Abstract: A method for enhancing erase of a non-volatile memory device in which the method prevents the over-erase of the memory device is disclosed. The disclosed method includes steps which are performed to precondition the memory device before a program or erase cycle is initiated. The method includes performing a step which includes a tunneling program, such as a Fowler-Nordheim (F-N) tunneling program, to increase the threshold voltage of the non-volatile memory device prior to performing the program/erase cycle. The disclosed method has particular applicability to a non-volatile memory device formed with an NROM device. The disclosed method attenuates or eliminates an over-erase condition in the non-volatile memory device. The related structure that is present in the preconditioning step is also disclosed.

Abstract: A method for preventing electron secondary injection in a pocket implantation process performed on a nitride read only memory (NROM). The NROM has an oxide-nitride-oxide (ONO) layer formed on a silicon substrate. A plurality of bit line masks, arranged in a column, is formed on the surface of the ONO layer. A plurality of N type bit lines is formed in a region of the substrate not covered by the bit line masks. The method starts by performing a pocket implantation process of Indium ions with low energy, high dosage and using an angle nearly parallel to the ONO layer, so as to prevent electron secondary injection. Also, a plurality of P-type ultra-shallow junctions is formed in the region of the substrate not covered by the bit line masks.

Abstract: A method of integrating a photodiode and a CMOS transistor with a NVM on a semiconductor substrate is provided. A photo sensor region, a periphery circuit region, and a memory cell region are defined on the substrate. A first doped area is formed within the semiconductor substrate in the periphery circuit region, the photo sensor region and the memory cell region. A second doped area is formed within the semiconductor substrate in the periphery circuit region. An ONO dielectric layer is formed on the surface of the semiconductor substrate. A third doped area is formed on the first doped area in the photo sensor region, and a fourth doped area is formed on the first doped area in the memory cell region. Following removal of portions of the ONO dielectric layer covering the fourth doped region in the photo sensor region, the periphery circuit region and the memory cell region, an oxide layer is formed on the first doped area, the second doped area, the third doped area, and the fourth doped area.

Abstract: A method for preventing electron secondary injection in a pocket implantation process performed on a nitride read only memory (NROM). The NROM has an oxide-nitride-oxide (ONO) layer formed on a silicon substrate. A plurality of bit line masks, arranged in a column, is formed on the surface of the ONO layer. A plurality of N type bit lines is formed in a region of the substrate not covered by the bit line masks. The method starts by performing a pocket implantation process of Indium ions with low energy, high dosage and using an angle nearly parallel to the ONO layer, so as to prevent electron secondary injection. Also, a plurality of P-type ultra-shallow junctions is formed in the region of the substrate not covered by the bit line masks.

Abstract: A method and a device formed by the method of forming a composite dielectric structure between the floating polysilicon electrode and the control electrode of an EPROM-type device is disclosed. The dielectic is characterized by a thin (0-80 angstroms) thermally-grown or CVD bottom oxide layer covered by a relatively thin (<200 angstroms) silicon nitride layer. The top layer comprises a CVD oxide deposited in a thickness up to 150 angstroms. The capacitively measured effective thickness of the complete structure is about 200 .ANG. or less. The top layer CVD oxide has a thickness greater than the bottom oxide layer and greater than or equal to that of the silicon nitride layer and may also extend beyond the EPROM cell to form at least a part of the peripheral transistor dielectric.