Patents by Inventor Chenglong Yang

Chenglong Yang has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240347693
    Abstract: A negative electrode plate includes a negative electrode current collector and a negative electrode film layer on at least one surface of the negative electrode current collector. The negative electrode film layer includes a negative electrode active material, a metal hydride, a conductive agent and a binder. The negative electrode active material includes a silicon-based negative electrode active material.
    Type: Application
    Filed: April 4, 2024
    Publication date: October 17, 2024
    Inventors: Jingyu GAO, Haiming ZHANG, Chenglong YANG, Xingxing LIU
  • Publication number: 20240264116
    Abstract: A monitoring system detects and measures a quantity of radical particles within a gas. A test chamber is coupled to a flow channel that transmits a gas. The test chamber defines an aperture connecting the test chamber and the flow channel, and the aperture permits a subset of the gas to enter the test chamber from the flow channel. An ionizer is positioned within the test chamber and generates radical ions from radical particles of the subset of the gas. A mass spectrometer measures a quantity of the radical ions, thereby providing a measurement of the radical particles in the gas.
    Type: Application
    Filed: March 29, 2024
    Publication date: August 8, 2024
    Applicant: MKS Instruments, Inc.
    Inventors: Chenglong Yang, Jimmy Liu, James Edward Blessing
  • Publication number: 20240240089
    Abstract: Provided are a standing coke-making furnace, a coke-making system and a method thereof.
    Type: Application
    Filed: June 20, 2023
    Publication date: July 18, 2024
    Inventors: Chenglong Yang, Yang Li, Hanchen Zhao, Ming Cai, Chenguang Jia, Mingyu Yao, Jun Zhang, Liang Chu, Yi Cui, Hongqing Zhang, Jie Guo, Zaisong Yu, Faguang Liang
  • Publication number: 20240217793
    Abstract: The present disclosure provides a carrying robot which includes a movement chassis, a shelving unit, and a carrying apparatus. The shelving unit is disposed on the movement chassis. The carrying apparatus includes a connecting base and a first goods fork assembly. A first end of the connecting base is connected to a side of the shelving unit. A second end of the connecting base extends in a horizontal direction away from the shelving unit. The connecting base moves vertically relative to the shelving unit. The first goods fork assembly includes a first mounting plate which is connected to a side of the second end of the connecting base facing the movement chassis and two first side plates which are disposed opposite on two sides of the first mounting plate in a width direction of the first goods fork assembly.
    Type: Application
    Filed: March 15, 2024
    Publication date: July 4, 2024
    Applicant: HAI ROBOTICS CO., LTD.
    Inventors: Chenglong YANG, Qingxin ZHAN
  • Patent number: 11971386
    Abstract: A monitoring system detects and measures a quantity of radical particles within a gas. A test chamber is coupled to a flow channel that transmits a gas. The test chamber defines an aperture connecting the test chamber and the flow channel, and the aperture permits a subset of the gas to enter the test chamber from the flow channel. An ionizer is positioned within the test chamber and generates radical ions from radical particles of the subset of the gas. A mass spectrometer measures a quantity of the radical ions, thereby providing a measurement of the radical particles in the gas.
    Type: Grant
    Filed: December 16, 2021
    Date of Patent: April 30, 2024
    Assignee: MKS Instruments, Inc.
    Inventors: Chenglong Yang, Jimmy Liu, James Edward Blessing
  • Publication number: 20240072071
    Abstract: Provided are a display panel, a detection device therefor, and a display device. In an embodiment, the display panel includes an array layer, along a thickness direction of the display panel, the array layer including first and second conductive layers, and at least an insulating layer being located between the first and second conductive layers; a light-emitting element located at a side of the array layer facing a light-exiting surface of the display panel; and a first through-hole. In an embodiment, the first and second conductive layers are connected to each other through the first through-hole, and at least one first through-hole is reused as an alignment connection hole; and/or, along the thickness direction of the display panel, orthographic projections of at least two first through-holes onto a plane of the light-exiting surface of the display panel have different shapes.
    Type: Application
    Filed: November 3, 2023
    Publication date: February 29, 2024
    Applicant: Tianma Advanced Display Technology Institute (Xiamen) Co.,Ltd.
    Inventors: Zhenyu JIA, Chenglong YANG, Kerui XI, Tianyi WU, Xiaoxiang HE, Ping AN, Yingteng ZHAI, Liwei ZHANG, Yukun HUANG, Aowen LI
  • Publication number: 20230369033
    Abstract: An apparatus for feedback control in plasma processing systems using radical sensing, and a method for feedback control in plasma processing systems using radical sensing, the apparatus comprising at least one process gas supply system configured to output at least one process gas, at least one plasma source configured to receive the at least one process gas and generate at least one radical flow, at least one process chamber in communication with the at least one plasma source, wherein the process chamber receives the at least one radical flow and directs at least a portion of the at least one radical flow to one or more devices, the process chamber configured to output at least one process chamber output, at least one gas analyzer in communication with and configured to sample at least one of the at least one process gas, at least one radical flow, at least one radical flow within the at least one process chamber, and the at least one process chamber output, and at least one controller in communication with
    Type: Application
    Filed: November 9, 2022
    Publication date: November 16, 2023
    Inventors: Keith K. Koai, Chenglong Yang, Guy Rosenzweig, Jimmy Liu, Michael Harris, James Blessing
  • Patent number: 11815071
    Abstract: The gravity compressed air energy storage system includes: a shaft, into which a pressure-bearing cylinder is movably inserted; a locking component arranged at a top of the pressure-bearing cylinder to support the pressure-bearing cylinder on a ground at a top of the shaft through the locking component in case that the pressure-bearing cylinder is at a lowest limit position; a primary gravity block arranged above the locking component; a spherical connection component arranged and spherically connected between the primary gravity block and the locking component; in which a plurality of guide components are arranged around the primary gravity block; and a plurality of guide rails arranged on the ground and at a peripheral side of the primary gravity block; in which the plurality of guide rails cooperate with the plurality of guide components.
    Type: Grant
    Filed: June 6, 2023
    Date of Patent: November 14, 2023
    Assignee: XI'AN THERMAL POWER RESEARCH INSTITUTE CO., LTD
    Inventors: Jun Wen, Yang Li, Hanchen Zhao, Chenglong Yang, Haimin Ji, Xiaohui Song, Haifeng Qin, Haiwei Huang, Shuchang Liu, Zaisong Yu
  • Publication number: 20230344085
    Abstract: The present application provides a separator, a secondary battery, a battery module, a battery pack and an electrical apparatus. The separator may sequentially include a first region, a main region and a second region in a first direction. At least one surface of the first region and/or at least one surface of the second region may be provided with a fluorescent coating. The fluorescent coating may be used to identify whether the separator is folded or not.
    Type: Application
    Filed: July 6, 2023
    Publication date: October 26, 2023
    Applicant: CONTEMPORARY AMPEREX TECHNOLOGY CO., LIMITED
    Inventors: Yong HU, Chunmei SHI, Haiming ZHANG, Chenglong YANG, Linting DING, Daichun TANG
  • Publication number: 20220196597
    Abstract: A monitoring system detects and measures a quantity of radical particles within a gas. A test chamber is coupled to a flow channel that transmits a gas. The test chamber defines an aperture connecting the test chamber and the flow channel, and the aperture permits a subset of the gas to enter the test chamber from the flow channel. An ionizer is positioned within the test chamber and generates radical ions from radical particles of the subset of the gas. A mass spectrometer measures a quantity of the radical ions, thereby providing a measurement of the radical particles in the gas.
    Type: Application
    Filed: December 16, 2021
    Publication date: June 23, 2022
    Inventors: Chenglong Yang, Jimmy Liu, James Edward Blessing
  • Patent number: 10502651
    Abstract: Systems and methods for in-situ leak detection and endpoint detection of wafer dry etch or chamber clean in chambers, e.g., vacuum chambers used in semiconductor processing. A mini environment is created and a sensor, such as an SPOES sensor, can be used in the mini-environment to perform leak detection.
    Type: Grant
    Filed: October 5, 2016
    Date of Patent: December 10, 2019
    Assignee: INFICON, INC.
    Inventor: Chenglong Yang
  • Patent number: 9645125
    Abstract: A method of measuring an atmosphere in a guest vacuum chamber of a vacuum tool includes measuring a first composition of the atmosphere in the host vacuum chamber using a residual gas analyzer (RGA). The host and guest vacuum chambers are not coupled during the measuring of the first composition. The host vacuum chamber is coupled to the guest vacuum chamber, so the atmospheres in each can mix in the host vacuum chamber. A second composition of the atmosphere in the host vacuum chamber is measured using the RGA after the chambers are coupled. Using a processor, a composition of the guest atmosphere is automatically determined using the measured first and second compositions. A vacuum tool can include the host and guest chambers, the valve, the RGA, and a processor configured to control the valve to carry out this or other methods.
    Type: Grant
    Filed: December 4, 2013
    Date of Patent: May 9, 2017
    Assignee: INFICON, INC.
    Inventor: Chenglong Yang
  • Publication number: 20170097273
    Abstract: Systems and methods for in-situ leak detection and endpoint detection of wafer dry etch or chamber clean in chambers, e.g., vacuum chambers used in semiconductor processing. A mini environment is created and a sensor, such as an SPOES sensor, can be used in the mini-environment to perform leak detection.
    Type: Application
    Filed: October 5, 2016
    Publication date: April 6, 2017
    Inventor: Chenglong Yang
  • Publication number: 20140157863
    Abstract: A method of measuring an atmosphere in a guest vacuum chamber of a vacuum tool includes measuring a first composition of the atmosphere in the host vacuum chamber using a residual gas analyzer (RGA). The host and guest vacuum chambers are not coupled during the measuring of the first composition. The host vacuum chamber is coupled to the guest vacuum chamber, so the atmospheres in each can mix in the host vacuum chamber. A second composition of the atmosphere in the host vacuum chamber is measured using the RGA after the chambers are coupled. Using a processor, a composition of the guest atmosphere is automatically determined using the measured first and second compositions. A vacuum tool can include the host and guest chambers, the valve, the RGA, and a processor configured to control the valve to carry out this or other methods.
    Type: Application
    Filed: December 4, 2013
    Publication date: June 12, 2014
    Applicant: INFICON, Inc.
    Inventor: Chenglong Yang
  • Publication number: 20090014644
    Abstract: An ion source apparatus for partial pressure analyzers and in-situ cleaning method thereof based on inducing a hollow cathode discharge (HCD) inside the ion source. The HCD is formed by applying a high negative voltage to one or more parts of the ion source, including the anode electrode, the lens focus plate and at least one other lens or other form of plate, such as a total pressure collector plate.
    Type: Application
    Filed: July 10, 2008
    Publication date: January 15, 2009
    Applicant: Inficon, Inc.
    Inventors: Chenglong Yang, Jeffrey P. Merrill, Louis C. Frees, Steven J. Lakeman
  • Patent number: 7257494
    Abstract: A method of monitoring a microelectronic manufacturing process includes the implementation of a monitoring sensor that is configured to operate in an inter-process mode. During an inter-process mode, a first valve is opened in order to initiate transfer of a processing substrate between at least one processing chamber and a transfer chamber. The monitoring sensor is programmed to monitor the interior of the at least one processing chamber only after the first valve is opened.
    Type: Grant
    Filed: May 11, 2005
    Date of Patent: August 14, 2007
    Assignee: Inficon, Inc.
    Inventors: William T. Conner, Craig Garvin, Steven J. Lakeman, Igor Tepermeister, Chenglong Yang
  • Publication number: 20050256653
    Abstract: A method of monitoring a microelectronic manufacturing process includes the implementation of a process monitor that is configured to operate in an inter-process mode.
    Type: Application
    Filed: May 11, 2005
    Publication date: November 17, 2005
    Applicant: Inficon, Inc.
    Inventors: William Conner, Craig Garvin, Steven Lakeman, Igor Tepermeister, Chenglong Yang