Abstract: An infrared filter film layer and an infrared filter structure are provided. The infrared filter film layer includes at least one silicon-based layer, at least one isolation layer, and at least one oxide layer that are stacked with each other. The at least one isolation layer is disposed between the at least one silicon-based layer and the at least one oxide layer. Through this configuration, the infrared filter film layer has good quality, such that an amount of wavelength drift is small in application. The infrared filter structure includes a light-transmitting substrate and the infrared filter film layer.

Abstract: A circuit board structure includes a circuit substrate, a first circuit layer, and a second circuit layer. The circuit substrate has a surface and includes at least one conductive structure and at least one patterned circuit layer. The conductive structure is electrically connected to the patterned circuit layer, and an upper surface of the conductive structure is aligned with the surface. The first circuit layer is directly disposed on the surface of the circuit substrate and electrically connected to the conductive structure. A line width of the first circuit layer is less than or equal to 1/4 of a line width of the patterned circuit layer. The second circuit layer is directly disposed on the first circuit layer and electrically connected to the first circuit layer.

Abstract: In a ceiling grid framework, at least one of a main beam and front and rear cross beams is configured to have a beam module which includes a lighting element therein. Thus, the ceiling grid framework can be used for supporting ceiling panels and for illumination.

Abstract: In a ceiling grid framework, at least one of a main beam and front and rear cross beams is configured to have a beam module which includes a lighting element therein. Thus, the ceiling grid framework can be used for supporting ceiling panels and for illumination.