of the shaft through the locking component in case that the pressure-bearing cylinder is at a lowest limit position; a primary gravity block arranged above the locking component; a spherical connection component arranged and spherically connected between the primary gravity block and the locking component; in which a plurality of guide components are arranged around the primary gravity block; and a plurality of guide rails arranged on the ground and at a peripheral side of the primary gravity block; in which the plurality of guide rails cooperate with the plurality of guide components.

Abstract: The present application provides a separator, a secondary battery, a battery module, a battery pack and an electrical apparatus. The separator may sequentially include a first region, a main region and a second region in a first direction. At least one surface of the first region and/or at least one surface of the second region may be provided with a fluorescent coating. The fluorescent coating may be used to identify whether the separator is folded or not.

Abstract: A monitoring system detects and measures a quantity of radical particles within a gas. A test chamber is coupled to a flow channel that transmits a gas. The test chamber defines an aperture connecting the test chamber and the flow channel, and the aperture permits a subset of the gas to enter the test chamber from the flow channel. An ionizer is positioned within the test chamber and generates radical ions from radical particles of the subset of the gas. A mass spectrometer measures a quantity of the radical ions, thereby providing a measurement of the radical particles in the gas.

Abstract: Systems and methods for in-situ leak detection and endpoint detection of wafer dry etch or chamber clean in chambers, e.g., vacuum chambers used in semiconductor processing. A mini environment is created and a sensor, such as an SPOES sensor, can be used in the mini-environment to perform leak detection.

Abstract: A method of measuring an atmosphere in a guest vacuum chamber of a vacuum tool includes measuring a first composition of the atmosphere in the host vacuum chamber using a residual gas analyzer (RGA). The host and guest vacuum chambers are not coupled during the measuring of the first composition. The host vacuum chamber is coupled to the guest vacuum chamber, so the atmospheres in each can mix in the host vacuum chamber. A second composition of the atmosphere in the host vacuum chamber is measured using the RGA after the chambers are coupled. Using a processor, a composition of the guest atmosphere is automatically determined using the measured first and second compositions. A vacuum tool can include the host and guest chambers, the valve, the RGA, and a processor configured to control the valve to carry out this or other methods.

Abstract: Systems and methods for in-situ leak detection and endpoint detection of wafer dry etch or chamber clean in chambers, e.g., vacuum chambers used in semiconductor processing. A mini environment is created and a sensor, such as an SPOES sensor, can be used in the mini-environment to perform leak detection.

Abstract: A method of measuring an atmosphere in a guest vacuum chamber of a vacuum tool includes measuring a first composition of the atmosphere in the host vacuum chamber using a residual gas analyzer (RGA). The host and guest vacuum chambers are not coupled during the measuring of the first composition. The host vacuum chamber is coupled to the guest vacuum chamber, so the atmospheres in each can mix in the host vacuum chamber. A second composition of the atmosphere in the host vacuum chamber is measured using the RGA after the chambers are coupled. Using a processor, a composition of the guest atmosphere is automatically determined using the measured first and second compositions. A vacuum tool can include the host and guest chambers, the valve, the RGA, and a processor configured to control the valve to carry out this or other methods.

Abstract: An ion source apparatus for partial pressure analyzers and in-situ cleaning method thereof based on inducing a hollow cathode discharge (HCD) inside the ion source. The HCD is formed by applying a high negative voltage to one or more parts of the ion source, including the anode electrode, the lens focus plate and at least one other lens or other form of plate, such as a total pressure collector plate.

Abstract: A method of monitoring a microelectronic manufacturing process includes the implementation of a monitoring sensor that is configured to operate in an inter-process mode. During an inter-process mode, a first valve is opened in order to initiate transfer of a processing substrate between at least one processing chamber and a transfer chamber. The monitoring sensor is programmed to monitor the interior of the at least one processing chamber only after the first valve is opened.

Abstract: A method of monitoring a microelectronic manufacturing process includes the implementation of a process monitor that is configured to operate in an inter-process mode.